LabAdviser/CEN/AFEG 250 Analytical ESEM

Feedback to this page: click here

The FEI AFEG 250 FEG is a field emission scanning electron microscope with a spatial resolution of 2 nm for the ETD detector in high vacuum at 30 keV. The microscope can operate in high vacuum or low vacuum at room temperature. Our AFEG is fitted with EDS and WDS detectors, which allows for analytical measurements.

Process information

• Electron source

Field emission gun

• Accelerating voltage

500 V- 30 kV

• Resolution

2 nm at 30 kV (SE)

• Imaging detectors

Everhart-Thornley (SE/BSE), Solid State BSE, Large Field, Gaseous SE, Gaseous BSE, Gaseous Analytical, STEM, vCD and CCD Camera

• Imaging modes

High and low vacuum (130 Pa).

• Analytical capabilities

Energy dispersive X-rays (Oxford Instruments 50 mm2 X-Max silicon drift detector, MnKα resolution at 124 eV) Wave Dispersive Spectrometer

Equipment performance and process related parameters

Equipment		FEI QFEG 200 Cryo ESEM
Purpose	Vizualization and Microanalysis	Vizualization of surfaces (topography and Z contrast) Vizualization of projected image (BF STEM image) Energy Dispersive X-ray analysis
Performance	Resolution	The resolution of QFEG dependends on the sample and the operation mode!
		2 nm at 30 keV for Au on C sample with the ETD detector
Instrument specifics	Detectors	ETD- Everhart-Thornley for secondary electrons BSD- Solid state Back Scattered Detector LFD- Large Field Detector for secondary electrons GSED- Gaseous Secondary Electron Detector GBSD- Gaseous Backscattered Electron Detector GAD- Gaseous Analystical Detector STEM- right field Scanning Tramission Electron detector vCD- low voltage BSED CCD camera
	Electron source	Field Emission - Tungsten filament
	Stage (room temperature)	X, Y: 25 × 25 mm T: 0 to 60o (Full tilt require removment of cryo cold trap.) R: 360o
	WDS	Oxford Instruments Wavelength Dispersive Spectroscopy
	EDS	Oxford Instruments 50 mm2 X-Max silicon drift detector, MnKα resolution at 124 eV
	Operating pressures	High vacuum (10-4 Pa), Low vacuuml mode (up to 130Pa)
	Substrates	Sample sizes	No actual limit (limitted by stage movment and detector position).
Allowed materials		Conductors, Semiconductors,Insulators,Wet Samples, Biological (not pathogents!)