Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/With CSAR resist mask: Revision history

3 February 2023

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6 September 2022

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25 November 2019

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28 January 2019

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19 August 2016

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25 November 2015

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19 November 2015

• curprev 13:0513:05, 19 November 2015‎ Bghe talk contribs‎ 1,034 bytes +1,034‎ Created page with "''Information given by Alberto Cagliani February 2015'' Using the standard oxide recipe (SiO2_res) for 1 min the CSAR looked burned and could not be removed by CSAR stripper ..."