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LabAdviser is a process handbook for equipment and processes at the DTU Danchip cleanroom facilities. The function and capacity of each piece of equipment is described in detail and general process steps, eg photolithography procedures, are clarified. LabAdviser is meant to advise you to a good starting point for your cleanroom process for further optimization to meet your needs. To enter LabAdviser you need to log in. LabAdviser is only editable for Danchip employees. If you need further information about certain machinery or processes, please contact the Danchip personnel.
__notoc__
[[image:Front page image 20220802.JPG|right|500x500px|thumb|Photos: DTU Nanolab]]
{{CC1}}


=== Contents ===
<!--LabAdviser is a process handbook for equipment and processes at the cleanroom facilities and the characterisation facilities in building 314/307. The function and capacity of each piece of equipment is described and general process steps, eg photolithography procedures, are clarified. LabAdviser is meant to advise you to a good starting point for your cleanroom process for further optimization to meet your needs. To enter LabAdviser you need to '''log in with your DTU login'''. LabAdviser is only editable for DTU Nanolab employees. If you need further information about certain machinery or processes, please contact Nanolab personnel. Any feedback you might have on LabAdviser is welcome and can be given by mail to the LabAdviser mailbox: [mailto:labadviser@nanolab.dtu.dk labadviser@nanolab.dtu.dk]-->
[[image:160904_danchip_4454.jpg|right|450x450px]]
LabAdviser is a wiki accessible for users of the DTU Nanolab facilities. If you are not a current user,  [https://www.nanolab.dtu.dk/english '''please take a look at our homepage''']. You can also take a  [https://my.matterport.com/show/?m=n7rBdnKvgxd '''virtual tour of the DTU Nanolab cleanroom facility'''] or explore our  [https://www.youtube.com/channel/UCJhdUTUJRDNODNiC3V95RQQ '''YouTube channel'''] with a selection of training videos. <br>


*'''[[Danchip contact information|Danchip contact information]]'''
LabAdviser contains information about
*'''[[/Process flow approval|Process flow approval]]'''
*equipment at DTU Nanolab that covers micro and nano fabrication in the cleanroom facility in building 346 and surroundings (in building 346 and 347) and characterization equipment, primarily electron microscopy, at building 314 and 307. 
*'''[[Specific Process Knowledge]]'''
*fabrication steps in micro and nano fabrication that takes place at the cleanroom fabrication facility and surroundings and
**[[Specific Process Knowledge/Photolithography|Photolithography]]
*electron microscopy methods that takes place at building 314/307.
**[[Specific Process Knowledge/Thin film deposition|Thin film deposition]]
An overview of the equipment in these facilities can be found and some fabrication process flows and singles fabrication steps are described. In general LabAdviser is meant to advise you to the right equipment and to advise you to a good starting point for your micro and nano fabrication steps as for your electron microscopy work. This should not be replacing communication with the staff of the facilities but we recommend it as a good starting point before contacting the staff. To enter LabAdviser you need to '''log in with your DTU login'''. LabAdviser is only editable for the staff of the facilities. If you need further information about certain machinery or processes, please contact the relevant staff. Any feedback or input you might have to LabAdviser is welcome and can be given by mail to the LabAdviser mailbox: [mailto:labadviser@nanolab.dtu.dk labadviser@nanolab.dtu.dk]
**[[Specific Process Knowledge/Etch|Etch]]
<br>
**[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
 
**[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]]
 
**[[Specific Process Knowledge/Thermal Process|Thermal process]]
'''News in LabAdviser:''' <br/>
**[[Specific Process Knowledge/Imprinting|Imprinting]]
*The latest LabAdviser update: [[Media:Monthly_LabAdviser_update_20231110.docx|LabAdviser update send out 2023-11-10]] <br>
**[[Specific Process Knowledge/Bonding|Bonding]]
<!-- Slides from the customer meeting December 2016: [[media:Stormode 2016.pdf|2016 Customer meeting]] -->
**[[Specific Process Knowledge/Back-end processing|Back-end processing]]
*Slides from the latest Tech Forum from October 25, 2022 are here: https://sites.dtu.dk/ffunanolab
**[[Specific Process Knowledge/Characterization|Characterization]]
<br/>
**[[Specific Process Knowledge/E-beam lithography|E-beam lithography]]
 
**[[Specific Process Knowledge/III-V Process|III-V Processes]]  
== Contents ==
*'''[[Specific Process Knowledge/Wafer Information|Wafer Information]]'''
[[Image:YouTube.JPG|right|200px|thumb|DTU Nanolab on YouTube [[https://www.youtube.com/channel/UCJhdUTUJRDNODNiC3V95RQQ]]]]
*'''[[Substrates]]'''
[[Image:Virtual tour in the clean room.JPG|right|200px|thumb|Take a virtual tour in the DTU Nanolab cleanroom [[https://my.matterport.com/show/?m=n7rBdnKvgxd ]]]]
*'''[[New equipment in the pipeline]]'''
*'''[[/Introduction to LabAdviser and Processing|Introduction to LabAdviser and Micro/Nano Fabrication]]'''
*'''[[Old equipment for decommissioning]]'''
*'''[[/Introduction to LabManager|Introduction to LabManager]]'''
*'''[[Surveys and statistics]]'''
*'''[[/Process flow approval|Process flow template & approval]] (fabrication)'''
 
 
<!-- *'''[[/CEN|Characterization in building 314/307 - OLD]] -->
*'''[[/314|Characterization in building 314/307]]
*'''[[Specific Process Knowledge|Micro and Nano Fabrication Overview ]]'''
*'''[[/Courses |Courses (Introduction course, Tool Package Training's (TPT))]]
*'''[[LabAdviser/Technology Research|Some DTU Nanolab Projects - Technology Research]]'''
<!-- *'''[[/Equipment List|Equipment List]]''' -->
 
 
*'''[[Surveys and statistics|Surveys, statistics, monthly LabAdviser updates and other info.]]'''
*'''[[How to add information to LabAdviser]]'''
<!--
*'''[[/Technology Research|Under Construction]]'''
-->
 
 
<br clear="all" />
 
==Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser==
''All drawings in this section done by Jesper Hanberg @DTU Nanolab''
=== Click on [show] and see choices to the right ===
{| style="color: black;vertical-align:top" width="100%" border=0 cellpadding="4" cellspacing="0"
| colspan="2" |
|-
| style="width: 50%; vertical-align:top;"|
{| id="linkTable" border="1" cellpadding="0" cellspacing="0" style="text-align:center;"
! class="hideImage" style="display:none"| Front Image
! style="display:none"|-
! style="display:none"|-
! style="display:none"|-
|-
! class="hideImage" width="150" height="180px"| Clean your sample[[file:jehanClean.png|130px|frameless ]]
! class="hideImage" width="150" | Dry your sample [[file:jehanDry.png|130px|frameless  ]]
! class="hideImage" width="150" | Create a thin film on your sample [[file:jehanfilm.png|130px|frameless  ]]
! class="hideImage" width="150" | Dope your sample [[file:jehanDope.png|130px|frameless ]]
|-
! class="hideImage" width="150" height="180px"| Thermal treatment of your sample [[file:jehanThermal.png|130px|frameless ]]
! class="hideImage" width="150" | Make a mask on your sample[[file:jehanmask.png|130px|frameless ]]
! class="hideImage" width="150" | Transfer pattern to your sample [[file:jehanTransfer.png|130px|frameless ]]
! class="hideImage" width="150" | Define your structure directly [[file:jehandefine.jpg|130px|frameless ]]
|-
! class="hideImage" width="150" height="180px"|  Bond your samples together [[file:jehanBond.png|130px|frameless ]]
! class="hideImage" width="150" | Characterize your sample  [[file:jehanCharacterize.png|130px|frameless ]]
! class="hideImage" width="150" | Pack your sample  [[file:jehanPack.png|130px|frameless ]]
! class="hideImage" width="150" | Process flow examples [[file:processflow_b.png|130px|frameless ]]
|-
|}
 
| style="color:black; width: 50%; vertical-align: top;"|
{| class="wikitable hideable hidden" border="1" cellspacing="0" cellpadding="0"  align="left" width="400px" style="float:right;"
! style="text-align:right;" | [[image:DUV6.jpg|center|400px|thumb|Photo: DTU Nanolab]]
|-
|}
 
| style="color:black; width: 50%; vertical-align: top"|
{| class="wikitable hideable hidden" border="1" cellspacing="0" cellpadding="0"  align="left" width="430px"
! colspan="3" style="text-align:left;" | [[image:Clean your sample.png|x100px|Clean your sample]] Clean your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top" |[[Specific Process Knowledge/Wafer cleaning|Wafer cleaning]]
|Soap Sonic
|Removes dust and particles
|-
|7-up & Piranha
|Removes traces of organics and alkali ions
|-
|RCA
|Two step process to remove traces of organics and metals
|-
|5% HF
|Removes native oxide
|-
|IMEC
|Removing dust, traces of organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Dry your sample.png|x130px|Dry your sample]] Dry your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="4" valign="top" |[[Specific Process Knowledge/Wafer and sample drying|Wafer and sample drying]]
|Spin dryers
|Whole wafers
|-
|Critial point dryer
|Sensitive wafers
|-
|Ethanol fume drying
|Sensitive wafers
|-
|N2 blow drying
|N2 pistols
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="600px"
!colspan="3" style="text-align:left;" | [[image:Create a film on your sample.png|x100px|Create a layer/film on your sample]] Create a layer/film on your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|[[Specific Process Knowledge/Thermal Process/Oxidation| Thermal Process/Oxidation]]
|Thermal oxidation
|Thermal SiO2
|-
|rowspan="8" valign="top"|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]]
|Sputter deposition
|Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru <br>
Semiconductors: Si, Ge, ZnO <br>
Oxides: SiO<sub>2</sub>, ITO, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, MgO, Ta<sub>2</sub>O<sub>5</sub> Cr<sub>2</sub>O<sub>3</sub><br>
Transparent Conducting Oxides: ITO, AZO<br>
Alloys: TiW, NiCr, AlTi, NiV, AlCu, CoFe, CuTi, FeMn, MnIr, NiCo, NiFe, YSZ <br>
|-
|Thermal evaporation
|Al, Ge, Ag
|-
|E-beam evaporation
|Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Nb, Pd, Ag, Cu, W, Ta <br>
Semiconductors: Si, Ge <br>
Oxides: SiO<sub>2</sub>, TiO<sub>2</sub> <br>
Alloys: NiCr, TiAl
|-
|LPCVD
|Si<sub>3</sub>N<sub>4</sub>, SRN, SiO<sub>2</sub>, Si (poly and amorph)
|-
|PECVD
|Si<sub>3</sub>N<sub>4</sub>, SiO<sub>2</sub>, PBSG
|-
|MVD
|FDTS
|-
|Electroplating
|Ni
|-
|Epitaxial growth /MOCVD
|Al, As, Ga, In, P. doping: Si, Zn
|-
|rowspan="2" valign="top"| [[Specific Process Knowledge/Lithography/Coaters|Lithography/Coaters]]
|Spin coating
|resists, polymers
|-
|Spray coating
|resists, polymers
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Dope your sample.png|x100px|Dope your sample]] Dope your sample
|-
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top"| [[Specific Process Knowledge/Doping|Doping]]
|Ion implant
|e.g. P, B, As 
|-
|[[Specific Process Knowledge/Thin film deposition/PECVD| PECVD]]
|Deposition of SiO2 or Si3N4 doped with P,B and Ge
|-
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|LPCVD ]]
|Deposition of PolySi doped with B or P
|-
|[[Specific Process Knowledge/Thermal Process/Dope with Boron|Predeposition and drive-in]]  
|Doping Silicon wafers with boron
|-
|[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Predeposition and drive-in]]
|Doping Silicon wafers with phosphorus
 
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Thermal treat your sample.png|x100px|Thermal treatment of your sample]] Thermal treatment of your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top"|[[Specific Process Knowledge/Thermal Process|Thermal Process]]
|Annealing (>350C)
|Si, PECVD layers, Al, BCB curing, Polymer
|-
|Oxidation
|Si wafers
|-
|Doping with B/P
|Si wafers
|-
|Pyrolysis
|Resists: AZ, SU8, PDMS
|-
|Rapid Thermal Anneal (RTP)
|SiO2, Si3N4, Ti, III-V
|-
|
[[Specific Process Knowledge/Lithography/Baking| Lithography/Baking]] <br>
|Baking (<300dg)
|baking resist and polymers
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Make a mask on your sample.png|x100px|Make a mask on your sample]] Make a mask on your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top"|[[Specific Process Knowledge/Lithography| Lithography]]
|Pattern design & Mask fabrication
|
|-
|Photolithography
|UV resists
|-
|Deep UV lithography
|DUV resists
|-
|E-beam lithography
|E-beam resists
|-
|Imprinting
|Polymers
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Transfer mask pattrn to your sample.png|x100px|Transfer mask pattern to your sample]] Transfer mask pattern to your sample
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="2" valign="top"|[[Specific Process Knowledge/Etch| Etch]]
|Wet etch
|Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
|-
|Dry etch
|Any material
|-
|[[Specific Process Knowledge/Lithography/LiftOff| Lithography/Lift-off]]
|Lift-off
|Most materials
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Define your structure directly.png|x100px|Define the structure directly on your sample]] Define your structure directly
|-
!Entry page in LabAdviser
!Techniques
!Materials
|-
|rowspan="5" valign="top"|[[Specific Process Knowledge/Direct Structure Definition|Direct Structure Definition]]
|Polymer Injection molding
|Topas, PP, PE, PS
|-
|LASER micro machining
|Silicon, Metal, Graphene (on silicon), Glass (Pyrex, fused silica), TOPAS, PMMA
|-
|Dicing saw
|Silicon, Glass (Pyrex, fused silica)
|-
|[[Specific Process Knowledge/Imprinting|Imprinting]]
|TOPAS, PMMA
|-
|Hot Embosser
|Topas, PP, PE, PS, PC, PMMA, ...
|-
|[[Specific Process Knowledge/Lithography|Lithography definition]]
|SU8, AZ resists
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Bond your samples together.png|x100px|Bond your samples together]] Bond your samples together
|-
!Entry page in LabAdviser
!Techniques
|-
|rowspan="3" valign="top"|[[Specific Process Knowledge/Bonding|Bonding]]
|Eutectic bonding
|-
|Fusion bonding
|-
|Anodic bonding
|-
|[[Specific_Process_Knowledge/Etch/DryEtchProcessing/Bonding |Etch/DryEtchProcessing/Bonding]]
|Temporary bonding of wafers or chips for dry etching
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Characterize your sample.png|x100px|Characterize your sample]] Characterize your sample
|-
!Entry page in LabAdviser
!What do you need to measure?
!Technique/Method
|-
|rowspan="12" valign="top"|[[Specific Process Knowledge/Characterization|Characterization]]
|Sample Imaging, XY dimensions
|Microscopy: optical, SEM, AFM
|-
|Sample Topography
|AFM, Profiling with stylus or optical
|-
|Film thickness and optical constants
|Ellipsometry, Reflectometry, Prism Coupling
|-
|Film Stress
|Profiling with stylus or optical
|-
|Wafer thickness
|Micrometer gauge
|-
|Element analysis
|XPS, EDX, SIMS
|-
|Contact Angle
|Drop shape analyzing
|-
|Resistivity
|Four point probe, Probe station
|-
|Doping level/Carrier density
|ECV (Electrochemical Capacitance-Voltage) -profiler
|-
|Direct Bandgap
|Photoluminescence
|-
|Lattice mismatch
|X-ray diffractometer
|-
|Defects/contamination
|Particle/defect counter
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Pack your sample (back-end).png|x100px|Pack your sample (back-end)]] Pack your sample (back-end)
|-
!Entry page in LabAdviser
!Techniques
|-
|rowspan="3" valign="top"|[[Specific Process Knowledge/Back-end processing|Back-end processing]]
|Chip/die mounting
|-
|Wire bonding
|-
|Dicing
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | Process flow examples
|-
!Entry page in LabAdviser
!Topic
|-
|[[LabAdviser/Introduction_to_LabAdviser_and_Processing|Introduction to LabAdviser and Processing]]
|Solar cell flow
|-
|[[Process_flow_approval|Process flow approval]]
|Info on process flow review
|-
|[[Specific Process Knowledge/Lithography/UVLithography#Resist Overview|UV Lithography#Resist Overview]]
|UV Lithography flows
|-
|[[Specific Process Knowledge/Lithography/EBeamLithography#E-beam resists and Process Flows|EBeamLithography#E-beam resists and Process Flows]]
|E-beam lithography flows
|-
|}
 
|-
|}
 
----
<br>
 
== Contact Information for the DTU Nanolab fabrication part ==
{{DanchipInfo}}
 
<!-- The template called DanchipInfo has the address:
http://labadviser.nanolab.dtu.dk/index.php/Template:DanchipInfo -->
----
<br>
 
==DTU Nanolab Fabrication Cleanroom Naming and Phone Numbers==
===Cleanroom building 346 ground floor===
{| style="color: black;" width="100%"
| colspan="2" |
|-
 
| style="width: 50%"|
 
{| style="color: black;" width="100%"
| colspan="2" |
|-
| style="width: 40%"|
 
 
[[image:Cleanroom_naming_2017.jpg|500px|thumb|Drawing: DTU CAS Digital]]
 
|}
| style="width: 50%"|
 
 
{|border="1" cellspacing="1" cellpadding="1" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!Room number
!Where in the room
!Phone number
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!A-1
|At III-V RIE
|55 804
|-
 
|-
|-style="background:LightGrey; color:black"
!Ax2
|At the Lesker
|55 815
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!A-5
|In the corner near the furnace/plasma asher
|55 803
|-
|-
|-style="background:LightGrey; color:black"
!B-1
|In the corridor
|55 806
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!C-1
|At the corridor
|55 808
|-
 
|-
|-style="background:LightGrey; color:black"
!D-1
|The entrance room
|55 703
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!D-3
|At the KOH
|55 940
|-
 
|-
|-style="background:LightGrey; color:black"
!E-1
|By the e-beam computers
|55 943
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!E-5/E-4
|By the MLAs in E-5, by mask aligner in E-4
|55 946
|-
 
|-
|-style="background:LightGrey; color:black"
!E-6
|Furnace 6"
|55 948
|-
|-
|-style="background:WhiteSmoke; color:black"
!F-1
|III-V growth
|55 949
|-
 
|-
|-style="background:LightGrey; color:black"
!F-2
|To the right of the XRD and Ellipsometer
|55 941
|-
|-
|-style="background:WhiteSmoke; color:black"
!F-3
|DUV Stepper
|55 947
|-
 
 
|-
|-style="background:LightGrey; color:black"
!Basement 901
|Injection molder room in the basement
|55 812
|-
|-style="background:LightGrey; color:black"
!Basement 904
|To the right of the AFM
|55 813
|-
|}
|}
<br clear="all" />
 
===Basement building 346 phase 1===
[[File:Basement 346 phase 1.jpg|left|600px|thumb|Drawing: DTU CAS Digital]] <br>
<br clear="all" />
 
==DTU Nanolab building 314 and Phone Numbers==
 
{| style="color: black;" width="100%"; "text-align: center
| colspan="2" |
|-
 
| style="width: 50%"|
 
{| style="color: black;" width="100%"
| colspan="2" |
|-
| style="width: 40%"|
 
 
[[File:CEN building.jpg|600px|left|thumb|Drawing: DTU CAS Digital]]
 
|}
| style="width: 50%"|
 
{| style="color: black;" width="100%"
| colspan="2" |
|-
 
| style="width: 50%"|
 
{| style="color: black;" width="100%"
| colspan="2" |
|-
| style="width: 40%"|
 
 
|}
| style="width: 50%"|
 
 
{|border="1" cellspacing="1" cellpadding="1" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!Room number
!Description
!Phone number
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!314-011
|QFEG 200 Cryo ESEM
|56 406
|-
 
|-
|-style="background:LightGrey; color:black"
!314-014
|Tecnai T20
|56 407
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!314-032
|Prep room 1
|No phone
|-
|-
|-style="background:LightGrey; color:black"
!314-034
|AFEG 250 ESEM
|56 414
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!314-037
|Titan ETEM
|56 418
|-
 
|-
|-style="background:LightGrey; color:black"
!314-040
|Prep room 2 (Bio)
|56 413
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!314-042
|Titan ATEM
|56 409
|-
 
|-
|-style="background:LightGrey; color:black"
!314-060
|Nova NanoSEM 600
|56 412
|-
 
|-
|-style="background:WhiteSmoke; color:black"
!314-061
|Helios Nanolab
|56 411
|-
 
|}
|}
<br clear="all" />

Latest revision as of 14:45, 12 January 2024

Photos: DTU Nanolab

Unless otherwise stated, this page is written by DTU Nanolab internal

LabAdviser is a wiki accessible for users of the DTU Nanolab facilities. If you are not a current user, please take a look at our homepage. You can also take a virtual tour of the DTU Nanolab cleanroom facility or explore our YouTube channel with a selection of training videos.

LabAdviser contains information about

  • equipment at DTU Nanolab that covers micro and nano fabrication in the cleanroom facility in building 346 and surroundings (in building 346 and 347) and characterization equipment, primarily electron microscopy, at building 314 and 307.
  • fabrication steps in micro and nano fabrication that takes place at the cleanroom fabrication facility and surroundings and
  • electron microscopy methods that takes place at building 314/307.

An overview of the equipment in these facilities can be found and some fabrication process flows and singles fabrication steps are described. In general LabAdviser is meant to advise you to the right equipment and to advise you to a good starting point for your micro and nano fabrication steps as for your electron microscopy work. This should not be replacing communication with the staff of the facilities but we recommend it as a good starting point before contacting the staff. To enter LabAdviser you need to log in with your DTU login. LabAdviser is only editable for the staff of the facilities. If you need further information about certain machinery or processes, please contact the relevant staff. Any feedback or input you might have to LabAdviser is welcome and can be given by mail to the LabAdviser mailbox: labadviser@nanolab.dtu.dk


News in LabAdviser:


Contents

DTU Nanolab on YouTube [[1]]
Take a virtual tour in the DTU Nanolab cleanroom [[2]]





Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser

All drawings in this section done by Jesper Hanberg @DTU Nanolab

Click on [show] and see choices to the right

- - -
Clean your sampleJehanClean.png Dry your sample JehanDry.png Create a thin film on your sample Jehanfilm.png Dope your sample JehanDope.png
Thermal treatment of your sample JehanThermal.png Make a mask on your sampleJehanmask.png Transfer pattern to your sample JehanTransfer.png Define your structure directly Jehandefine.jpg
Bond your samples together JehanBond.png Characterize your sample JehanCharacterize.png Pack your sample JehanPack.png Process flow examples Processflow b.png


Contact Information for the DTU Nanolab fabrication part

In order to get the quickest response to training requests, process approvals, questions etc. please use the following mailboxes to DTU Nanolab - Fabrication (formerly known as Danchip).

Mailbox link Concerning
LabAdviser Mailbox labadviser@nanolab.dtu.dk Any questions or feedback to LabAdviser.
Process flow review process-flow@nanolab.dtu.dk (should work again) More about process flow review here
Training on equipment training@nanolab.dtu.dk It is our goal to answer your request regarding process flow reviews and training within 2 workdays.
E-beam training e-beam@nanolab.dtu.dk To request training on JEOL JBX-9500FSZ or Raith Eline e-beam systems.
Please study the material on the EBL Labadviser pages.
E-beam load e-beamload@nanolab.dtu.dk To request cassette loading on JEOL JBX-9500FSZ.
Mask order: Photomasks has to be ordered at Compugraphics in Procure. You can read more about the procedure for mask ordering here. It requires a specification file like this: (example spec file) and a design file (gds or cif format).

Mask Review

mask@nanolab.dtu.dk (Subject: Mask Review) Note: You have to order masks at Compugraphics via Procure.

Nanolab can offer a check of the mask design and specifications. You can read more about mask design here.

Metal wishes . .

Lesker:

metal@nanolab.dtu.dk (Subject: Lesker Metal Wishes). - See current and future materials here: Lesker status log

Temescal/Wordentec:

metal@nanolab.dtu.dk (Subject:PVD Metal Wishes) See current and future materials here:
  • Temescal
  • For Wordentec you need to contact the thin film group.
Tool change toolchange@nanolab.dtu.dk Laser: change of optics and
Polymer Injection Molding machine: change mold-tool
Commercial offers etc. sales@nanolab.dtu.dk mostly companies nanolabexternal customers
Gas-related questions DCH-Gas@nanolab.dtu.dk issues (information regarding ordering, delivery, changing etc. Mostly for internal Nanolab use
All other inquiries nanolabsupport@nanolab.dtu.dk ... or if you are in doubt


DTU Nanolab Fabrication Cleanroom Naming and Phone Numbers

Cleanroom building 346 ground floor


Drawing: DTU CAS Digital


Room number Where in the room Phone number
A-1 At III-V RIE 55 804
Ax2 At the Lesker 55 815
A-5 In the corner near the furnace/plasma asher 55 803
B-1 In the corridor 55 806
C-1 At the corridor 55 808
D-1 The entrance room 55 703
D-3 At the KOH 55 940
E-1 By the e-beam computers 55 943
E-5/E-4 By the MLAs in E-5, by mask aligner in E-4 55 946
E-6 Furnace 6" 55 948
F-1 III-V growth 55 949
F-2 To the right of the XRD and Ellipsometer 55 941
F-3 DUV Stepper 55 947
Basement 901 Injection molder room in the basement 55 812
Basement 904 To the right of the AFM 55 813


Basement building 346 phase 1

Drawing: DTU CAS Digital



DTU Nanolab building 314 and Phone Numbers


Drawing: DTU CAS Digital



Room number Description Phone number
314-011 QFEG 200 Cryo ESEM 56 406
314-014 Tecnai T20 56 407
314-032 Prep room 1 No phone
314-034 AFEG 250 ESEM 56 414
314-037 Titan ETEM 56 418
314-040 Prep room 2 (Bio) 56 413
314-042 Titan ATEM 56 409
314-060 Nova NanoSEM 600 56 412
314-061 Helios Nanolab 56 411