Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/Standard recipe with resist mask/Images of m resist etches: Revision history

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curprev 11:0411:04, 14 December 2022‎ Bghe talk contribs‎ 16,807 bytes +61‎ →‎Profile of 1-10µm deep etch + resist profile
curprev 11:0411:04, 14 December 2022‎ Bghe talk contribs‎ 16,746 bytes +81‎ →‎Profile of 1-10µm deep etch + resist profile

curprev 13:2913:29, 6 September 2022‎ Bghe talk contribs‎ 16,665 bytes −3‎ →‎Profile of 1-10µm deep etch + resist profile

curprev 21:2121:21, 25 November 2019‎ Jmli talk contribs‎ 16,668 bytes 0‎ →‎Resist mask baked at 150dg effected by m_res_ny
curprev 21:2021:20, 25 November 2019‎ Jmli talk contribs‎ 16,668 bytes 0‎ →‎Resist mask effected by m_res_ny
curprev 21:2021:20, 25 November 2019‎ Jmli talk contribs‎ 16,668 bytes +7‎ No edit summary

curprev 12:2112:21, 12 March 2018‎ Bghe talk contribs‎ 16,661 bytes 0‎ →‎Profile of 5-10µm deep etch + resist profile
curprev 12:2012:20, 12 March 2018‎ Bghe talk contribs‎ 16,661 bytes +51‎ →‎Profile of 5-10µm deep etch + resist profile
curprev 12:1812:18, 12 March 2018‎ Bghe talk contribs‎ 16,610 bytes +1‎ →‎Profile of 5-10µm deep etch + resist profile
curprev 12:1812:18, 12 March 2018‎ Bghe talk contribs‎ 16,609 bytes +174‎ →‎Profile of 5-10µm deep etch + resist profile

curprev 08:4708:47, 25 November 2015‎ Bghe talk contribs‎ 16,435 bytes +301‎ No edit summary

curprev 12:5012:50, 19 November 2015‎ Bghe talk contribs‎ 16,134 bytes +16,134‎ Created page with "=Here are presented some images of etches using the recipe m_res_ny= ==Profile of 5-10µm deep etch + resist profile == ''by Berit G. Herstrøm (BGE) from Danchip'' {| borde..."

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