Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Lesker: Revision history

1 May 2023

• curprev 17:4917:49, 1 May 2023‎ Eves talk contribs‎ 6,317 bytes +294‎ No edit summary

18 July 2022

• curprev 17:0517:05, 18 July 2022‎ Eves talk contribs‎ 6,023 bytes +417‎ →‎Sputtering of Si using RF mode
• curprev 16:5016:50, 18 July 2022‎ Eves talk contribs‎ 5,606 bytes +4‎ →‎Surface roughness optimization
• curprev 16:4916:49, 18 July 2022‎ Eves talk contribs‎ 5,602 bytes −9‎ →‎From Si target (DC sputter)
• curprev 16:4816:48, 18 July 2022‎ Eves talk contribs‎ 5,611 bytes +7‎ →‎Surface roughness optimization
• curprev 16:4716:47, 18 July 2022‎ Eves talk contribs‎ 5,604 bytes +595‎ →‎Sputtering of Si using RF mode

11 January 2022

• curprev 23:3523:35, 11 January 2022‎ Eves talk contribs‎ 5,009 bytes −14‎ →‎Si Sputtering
• curprev 23:3523:35, 11 January 2022‎ Eves talk contribs‎ 5,023 bytes +1,321‎ →‎Sputtering of Si in the Sputter-System (Lesker)
• curprev 23:2223:22, 11 January 2022‎ Eves talk contribs‎ 3,702 bytes +69‎ →‎Sputtering of Si in the Sputter-System (Lesker)

25 March 2020

• curprev 12:4612:46, 25 March 2020‎ Reet talk contribs‎ 3,633 bytes −19‎ →‎Sputtering of Si in the Sputter-System (Lesker)
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• curprev 12:1212:12, 25 March 2020‎ Reet talk contribs‎ 3,653 bytes +4‎ →‎Sputtering of Si in the Sputter-System (Lesker)
• curprev 12:1112:11, 25 March 2020‎ Reet talk contribs‎ 3,649 bytes +400‎ →‎Sputtering of Si in the Sputter-System (Lesker)
• curprev 12:0612:06, 25 March 2020‎ Reet talk contribs‎ 3,249 bytes +78‎ →‎Stress in Si deposited at
• curprev 12:0512:05, 25 March 2020‎ Reet talk contribs‎ 3,171 bytes +367‎ →‎Sputtering of Si in the Sputter-System (Lesker)
• curprev 11:5711:57, 25 March 2020‎ Reet talk contribs‎ 2,804 bytes +1‎ →‎Surface roughness optimization
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• curprev 11:5611:56, 25 March 2020‎ Reet talk contribs‎ 2,805 bytes +6‎ →‎Sputtering of Si in the Sputter-System (Lesker)
• curprev 11:5611:56, 25 March 2020‎ Reet talk contribs‎ 2,799 bytes −5‎ →‎From Si target (DC sputter)
• curprev 11:5511:55, 25 March 2020‎ Reet talk contribs‎ 2,804 bytes +209‎ →‎Surface roughness optimization
• curprev 11:5411:54, 25 March 2020‎ Reet talk contribs‎ 2,595 bytes +1,028‎ →‎Surface roughness optimization

• curprev 11:5111:51, 25 March 2020‎ Reet talk contribs‎ 1,567 bytes +1,567‎ Created page with "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thi..."