Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/AlN deposition using ALD2/Acceptance test AlN: Revision history

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10 May 2023

11 June 2020

  • curprev 17:0117:01, 11 June 2020‎ Eves talk contribs‎ 2,172 bytes +2,172‎ Created page with "==AlN with N<sub>2</sub> plasma== <!-- Experiment 161102A --> The test was done with 300 cycles at 350 °C where the growth rate was measured to be '''0.0625 nm/cycle'''. ..."
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