Specific Process Knowledge/Etch/Etching of Polymer/Etch of Photo Resist using RIE: Revision history

6 September 2022

• curprev 12:1812:18, 6 September 2022‎ Bghe talk contribs‎ 1,809 bytes +127‎ →‎Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned

25 November 2019

• curprev 16:5916:59, 25 November 2019‎ Jmli talk contribs‎ 1,682 bytes 0‎ No edit summary
• curprev 16:4816:48, 25 November 2019‎ Jmli talk contribs‎ 1,682 bytes 0‎ No edit summary

7 May 2018

• curprev 13:5813:58, 7 May 2018‎ Bghe talk contribs‎ 1,682 bytes +117‎ No edit summary

11 February 2016

• curprev 08:4308:43, 11 February 2016‎ Bghe talk contribs‎ 1,565 bytes −97‎ →‎Expected result using the above RIE recipes for etching of photoresist:

21 October 2013

• curprev 09:1509:15, 21 October 2013‎ Bghe talk contribs‎ 1,662 bytes +246‎ No edit summary

5 May 2011

• curprev 13:2113:21, 5 May 2011‎ BGE talk contribs‎ 1,416 bytes +1‎ →‎Expected result using the above RIE recipes for etching of photoresist:
• curprev 13:2113:21, 5 May 2011‎ BGE talk contribs‎ 1,415 bytes +1‎ →‎Expected result using the above RIE recipes for etching of photoresist:
• curprev 13:2113:21, 5 May 2011‎ BGE talk contribs‎ 1,414 bytes +573‎ No edit summary
• curprev 13:1013:10, 5 May 2011‎ BGE talk contribs‎ 841 bytes +832‎ No edit summary
• curprev 12:5912:59, 5 May 2011‎ BGE talk contribs‎ 9 bytes +9‎ New page: iopipiopi