Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SIO2mbr with burned resist mask: Difference between revisions
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(New page: ===Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material, by Berit Geilman Herstrøm (BGE) from Danchip@DTU=== {| border="2" cellspacing="1" cellpadding="3" align=...) |
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===Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material, by Berit Geilman Herstrøm (BGE) from Danchip@DTU=== | ===Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material, by Berit Geilman Herstrøm (BGE) from Danchip@DTU=== | ||
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