Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/Standard recipe with resist mask: Revision history

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curprev 11:0111:01, 14 December 2022‎ Bghe talk contribs‎ 5,077 bytes +44‎ →‎Using different resist masks: results using the standard recipe for "Silicon oxide etch with resist mask"
curprev 11:0011:00, 14 December 2022‎ Bghe talk contribs‎ 5,033 bytes +8‎ →‎Using different resist masks: results using the standard recipe for "Silicon oxide etch with resist mask"

curprev 14:2614:26, 21 April 2022‎ Bghe talk contribs‎ 5,025 bytes −2‎ →‎Etch rates in different materials using the standard "Silicon oxide etch with resist mask"
curprev 14:2514:25, 21 April 2022‎ Bghe talk contribs‎ 5,027 bytes −1‎ →‎The standard recipe

curprev 21:1921:19, 25 November 2019‎ Jmli talk contribs‎ 5,028 bytes 0‎ →‎Etch rates in different materials using the standard "Silicon oxide etch with resist mask"
curprev 20:4120:41, 25 November 2019‎ Jmli talk contribs‎ 5,028 bytes 0‎ No edit summary

curprev 16:5816:58, 24 January 2019‎ Bghe talk contribs‎ 5,028 bytes +65‎ →‎Etch rates in different materials using the standard "Silicon oxide etch with resist mask"

curprev 13:4413:44, 28 August 2018‎ Bghe talk contribs‎ 4,963 bytes −1‎ →‎Using different resist masks: results using the standard recipe for "Silicon oxide etch with resist mask"
curprev 13:4413:44, 28 August 2018‎ Bghe talk contribs‎ 4,964 bytes +1‎ →‎Variations over the standard "SiO2 etch with resist mask" recipe

curprev 16:5116:51, 23 January 2017‎ Bghe talk contribs‎ 4,608 bytes +1‎ →‎Etch rates in different materials using the standard "Silicon oxide etch with resist mask"
curprev 16:5016:50, 23 January 2017‎ Bghe talk contribs‎ 4,607 bytes −1‎ →‎Etch rates in different materials using the standard "Silicon oxide etch with resist mask"

curprev 14:2714:27, 16 January 2017‎ Bghe talk contribs‎ 4,608 bytes +67‎ →‎Etch rates in different materials using the standard "Silicon oxide etch with resist mask"
curprev 14:2214:22, 16 January 2017‎ Bghe talk contribs‎ 4,541 bytes +213‎ →‎Etch rates in different materials using the standard "Silicon oxide etch with resist mask"

curprev 13:4513:45, 19 August 2016‎ Bghe talk contribs‎ 4,328 bytes +100‎ →‎Using different resist masks: results using the standard recipe for "Silicon oxide etch with resist mask"

curprev 08:2008:20, 20 April 2016‎ Bghe talk contribs‎ 4,228 bytes −107‎ →‎The standard recipe
curprev 08:1908:19, 20 April 2016‎ Bghe talk contribs‎ 4,335 bytes +506‎ →‎Variations over the standard "SiO2 etch with resist mask" recipe

curprev 11:1511:15, 11 December 2015‎ Bghe talk contribs‎ 3,829 bytes −46‎ →‎Using different resist masks: results using the standard recipe for "Silicon oxide etch with resist mask" 70px

curprev 08:5008:50, 25 November 2015‎ Bghe talk contribs‎ 3,875 bytes −3‎ →‎Using different resist masks: results using the standard recipe for "Silicon oxide etch with resist mask" 70px

curprev 12:5712:57, 19 November 2015‎ Bghe talk contribs‎ 3,967 bytes +25‎ No edit summary
curprev 12:5512:55, 19 November 2015‎ Bghe talk contribs‎ 3,942 bytes +492‎ No edit summary
curprev 12:4712:47, 19 November 2015‎ Bghe talk contribs‎ 3,450 bytes +6‎ No edit summary

curprev 12:4612:46, 19 November 2015‎ Bghe talk contribs‎ 3,444 bytes +3,444‎ Created page with "The standard recipe for oxide etching with photo resist as masking material is called: SiO2_res. The parameters and results so fare are as follows: {| border="1" cellspacing="..."

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