Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Sputtering of Cr in Cluster Lesker PC3: Revision history

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18 February 2023

3 January 2023

  • curprev 16:4116:41, 3 January 2023‎ Eves talk contribs‎ 7,242 bytes +7,242‎ Created page with "This page presents the results of Cr deposition using DC sputtering in Sputter-system Metal-Nitride (PC3), now commonly known as "Cluster Lesker". The deposition target is Cr 3-inch. Source #2 (DC/p-DC) was used. The fabrication and characterization described below were conducted in <i>2022 by Evgeniy Shkondin, DTU Nanolab</i>. The focus of the study was the deposition conditions and uniformity check across 150mm wafer. The prepared film was investigated by the X-ray..."
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