File:WF 2B1 feb06 2011-030.jpg
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The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 08:52, 16 March 2011 | | 1,024 × 768 (68 KB) | Jml (talk | contribs) | The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider. |
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