Specific Process Knowledge/Etch/Etching of Silicon Oxide: Revision history

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

curprev 08:4908:49, 22 April 2013‎ BGE talk contribs‎ 6,866 bytes −6‎ →‎Compare the methods for Silicon Oxide etching
curprev 08:4608:46, 22 April 2013‎ BGE talk contribs‎ 6,872 bytes +27‎ →‎Compare the methods for Silicon Oxide etching
curprev 08:4408:44, 22 April 2013‎ BGE talk contribs‎ 6,845 bytes −9‎ →‎Compare the methods for Silicon Oxide etching
curprev 08:4208:42, 22 April 2013‎ BGE talk contribs‎ 6,854 bytes −1‎ →‎Compare the methods for Silicon Oxide etching

curprev 11:2911:29, 10 April 2013‎ BGE talk contribs‎ 8,365 bytes −3‎ →‎Compare the methodes for Silicon Nitride etching
curprev 11:2811:28, 10 April 2013‎ BGE talk contribs‎ 8,368 bytes +3‎ →‎Comparing silicon etch methodes at Danchip 70px
curprev 11:2111:21, 10 April 2013‎ BGE talk contribs‎ 8,365 bytes +5,703‎ No edit summary

curprev 07:2407:24, 29 May 2012‎ BGE talk contribs‎ 2,662 bytes 0‎ No edit summary
curprev 07:2307:23, 29 May 2012‎ BGE talk contribs‎ 2,662 bytes +131‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIE and AOE) etch for etching of Silicon Oxide

curprev 15:2715:27, 20 January 2012‎ BGE talk contribs‎ 2,531 bytes −13‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIE and AOE) etch for etching of Silicon Oxide
curprev 15:2715:27, 20 January 2012‎ BGE talk contribs‎ 2,544 bytes −13‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIE and AOE) etch for etching of Silicon Oxide

curprev 14:3614:36, 18 July 2011‎ BGE talk contribs‎ 2,557 bytes +77‎ →‎Dry etches:

curprev 13:2813:28, 31 January 2008‎ 192.38.87.76 talk‎ 2,441 bytes +72‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIE and AOE) etch for etching of Silicon Oxide
curprev 13:2713:27, 31 January 2008‎ 192.38.87.76 talk‎ 2,369 bytes +37‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIE and AOE) etch for etching of Silicon Oxide

curprev 10:0410:04, 15 January 2008‎ BGE talk contribs‎ 2,332 bytes +59‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIE and AOE) etch for etching of Silicon Oxide
curprev 10:0210:02, 15 January 2008‎ BGE talk contribs‎ 2,273 bytes +13‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIE and AOE) etch for etching of Silicon Oxide

curprev 13:0513:05, 13 November 2007‎ BGE talk contribs‎ 1,752 bytes +44‎ →‎Wet etches:
curprev 11:3011:30, 13 November 2007‎ BGE talk contribs‎ 1,708 bytes +313‎ No edit summary

curprev 09:3709:37, 1 November 2007‎ BGE talk contribs‎ 1,395 bytes +62‎ No edit summary
curprev 09:3109:31, 1 November 2007‎ BGE talk contribs‎ 1,333 bytes 0‎ →‎Comparison of wet Silicon Oxide etch and dry etches (RIe and AOE) etch for etching of Silicon Oxide
curprev 09:3009:30, 1 November 2007‎ BGE talk contribs‎ 1,333 bytes +1,333‎ New page: Silicon oxide can be etched using either wet chemistry or dry etch equipment. Wet chemistry is mainly used to remove all the nitride on the surface (backside and front side) of a wafer. Dr...

22 April 2013

11 April 2013

10 April 2013

29 May 2012

20 January 2012

18 July 2011

10 September 2008

31 January 2008

15 January 2008

19 November 2007

13 November 2007

1 November 2007