Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD: Revision history

28 June 2023

• curprev 10:2910:29, 28 June 2023‎ Pevo talk contribs‎ 2,530 bytes +61‎ No edit summary

25 November 2019

• curprev 17:1417:14, 25 November 2019‎ Jmli talk contribs‎ 2,469 bytes +4‎ No edit summary

23 July 2018

• curprev 09:2109:21, 23 July 2018‎ Paphol talk contribs‎ 2,465 bytes −1‎ →‎Process parameters for the standard recipes on the LPCVD TEOS furnace:

27 April 2016

• curprev 13:5013:50, 27 April 2016‎ Pevo talk contribs‎ 2,466 bytes +34‎ →‎Expected results when using the standard recipes on the LPCVD TEOS furnace:

2 April 2014

• curprev 09:3709:37, 2 April 2014‎ Pevo talk contribs‎ 2,432 bytes −25‎ →‎Expected results when using the standard recipes on the LPCVD TEOS furnace:
• curprev 09:3609:36, 2 April 2014‎ Pevo talk contribs‎ 2,457 bytes +1‎ No edit summary
• curprev 09:3209:32, 2 April 2014‎ Pevo talk contribs‎ 2,456 bytes 0‎ →‎Expected results when using the standard recipes on the LPCVD TEOS furnace:
• curprev 09:3109:31, 2 April 2014‎ Pevo talk contribs‎ 2,456 bytes 0‎ →‎Expected results when using the standard recipes on the LPCVD TEOS furnace:
• curprev 09:3009:30, 2 April 2014‎ Pevo talk contribs‎ 2,456 bytes +1‎ No edit summary
• curprev 09:3009:30, 2 April 2014‎ Pevo talk contribs‎ 2,455 bytes −164‎ →‎Expected results when using the standard recipes on the LPCVD TEOS furnace:
• curprev 09:2009:20, 2 April 2014‎ Pevo talk contribs‎ 2,619 bytes −12‎ →‎Process parameters for the standard recipes on the LPCVD TEOS furnace:

11 October 2013

• curprev 13:1113:11, 11 October 2013‎ Pevo talk contribs‎ 2,631 bytes +1‎ No edit summary
• curprev 13:1113:11, 11 October 2013‎ Pevo talk contribs‎ 2,630 bytes +258‎ No edit summary

18 April 2013

• curprev 10:5310:53, 18 April 2013‎ Pvl talk contribs‎ 2,372 bytes −3‎ →‎Expected results when using the standard recipes on the LPCVD TEOS furnace:
• curprev 10:5310:53, 18 April 2013‎ Pvl talk contribs‎ 2,375 bytes −3‎ →‎Expected results when using the standard recipes on the LPCVD TEOS furnace:

17 April 2013

• curprev 11:2511:25, 17 April 2013‎ Pvl talk contribs‎ 2,378 bytes +1‎ →‎Expected results when using the standard recipe on the LPCVD TEOS furnace:
• curprev 11:2411:24, 17 April 2013‎ Pvl talk contribs‎ 2,377 bytes −3‎ →‎Expected results when using the standard recipe on the LPCVD nitride furnace:
• curprev 11:2011:20, 17 April 2013‎ Pvl talk contribs‎ 2,380 bytes +78‎ →‎Expected results when using the standard recipe on the LPCVD nitride furnace:
• curprev 09:5709:57, 17 April 2013‎ Pvl talk contribs‎ 2,302 bytes +173‎ →‎Expected results when using the standard recipe on the LPCVD nitride furnace:

16 April 2013

• curprev 15:5915:59, 16 April 2013‎ Pvl talk contribs‎ 2,129 bytes +69‎ →‎Expected results when using the standard recipe on the LPCVD nitride furnace:

27 September 2012

• curprev 16:0316:03, 27 September 2012‎ Mdyma talk contribs‎ m 2,060 bytes 0‎ Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of TEOS using LPCVD moved to Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD
• curprev 16:0016:00, 27 September 2012‎ Mdyma talk contribs‎ 2,060 bytes −3‎ →‎Expected results when using the standard recipe on the LPCVD nitride furnace:

26 July 2012

• curprev 15:2315:23, 26 July 2012‎ Pvl talk contribs‎ 2,063 bytes −3‎ →‎Process parameters for the standard recipes on the LPCVD TEOS furnace:
• curprev 15:2315:23, 26 July 2012‎ Pvl talk contribs‎ 2,066 bytes −4‎ →‎Process parameters for the standard recipes on the LPCVD TEOS furnace:

7 July 2009

• curprev 09:3609:36, 7 July 2009‎ Pvl talk contribs‎ 2,070 bytes −1,966‎ No edit summary
• curprev 09:1109:11, 7 July 2009‎ Pvl talk contribs‎ 4,036 bytes −714‎ No edit summary
• curprev 08:5208:52, 7 July 2009‎ Pvl talk contribs‎ 4,750 bytes +4,750‎ New page: Danchip have two LPCVD furnaces for deposition of silicon nitride: A new furnace (installed in 2008) for deposi...