Specific Process Knowledge: Difference between revisions

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|[[Specific Process Knowledge/Thin film deposition/PECVD| Thin film deposition/PECVD]]
|[[Specific Process Knowledge/Thin film deposition/PECVD| Thin film deposition/PECVD]]
|PECVD
|PECVD
|Deposit SiO2 or Si3N4 doped with P,B and Ge
|Deposition of SiO2 or Si3N4 doped with P,B and Ge
|-
|-
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Thin film deposition/Furnace LPCVD PolySilicon]]
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Thin film deposition/Furnace LPCVD PolySilicon]]

Revision as of 15:11, 12 June 2014

2nd Level - Process Topic

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The section below here is under construction Section under construction.jpg

Overview of sample processing

Clean the sample Cleaning.jpg
Drying Samples Drying.jpg
Thermal treatment of the sample Thermal treatment 1.jpg
Bonding samples together
Characterize the sample

Overview of sample processing 2

Clean the sample
Drying Samples
Thermal treatment of the sample
Bonding samples together
Characterize the sample

Overview of sample processing 3

Clean your sample
Drying your Samples
Thermal treatment of your sample
Bonding your samples together
Characterize your sample