Specific Process Knowledge/Etch/ICP Metal Etcher/silicon

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Silicon etching on the ICP Metal Etcher

Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab

In the primary silicon etcher at Nanolab, the DRIE-Pegasus, silicon is etched using a fluorine based plasma (with SF₆ as etch gas). Silicon is also etched by chlorine and bromine.

• Chlorine/Bromine etch of nanostructures in silicon

• Isotropic etching in silicon