Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2: Revision history

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13 November 2007

  • curprev 13:0013:00, 13 November 2007‎ BGE talk contribs‎ 1,290 bytes +1,290‎ New page: RIE (Reactive Ion Etch) can be used for etching silicon oxide. The etch is anisotropic with vertical or angled sidewalls depending on the process recipe and the masking material and geomet...
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