Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SIO2mbr with burned resist mask: Revision history

6 September 2022

• curprev 13:0713:07, 6 September 2022‎ Bghe talk contribs‎ 965 bytes +127‎ →‎Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned

25 November 2019

• curprev 17:2417:24, 25 November 2019‎ Jmli talk contribs‎ 838 bytes 0‎ No edit summary

7 May 2018

• curprev 14:5714:57, 7 May 2018‎ Bghe talk contribs‎ 838 bytes +118‎ No edit summary

29 June 2017

• curprev 08:3608:36, 29 June 2017‎ Bghe talk contribs‎ 720 bytes +1‎ →‎Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material, by Berit Geilman Herstrøm (BGE) from Danchip@DTU

28 May 2015

• curprev 11:0111:01, 28 May 2015‎ Bghe talk contribs‎ 719 bytes +291‎ No edit summary

21 April 2009

• curprev 15:1815:18, 21 April 2009‎ BGE talk contribs‎ 428 bytes +428‎ New page: ===Etch of SiO2 using the recipe 1SIO2mbr with burned resist as masking material, by Berit Geilman Herstrøm (BGE) from Danchip@DTU=== {| border="2" cellspacing="1" cellpadding="3" align=...