Revision as of 08:57, 1 July 2014

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This page is about doping your wafer or making a thin film layer doped with boron, phosphor or Germane.

	Method 1	Method 2
Generel description	Generel description - method 1	Generel description - method 2
Parameter 1	A B	A B
Parameter 2	A B C	A
Substrate size	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers
Allowed materials	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2 Allowed material 3

@@ Line 6: / Line 6: @@
 <br clear="all" />
-== Name of process ==
+== Doping your wafer ==
-Write a short description of the process and how to perform the process.
+This page is about doping your wafer or making a thin film layer doped with boron, phosphor or Germane.
 *[[/Deposition of silicon nitride using LPCVD|Process description using method 1]]