Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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| Line 13: | Line 13: | ||
! SEM images | ! SEM images | ||
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! rowspan="2"| 15 minutes of black silicon recipe on blank wafer | ! rowspan="2" width="100"| 15 minutes of black silicon recipe on blank wafer | ||
| S004592 | | S004592 | ||
| Wafer centre | | Wafer centre | ||
Revision as of 13:07, 10 December 2014
| Process | Before | After | ||||
|---|---|---|---|---|---|---|
| Wafer ID | Comment | SEM images | Wafer ID | Comment | SEM images | |
| 15 minutes of black silicon recipe on blank wafer | S004592 | Wafer centre | 
|
S004679 | Wafer centre | 
|
| S004592 | Wafer edge | 
|
S004679 | Wafer edge | 
| |