Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD
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At the moment DTU Nanolab has 2 PECVDs that can deposit silicon nitride and silicon oxynitride. PECVD4 is for clean silicon based and III-V based samples. PECVD3 is for silicon based samples but here up 5% (4 cm2) wafer coverage of other materials as metals are allowed (under some conditions even more). Look at the PECVD page to learn more about the PECVDs at DTU Nanolab. All though PECVD3 and PECVD4 are very much alike you cannot count on the a recipe on one system will give exactly the same results on the other system.
Deposition of SiN with PECVD4
Quality Control (QC) for PECVD4 | ||||||||||||||||||||||
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Recipe | Dep. rate [nm/min] | RI | Unif. [%] | Stress [MPa] | Comments | SiH4 [sccm] | NH3 [sccm] | N2O [sccm] | N2 [sccm] | Pressure [mTorr] | Power [W] | Load | Tune | Time [mm:ss] | Tested
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MF SIN | 12.9-13.0 nm/min 11.7 nm/min (kabi 2019-03-01) |
2.038-2.044 | ± 1.7% | 157 MPa | more results | 40 | 40 | 1920 | 900 mTorr | 20HF6"/20LF2" | 10:00/60:00(stress) | February 2017 Berit Herstrøm @DTU Nanolab (bghe) | |||
MF SIN2 | 44.3 nm/min | 2.01-2.02 | ± 2.7% | ? MPa | 30 | 30 | 1470 | 850 mTorr | 100HF8.2"/100LF2.2" | 10:00 | February 2020 bghe | ||||
LF SIN | 40-43 nm/min | 1.983-1.984 | ± 3.9-4.4% | Compressive: 565.4 MPa | 40 | 20 | 1960 | 550 mTorr | 60LF | 2:00/23:00(stress) | February 2017 bghe | ||||
HF SiN | 12.2-12.4 nm/min | 2.017-2.021 | ± 1.2-1.6% | Tensile: 431.6 MPa | 40 | 55 | 1960 | 900 mTorr | 20 W | 10:00/56:00(stress) | February 2017 bghe |
Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride
Quality Controle (QC) for PECVD3 | ||||||||||||||||||||||
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Recipes
Recipe name | SiH4 flow [sccm] | NH3 flow [sccm] | N2 flow [sccm] | Pressure [mTorr] | Power [W] | Description |
MFSiNLS2 | 30 | 30 | 1470 | 845 | 100HF 7.8s
100LF 2.2s |
Low stress nitride - standard recipe. The latest measured values can be seen in the process control sheet in LabManager. |
MFSiNLS | 30 | 30 | 1470 | 650 | 20HF 6s
30LF 2s |
Low stress nitride - old standard recipe. This one is not running well any more. |
LFSiN | 30 | 15 | 1470 | 550 | 60LF | Compressive stress |
HFSiN | 30 | 42 | 1470 | 900 | 20HF | Tensile stress |
LF=Low Frequency HF=High Frequency MF=Mixed Frequency SiN=Silicon Nitride LS=Low Stress
Expected results
Recipe name | Deposition rate [Å/min] | RI | Uniformity [%] [Std./mean] |
Stress [MPa] | KOH etch rate [Å/min] | BHF etch rate [Å/min] | See more |
MFSiNLS2 | ~422 (bghe Feb 2016) | ~2.03 | ~2 | ~6 (bghe Feb 2016) | ~2.1 (bghe Feb 2016) | ~? | see more results |
MFSiNLS | ~107 | ~1.99 | ~4 | ~-30 | ~2.5 | ~250 | . |
LFSiN | ~550 | ~1.96 | ~3 | ~-630 | . | . | . |
HFSiN | ~130 | ~1.97 | ~2 | ~460 | . | . | . |
Recipes on PECVD2 for deposition of silicon nitride and silicon oxynitride Expired!:PECVD2 has been DECOMMISSIONED!!
Recipes
Recipe name | SiH4 flow [sccm] | NH3 flow [sccm] | N2 flow [sccm] | Pressure [mTorr] | Power [W] | Description |
SINSTD80 | 30 | 20 | 1000 | 500 | 80 | |
SINSTD96 | 30 | 20 | 1000 | 500 | 96 | |
1SiN | 40 | 20 | 1000 | 700 | 150 |
Expected results
Recipe name | Deposition rate [nm/min] | RI | Uniformity [%] | Stress [MPa] | BHF etch rate [Å/min] | Comments |
1SiN |
Deposition rate in the middle of two wafers: 49nm/min+-1nm/min (2015-04-24 BGHE) |
~2-4% (2015-04-24 BGHE) |
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SINSTD80 | 68nm/min (2014-07-07 JML)- unstable deposition rate | |||||
SINSTD96 - unstable deposition rate |
Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride. Expired!:PECVD1 has been decommissioned
Recipes
Recipe name | SiH4 flow [sccm] | NH3 flow [sccm] | N2 flow [sccm] | Pressure [mTorr] | Power [W] | Description |
1nitride | 30 | 20 | 1000 | 500 | 80 | |
1nit_std | 40 | 20 | 1960 | 550 | 60 | Process control recipe |
Expected results
Recipe name | Deposition rate [nm/min] | RI | Uniformity [%] | Stress [MPa] | BHF etch rate [Å/min] | Comments |
1nitride | ||||||
1nit_std | ~32 | 1.89 | ~1 | ~700 | The latest measured values can be seen in the process control sheet in LabManager |