November 2014 Survey

Survey introduction

The November 2014 survey was the 11th survey carried out using a format where individual cleanroom users were asked about their view on various parts of using DTU Danchip's facilities and in particular the cleanroom facilities.
The questionnaire was send to 334 registered users (based on the logging of cleanroom use) unfortunately 13 of the e-mail adresses was obsolete and thus the mails bounced, which brought the total number of potential answers to 321 . In total 74 persons answered the questionnaire which means an answer fraction of 22% regardless of whether or not the bounces should be included in the total.
This page deals with the comments given as part of the questionnaire. Danchip values this feedback highly.

Comments

The comments appear here as they were written in the feedback field of the questionnaire. In a few cases they have been anonymized or the worst spelling mistakes corrected.

Comment 1: Working a lot with the e-beam I have experienced several times that the load team did not arrive as expected. Everyone have, however, been very nice and helpul when I found someone to ask for help, so it seems like a small coordination problem - and I think it might already have been taken care of

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Comment 2: I would prefer to have more readily available TiO2 deposition using the Ionfab. The machine is prone to breaking down, and spends most of its time in etch mode.

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Comment 3: It is becoming more and more cumbersome to use the computer terminals in the cleanroom. Everytime I want to use my email I have to set up my account, and wait for outlook to update my inbox. It takes up to two minutes to check email in this way. As a result I now use the web based outlook instead. But this is not as convenient. The citrix solution is also very slow. transfering files to the cleanroom drive (U) was very fast and convenient. With citrix it takes 2-3 minutes before I can start transfering my files.

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Comment 4: Lately almost all delays in my fabrication have been due to equipment availability, never due to poor performance or anything else. This is mainly a problem on the D-RIE Pegasus, Sputter system lesker and Electroplating Ni.

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Comment 5: Mine topkarakterer kan I jo ikke bruge til andet end "feel good" men det må I så nøjes med.

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Comment 6: I have only experience with XPS, it was indeed really good in the beginning of this year but these days the results are, in most of the times unexpected. I think we need to make sure that the instrument is as good as it should be as running a standard samples once in a while (I know, this reduces the life time of the X-ray gun, but can't help).

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Comment 7: When you get training in Danchip you get training in a process and not in a machine. I would like to get more info about the machines when I am trained, how and why I should alter some parameters, instead of just using a "recipe". I know that using the recipe is faster and more efficient for a process, but if you need to change your process later it's best to know more about why you are pushing the buttons.

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Comment 8: When you get training in Danchip you get training in a process and not in a machine. I would like to get more info about the machines when I am trained, how and why I should alter some parameters, instead of just using a "recipe". I know that using the recipe is faster and more efficient for a process, but if you need to change your process later it's best to know more about why you are pushing the buttons.

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