Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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|'''Resist'''
|'''Polarity'''
|'''Manufacturer'''
|'''Comments'''
|'''Technical reports'''
|'''Spinner'''
|'''Developer'''
|'''Rinse'''
|'''Remover'''
|'''Process flows (in docx-format)'''
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|'''AZ5214E'''
|Positive
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|'''AZ4562'''
|Positive
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|'''AZ MiR 701'''
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|-style="background:WhiteSmoke; color:black"
|'''AZ nLOF 2020'''
|Negative
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|'''SU8'''
|Positive
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Revision as of 08:56, 12 August 2013

Process Resist Type Comment 1 Comment 2 Comment 3
Lift off NLOF AA BB CC
Dry Etch DD
  • DD1
  • DD2
 EE FF GG
Wet Etch HH
  • HH1
  • HH2
 II JJ KK



Resist Comments Pre-treatment Resist Coating Exposure Baking Developing Stripping, Lift-off
AA AA AA AA AA AA AA AA
BB BB BB BB BB BB BB BB
CC CC CC CC CC CC CC CC



Resist Polarity Manufacturer Comments Technical reports Spinner Developer Rinse Remover Process flows (in docx-format)
AZ5214E Positive


AZ4562 Positive
AZ MiR 701
AZ nLOF 2020 Negative


SU8 Positive


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