Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Evaporation of W in Temescal: Revision history

Jump to navigation Jump to search

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

18 February 2023

2 January 2023

  • curprev 15:4915:49, 2 January 2023Eves talk contribs 2,292 bytes +2,292 Created page with "=Deposition of W in Temescal= During the e-beam deposition of Tungsten, extremely bright light and heat are generated! Lower density film than expected due to porosity. Consider using sputtering instead. Power 33W, stable rate, tooling 86%. Measured thickness 20 nm (XRR). <b>Wait for base pressure 3 10-7Torr before start.</b> {| border="2" cellspacing="2" cellpadding="2" colspan="3" |bgcolor="#98FB98" |'''Deposition of Tungsten. Dep. rate: 0.5Å/s, Thickness sp.:..."