Specific Process Knowledge/Wafer cleaning: Difference between revisions

From LabAdviser
Jump to navigation Jump to search
Line 42: Line 42:
|Mandatory prior furnace processes  
|Mandatory prior furnace processes  
|When needed and always after KOH etch and Nitride etch in Phosphoric acid
|When needed and always after KOH etch and Nitride etch in Phosphoric acid
|Optional with RCA cleaning  
|Optional during RCA cleaning
|Cleaning before wafer bonding  
|Cleaning before wafer bonding  
|Cleaning very dirty items that enters the cleanroom. Should be followed by a piranha clean.
|Cleaning very dirty items that enters the cleanroom. Should be followed by a piranha clean.

Revision as of 11:56, 3 March 2014

Feedback to this page: click here

Clean with:

  • RCA - Two step process to remove organics and metals
  • 7-up & Piranha - Removes organics and alkali ions
  • 5% HF - Removing native oxide
  • IMEC - Cleaning before fusion bonding
  • Soap Sonic - Cleaning of "dirty" wafers when entering the cleanroom


Section under construction.jpg Section under construction

Comparison of Wafer Cleaning Methods

RCA 7-up & Piranha 5% HF IMEC Soap Sonic
Generel description Two step process to remove organics and metals Removes organics and alkali ions Removing native oxide Cleaning before wafer bonding Removing dust and particles
Purpose Mandatory prior furnace processes When needed and always after KOH etch and Nitride etch in Phosphoric acid Optional during RCA cleaning Cleaning before wafer bonding Cleaning very dirty items that enters the cleanroom. Should be followed by a piranha clean.
Substrate size
  • #1-25 2", 4" and 6" wafers
  • #1-25 2", 4" and 6" wafers
  • #1-25 2", 4" and 6" wafers
  • #1-25 2" and 4" wafers
  • All sizes that can go into the bath
Allowed materials
  • Silicon
  • Poly Silicon
  • Silicon Oxide
  • Silicon Nitride
  • Silicon Oxynitride
  • Quartz/fused silica
  • Silicon
  • Poly Silicon
  • Silicon Oxide
  • Silicon Nitride
  • Silicon Oxynitride
  • Quartz/fused silica
  • Pyrex and wafers with Cr ONLY in Mask cleaning bath or beaker
  • Silicon
  • Poly Silicon
  • Silicon Oxide
  • Silicon Nitride
  • Silicon Oxy-nitride
  • Quartz/fused silica
  • Resists (depending on bath)
  • Pyrex (depending on bath)
  • Silicon
  • Poly Silicon
  • Silicon Oxide
  • Silicon Nitride
  • Silicon Oxynitride
  • Quartz/fused silica
  • Pyrex
  • All materials