Deletion log

Below is a list of the most recent deletions.

12:21, 30 April 2014 Jehan talk contribs deleted page Specific Process Knowledge/Lithography/Mask Design (Tine copied page to new location (UV lithography))
10:42, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thermal Process/C1 Furnace Gate Oxide (content was: "==C1 Furnace Gate Oxide== thumb|300x300px|C1 Gate oxide furnace and oxidation of 6inch wafers:positioned in cleanroom 2 C1 Furnace Gate Oxide is a Tempress horizontal furnace for making gate oxide and other very clean o...")
10:25, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Platin (content was: "Ething of Platin can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done with IBE by sputtering with Ar ions. Platin can be etched b...")
10:23, 23 April 2014 Bghe talk contribs deleted page 3-week projects (content before blanking was: "*OPTIMERING AF PECVD PROCESSER MED HENBLIK PÅ DYRKNING AF FORSKELLIGE TYPER SILICIUMNITRID Integrated Microfluidic Mixer and Magnetic Bead Trap Torsten Lund-Olesen [http://www.mic.dtu.dk/upload/institutter/mic/forskning/...")
10:23, 23 April 2014 Bghe talk contribs deleted page Bachelor projects (content before blanking was: "*Simon Eskild Jarlgaard, Morten Bo Lindholm Mikkelsen, and Peder Skafte-Pedersen [http://www2.mic.dtu.dk/research/NIL/publications/undergraduate_reports/Midtermreport_Nanofluidics_2005.pdf "Experimental Nanofluidics - Ca...")
10:22, 23 April 2014 Bghe talk contribs deleted page How to add information to LabAdvisor (content was: "===Purpose of the LabAdvisor - sharing of knowledge=== The purpose of LabAdvisor is sharing of knowledge. In our laboratory thousands of experiments have been made and we..." (and the only contributor was "BGE"))
10:12, 23 April 2014 Bghe talk contribs deleted page Projects, Thesis and Articles (content was: "Here we have projects, thesis and articles based on work made at the DANCHIP cleanroom facility. We encourage all our cleanroom users to contribute with their work. *3-week projects *Special courses *Bachelor projects *Master th...")
10:11, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/slopedsidewalls (content was: "{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" |+ '''Process parameters''' |- ! rowspan="3" width="100"| Recipe ! rowspan="3" width="20"| Step !..." (and the only contributor was "Jml"))
10:11, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep (content was: "<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2C1_feb2011profile_030.jpg|The 30 nm zep profile image:WF_2C1_feb..." (and the only contributor was "Jml"))
10:10, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/211nmzep (content was: "<gallery caption="The profiles of the 340 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2E02_mar23_2011-030.jpg|The 30 nm zep profile image:WF_2E02_mar23..." (and the only contributor was "Jml"))
10:10, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep (content before blanking was: "<gallery caption="The profiles of the 180 nm zep resist" widths="250" heights="200" perrow="3"> image:WF_2B1_feb06_2011-030.jpg|The 30 nm zep profile image:WF_2B1_feb06_2011-060.jpg|The 60 nm zep profile image:WF_2B1_feb0...")
10:09, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys/Specific Process Knowledge/III-V Process/etch/plasys/III V RIE ETCHES (content was: "==test1== A plasma with a gas mixture of CHF<math>_3</math> and O<math>_2</math> is used to etch SiO<math>_2</math> and Si<math>_3</math>Ni<math>_4</math> dielectricas; fl..." (and the only contributor was "Tg"))
09:38, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/Coaters/Spin Track 1 + 2/Spin Track 1 + 2 processing (content was: "bla" (and the only contributor was "Taran"))
09:37, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/DUV Lithography (content was: "=THIS PAGE IS UNDER CONSTRUCTION200px= ==The DUV (Deep Ultra Violet) Lithography process== "int..." (and the only contributor was "BGE"))
09:35, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/UV Lithography (content was: " {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" |- |- |-style="background:silver; color:black" !Specific Process Knowledge/Thin film deposition/..." (and the only contributor was "Tg"))
09:34, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/EVG620 - aligner (content was: "Test evg620 - aligner" (and the only contributor was "192.38.87.76"))
09:33, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/EV - aligner (content was: "test ev -aligner 322 × 324px|thumb|The EV-aligner oven is placed in Cleanroom 3.")
09:33, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Exposure - mask aligner/KS - aligner (content was: "test ks - aligner 300x300px|thumb|The KS aligner is placed in Cleanroom 3.")
09:32, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/MKPR1000 (content was: "hgyffesff" (and the only contributor was "Elk"))
09:32, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/KS Spinner (content was: "Test KS spinner 322 × 324px|thumb|The KS spinner oven is placed in Cleanroom 3.")
09:31, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Track1 (content was: "Test track1 322 × 324px|thumb|Track 1 and 2 is placed in Cleanroom 3.")
09:31, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Track2 (content was: "Test track2" (and the only contributor was "BGE"))
09:30, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Track1 (content was: "test track1" (and the only contributor was "BGE"))
09:30, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Process flow approval (content was: "== Process Flow Approval == === Why do process flows need to be reviewed === Before implementing process flows in the DTU Danchip cleanroom facilities, the process needs ..." (and the only contributor was "Tg"))
09:29, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Photolithography/Photoresist Spinners/Maximus (content was: "Test Maximus 300x300px|thumb|The SSE spinner is placed in Cleanroom 4 Class10 yellow room.")
09:29, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD/Standard recipes, QC limits and results for the 4" nitride furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowled..." (and the only contributor was "Pevo"))
09:28, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD/Standard recipes, QC limits and results for the 6" nitride furnace (content was: " '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowled..." (and the only contributor was "Pevo"))
09:24, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD/deposition rate for STOxide (content was: "Deposition rate as a function of deposition time: Measurements done: {| border="2" cellspacing="1" cellpadding="8" |- | Deposition time [s] |Oxide thickness [nm] |Expect..." (and the only contributor was "BGE"))
09:21, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Electroplating of nickel (content was: "jjj" (and the only contributor was "Choi"))
09:19, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Wafer cleaning/7-up (content was: "==Cleaning with 7-up== 300x300px|thumb|7-up for 4" and 6" wafers to the left and for masks to the right: positioned in cleanroom 4 Image:7-up_RR3..." (and the only contributor was "BGE"))
09:19, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Sputter coater Hummer (content was: " '''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowled..." (and the only contributor was "Pevo"))
09:12, 23 April 2014 Bghe talk contribs deleted page The PROCESS HANDBOOK of DANCHIP (content was: "This wiki is the PROCESS HANDBOOK of DTU Danchip. It covers process knowledge to be used in the cleanroom facility of DTU Danchip. The aim of this book is to gather information on processing in the facility. To begin with we aim at enter...")
09:12, 23 April 2014 Bghe talk contribs deleted page Substrates/III-V (content was: "Various types of materials such as InP, GaN, AlGaAsP collectively called 'III-V'-materials can be processed in various pieces of equipment.The cleanliness of the equipment should be carefully considered prior to subjecting electrical act...")
09:10, 23 April 2014 Bghe talk contribs deleted page Specific etch equipment (content was: "== Choose a dry etch epuipment == *RIE (Reactive Ion Etch) *ASE (Advanced Silicon Etch) *AOE (Advanced Oxide Etch)" (and the only contributor was "192.38.87.76"))
16:35, 22 April 2014 Bghe talk contribs deleted page Sputtering of TiW in Wordentec (content before blanking was: "== Deposition rate == Depening on the settings (pressure and effect) during the sputtering process, the roughness and grain size of the deposited layer can be different. More about how the roughness changes cna be seen [...")
16:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano4 (content was: "== The Sinano4.0 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano4.0''' |- ! rowspan="6" align="center"| Recipe | Gas | Cl2 20 scc..." (and the only contributor was "Jml"))
16:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano36 (content was: "== The Sinano3.6 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.6''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
16:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano35 (content was: "== The Sinano3.5 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.5''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
16:34, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano34 (content was: "== The Sinano3.4 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.4''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
16:33, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano32 (content was: "== The Sinano3.2 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.2''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
16:33, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano31 (content was: "== The Sinano3.1 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.1''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 3 scc..." (and the only contributor was "Jml"))
16:33, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano3 (content was: "== The Sinano3.0 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.0''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
16:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan37 (content was: "{| {{table}} | align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | align="center" style="background:#f0f0f0;"|'''''' | align="center" style="back..." (and the only contributor was "Jml"))
16:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan332 (content was: "== The Sinano3.32 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.32''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 s..." (and the only contributor was "Jml"))
16:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331-2 (content was: "== The Sinano3.31 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.31''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 s..." (and the only contributor was "Jml"))
16:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan331 (content was: "== The Sinano3.31 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.31''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 s..." (and the only contributor was "Jml"))
16:32, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33-2 (content was: "== The Sinano3.3 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.3''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
16:31, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP Metal Etcher/Sinan33 (content was: "== The Sinano3.3 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.3''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl3 5 scc..." (and the only contributor was "Jml"))
16:29, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/ICP (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledg..." (and the only contributor was "Jml"))
16:28, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300/IBE Ti etch (content before blanking was: "==Results from the acceptance test in February 2011== '''Acceptance test for Ti etch:''' {| border="2" cellspacing="0" cellpadding="2" |- !style="background:silver; color:black;" align="left"|. |style="background:WhiteS...")