Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC3): Revision history

1 May 2023

• curprev 17:4817:48, 1 May 2023‎ Eves talk contribs‎ 23,834 bytes −116‎ No edit summary
• curprev 17:4817:48, 1 May 2023‎ Eves talk contribs‎ 23,950 bytes +294‎ No edit summary

21 December 2022

• curprev 15:3715:37, 21 December 2022‎ Eves talk contribs‎ 23,656 bytes +296‎ No edit summary

30 August 2022

• curprev 19:0519:05, 30 August 2022‎ Eves talk contribs‎ 23,360 bytes +123‎ →‎Deposition rate (p-DC)
• curprev 19:0219:02, 30 August 2022‎ Eves talk contribs‎ 23,237 bytes +49‎ →‎Deposition rate (RF mode)

2 August 2022

• curprev 17:0917:09, 2 August 2022‎ Eves talk contribs‎ 23,188 bytes +9,626‎ No edit summary
• curprev 14:3114:31, 2 August 2022‎ Eves talk contribs‎ 13,562 bytes +2‎ →‎Optical functions

27 July 2022

• curprev 18:3718:37, 27 July 2022‎ Eves talk contribs‎ 13,560 bytes +13,560‎ Created page with "=RF Sputtering of Si in Sputter-System Metal-Nitride(PC3)= This page presents the results of Si deposition using <b>RF Sputtering</b> in Sputter-System Metal-Nitride (PC3) c..."