Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/ICP recipe for SiO2: Revision history

18 July 2023

• curprev 15:2415:24, 18 July 2023‎ Mfarin talk contribs‎ 1,729 bytes −18‎ →‎Results when etching a non-patterned wafer
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• curprev 14:5614:56, 18 July 2023‎ Mfarin talk contribs‎ 2,080 bytes −27‎ →‎Results when etching a non-patterned wafer
• curprev 14:5614:56, 18 July 2023‎ Mfarin talk contribs‎ 2,107 bytes −74‎ →‎Results when etching a non-patterned wafer
• curprev 14:5614:56, 18 July 2023‎ Mfarin talk contribs‎ 2,181 bytes −2‎ →‎Results when etching a non-patterned wafer
• curprev 14:5514:55, 18 July 2023‎ Mfarin talk contribs‎ 2,183 bytes +9‎ →‎Results when etching a patterned wafer
• curprev 14:5414:54, 18 July 2023‎ Mfarin talk contribs‎ 2,174 bytes +749‎ No edit summary

30 May 2023

• curprev 16:5316:53, 30 May 2023‎ Mfarin talk contribs‎ 1,425 bytes +2‎ →‎Results when etching a patterned wafer
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• curprev 16:5016:50, 30 May 2023‎ Mfarin talk contribs‎ 1,359 bytes +8‎ No edit summary
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• curprev 16:4816:48, 30 May 2023‎ Mfarin talk contribs‎ 1,348 bytes +101‎ No edit summary
• curprev 16:4716:47, 30 May 2023‎ Mfarin talk contribs‎ 1,247 bytes +1‎ No edit summary
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• curprev 16:4616:46, 30 May 2023‎ Mfarin talk contribs‎ 1,283 bytes +144‎ No edit summary

24 May 2023

• curprev 09:5609:56, 24 May 2023‎ Mfarin talk contribs‎ 1,139 bytes +20‎ →‎Results when etching a patterned wafer
• curprev 09:5409:54, 24 May 2023‎ Mfarin talk contribs‎ 1,119 bytes +4‎ →‎Results when etching a patterned wafer
• curprev 09:5409:54, 24 May 2023‎ Mfarin talk contribs‎ 1,115 bytes +14‎ →‎Results when etching a patterned wafer
• curprev 09:5309:53, 24 May 2023‎ Mfarin talk contribs‎ 1,101 bytes +2‎ →‎Results when etching a patterned wafer
• curprev 09:5309:53, 24 May 2023‎ Mfarin talk contribs‎ 1,099 bytes 0‎ →‎Results when etching a patterned wafer
• curprev 09:5209:52, 24 May 2023‎ Mfarin talk contribs‎ 1,099 bytes +3‎ No edit summary
• curprev 09:5109:51, 24 May 2023‎ Mfarin talk contribs‎ 1,096 bytes +29‎ →‎Results when etching a patterned wafer
• curprev 09:4409:44, 24 May 2023‎ Mfarin talk contribs‎ 1,067 bytes 0‎ →‎Results when etching a patterned wafer Tag: Manual revert
• curprev 09:4409:44, 24 May 2023‎ Mfarin talk contribs‎ 1,067 bytes 0‎ →‎Results when etching a patterned wafer
• curprev 09:4409:44, 24 May 2023‎ Mfarin talk contribs‎ 1,067 bytes −1‎ →‎Results when etching a patterned wafer
• curprev 09:4309:43, 24 May 2023‎ Mfarin talk contribs‎ 1,068 bytes +1‎ →‎Results when etching a patterned wafer

16 May 2023

• curprev 11:4711:47, 16 May 2023‎ Mfarin talk contribs‎ 1,067 bytes +63‎ No edit summary

15 May 2023

• curprev 15:4015:40, 15 May 2023‎ Mfarin talk contribs‎ 1,004 bytes +2‎ No edit summary
• curprev 15:3915:39, 15 May 2023‎ Mfarin talk contribs‎ 1,002 bytes 0‎ No edit summary
• curprev 15:3715:37, 15 May 2023‎ Mfarin talk contribs‎ 1,002 bytes +72‎ No edit summary
• curprev 15:1615:16, 15 May 2023‎ Mfarin talk contribs‎ 930 bytes −141‎ No edit summary
• curprev 15:1515:15, 15 May 2023‎ Mfarin talk contribs‎ 1,071 bytes −175‎ No edit summary
• curprev 15:1215:12, 15 May 2023‎ Mfarin talk contribs‎ 1,246 bytes +38‎ No edit summary
• curprev 14:2914:29, 15 May 2023‎ Mfarin talk contribs‎ 1,208 bytes −21‎ No edit summary
• curprev 14:2514:25, 15 May 2023‎ Mfarin talk contribs‎ 1,229 bytes −36‎ →‎Results when etching a piece of wafer on a Si carrier
• curprev 14:2514:25, 15 May 2023‎ Mfarin talk contribs‎ 1,265 bytes −1,182‎ →‎Results when etching a piece of wafer on a Si carrier
• curprev 14:2514:25, 15 May 2023‎ Mfarin talk contribs‎ 2,447 bytes −428‎ →‎Results when etching a whole wafer on an Al carrier
• curprev 14:2214:22, 15 May 2023‎ Mfarin talk contribs‎ 2,875 bytes −148‎ No edit summary
• curprev 14:2214:22, 15 May 2023‎ Mfarin talk contribs‎ 3,023 bytes +2,202‎ No edit summary
• curprev 14:2014:20, 15 May 2023‎ Mfarin talk contribs‎ 821 bytes −212‎ No edit summary
• curprev 14:2014:20, 15 May 2023‎ Mfarin talk contribs‎ 1,033 bytes −102‎ No edit summary
• curprev 14:1914:19, 15 May 2023‎ Mfarin talk contribs‎ 1,135 bytes −145‎ No edit summary
• curprev 14:1814:18, 15 May 2023‎ Mfarin talk contribs‎ 1,280 bytes +99‎ No edit summary

• curprev 14:1614:16, 15 May 2023‎ Mfarin talk contribs‎ 1,181 bytes +1,181‎ Created page with " {| border="2" cellspacing="2" cellpadding="3" |-style="background:DarkGray; color:White" !Material to be etched !Recipe: 1SiO2_02 <span style="background:#FFD700">'''*This recipe is no longer stable.'''</span> !Recipe: 1SiO2_03 !Testing other settings to increase etch rate in nitride |- |Etch rate in SiO2 |22.1 nm/min |26.8 nm/min |? |- |Etch rate in PECVD nitride |. |20.8nm/min (''kabi@nanolab 20190301'') - ~0nm/min (''ecsj@nanolab 20210729'') |? |- |Etch rate in LPCVD..."