Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Revision history

25 November 2007

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22 November 2007

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21 November 2007

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19 November 2007

• curprev 21:4321:43, 19 November 2007‎ Jml talk contribs‎ 227 bytes +227‎ New page: The ICP-DRIE (Inductively Coupled Plasma - Deep Reactive Ion Etcher) tool at Danchip is manufactured by STS and is called the ASE (Advanced Silicon Etcher). The main purpose of the ASE is ...