| Display title | File:Cr and CrOx etching using SF6 and O2 plasma.pdf.pdf |
| Default sort key | Cr and CrOx etching using SF6 and O2 plasma.pdf.pdf |
| Page length (in bytes) | 8 |
| Namespace ID | 6 |
| Namespace | File |
| Page ID | 5921 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Hash value | 850a33eda17bd58696ecda9f711ed09e7f787827 |
| Edit | Allow all users (infinite) |
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| Page creator | Jmli (talk | contribs) |
| Date of page creation | 12:50, 17 August 2021 |
| Latest editor | Jmli (talk | contribs) |
| Date of latest edit | 12:51, 17 August 2021 |
| Total number of edits | 2 |
| Total number of distinct authors | 1 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
