Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2: Revision history

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curprev 15:1815:18, 6 February 2023‎ Bghe talk contribs‎ 7,003 bytes +4‎ No edit summary
curprev 15:1715:17, 6 February 2023‎ Bghe talk contribs‎ 6,999 bytes +17‎ No edit summary

curprev 09:3609:36, 5 October 2020‎ Bghe talk contribs‎ 6,982 bytes 0‎ No edit summary

curprev 14:5614:56, 7 May 2018‎ Bghe talk contribs‎ 6,982 bytes +117‎ No edit summary

curprev 07:4907:49, 30 June 2016‎ Bghe talk contribs‎ 6,865 bytes +1‎ →‎The substrate:
curprev 07:4907:49, 30 June 2016‎ Bghe talk contribs‎ 6,864 bytes +63‎ →‎The substrate:
curprev 07:4807:48, 30 June 2016‎ Bghe talk contribs‎ 6,801 bytes −35‎ →‎The silicon can be masked by these materials:

curprev 13:5213:52, 23 September 2013‎ Bghe talk contribs‎ 5,304 bytes +250‎ No edit summary

curprev 14:5814:58, 12 June 2012‎ BGE talk contribs‎ 5,054 bytes +3‎ →‎Burned resist as masking material (developed for waveguides by Haiyan Ou @DTU Photonics):

curprev 15:2215:22, 21 April 2009‎ BGE talk contribs‎ 5,051 bytes +165‎ →‎Most used recipes:
curprev 14:4514:45, 21 April 2009‎ BGE talk contribs‎ 4,886 bytes +262‎ →‎Burned resist as masking material (developed for waveguides by Haiyan Ou @DTU Photonics):
curprev 14:3914:39, 21 April 2009‎ BGE talk contribs‎ 4,624 bytes +15‎ →‎Burned resist as masking material (developed for waveguides by Haiyan Ou @DTU Photonics):
curprev 14:3714:37, 21 April 2009‎ BGE talk contribs‎ 4,609 bytes +81‎ →‎PolySilicon as masking material

curprev 11:3611:36, 25 November 2008‎ BGE talk contribs‎ 4,362 bytes +2‎ →‎Selectivity to photoresist
curprev 10:4110:41, 25 November 2008‎ BGE talk contribs‎ 4,360 bytes +262‎ →‎RIE1:

curprev 09:5809:58, 23 April 2008‎ BGE talk contribs‎ 2,783 bytes +20‎ →‎A survey of the parameter space using photoresist as masking material

curprev 12:1412:14, 25 February 2008‎ BGE talk contribs‎ 2,763 bytes +32‎ →‎Burned resist as masking material (developed for waveguides):

curprev 11:4111:41, 13 December 2007‎ 192.38.87.76 talk‎ 2,731 bytes 0‎ →‎Burned resist as masking material (developed for waveguides):

curprev 13:5313:53, 13 November 2007‎ BGE talk contribs‎ 2,731 bytes +132‎ No edit summary

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