All public logs
Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
- 15:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
- 15:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
- 15:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
- 15:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
- 15:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
- 15:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
- 15:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
- 14:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
- 14:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
- 14:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
- 14:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
- 14:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
- 11:16, 25 February 2011 Jml talk contribs uploaded File:Crystalbond2.jpg (Problems with crystalbond on Pegasus: A wafer bonded to a carrier has slided off during process.)
- 16:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-30 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
- 16:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-120 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
- 12:05, 20 October 2010 Jml talk contribs changed group membership for Tg from danchip and administrator to danchip, administrator and bureaucrat
- 12:05, 20 October 2010 Jml talk contribs changed group membership for Tg from danchip to danchip and administrator
- 14:28, 23 April 2010 Jml talk contribs changed group membership for Jve from (none) to danchip
- 17:13, 25 February 2010 Jml talk contribs changed group membership for Co from (none) to nanotech
- 11:10, 25 February 2010 Jml talk contribs changed group membership for Frd from (none) to nanotech
- 11:10, 25 February 2010 Jml talk contribs changed group membership for Lic from (none) to nanotech
- 14:52, 28 January 2010 Jml talk contribs changed group membership for Krm from danchip and nanotech to danchip
- 14:51, 28 January 2010 Jml talk contribs changed group membership for Krm from nanotech to nanotech and danchip
- 17:05, 18 September 2009 Jml talk contribs uploaded File:Lor data sheet.pdf (Data sheet for LOR resist)
- 15:31, 18 September 2009 Jml talk contribs uploaded File:Processing Procedures for Dry-Etch CYCLOTENE.pdf (A description of the processing procedures for BCB)
- 14:34, 18 September 2009 Jml talk contribs deleted page \mask clean (content was: '=== Using 7-up for cleaning of masks === The cleaning bath consists of H2SO4 and should be mixed with Ammonium Persulfate for proper cleansing. Check that the back/righ...' (and the only contributor was 'Jml'))
- 14:33, 18 September 2009 Jml talk contribs deleted page Specific Process Knowledge/III-V Process/photolithography/mask clean (content was: '=== Using 7-up for cleaning of masks === The cleaning bath consists of H2SO4 and should be mixed with Ammonium Persulfate for proper cleansing. Check that the back/righ...' (and the only contributor was 'Jml'))
- 11:23, 1 July 2009 Jml talk contribs changed group membership for Khr from (none) to nanotech
- 13:16, 10 June 2009 Jml talk contribs changed group membership for Ksnilt from (none) to industry
- 09:05, 20 May 2009 Jml talk contribs changed group membership for Gni from (none) to dtu
- 09:05, 20 May 2009 Jml talk contribs changed group membership for Seg from (none) to nanotech
- 09:04, 20 May 2009 Jml talk contribs changed group membership for Ala from (none) to fotonik
- 10:13, 24 April 2009 Jml talk contribs changed group membership for Rmal from (none) to fotonik
- 10:12, 24 April 2009 Jml talk contribs changed group membership for Lus from (none) to nanotech
- 16:13, 26 February 2009 Jml talk contribs changed group membership for Esb from (none) to fotonik
- 10:42, 23 February 2009 Jml talk contribs changed group membership for Jam from (none) to nanotech
- 10:41, 23 February 2009 Jml talk contribs changed group membership for Mal from (none) to nanotech
- 13:29, 10 February 2009 Jml talk contribs changed group membership for Pav from (none) to nanotech
- 13:52, 5 February 2009 Jml talk contribs uploaded File:UnCoatedBlockCopolymer-2f.jpg (SEM FEI LoVac image of a block copolymer: Sixth single scan of specific area.)
- 13:51, 5 February 2009 Jml talk contribs uploaded File:UnCoatedBlockCopolymer-2e.jpg (SEM FEI LoVac image of a block copolymer: Fifth single scan of specific area.)
- 13:51, 5 February 2009 Jml talk contribs uploaded File:UnCoatedBlockCopolymer-2d.jpg (SEM FEI LoVac image of a block copolymer: Fourth single scan of specific area.)
- 13:50, 5 February 2009 Jml talk contribs uploaded File:UnCoatedBlockCopolymer-2c.jpg (SEM FEI LoVac image of a block copolymer: Third single scan of specific area.)
- 13:50, 5 February 2009 Jml talk contribs uploaded File:UnCoatedBlockCopolymer-2b.jpg (SEM FEI LoVac image of a block copolymer: Second single scan of specific area.)
- 13:49, 5 February 2009 Jml talk contribs uploaded File:UnCoatedBlockCopolymer-2a.jpg (SEM FEI LoVac image of a block copolymer: First single scan of specific area)
- 16:33, 3 February 2009 Jml talk contribs uploaded File:UnCoatedBlockCopolymer-1.jpg (SEM FEI LoVac image of a block copolymer.)
- 16:32, 3 February 2009 Jml talk contribs uploaded File:CoatedBlockCopolymer.jpg (SEM FEI HiVac TLD image of a coated block copolymer.)
- 14:09, 28 January 2009 Jml talk contribs changed group membership for Blg from (none) to industry
- 11:06, 27 January 2009 Jml talk contribs changed group membership for Tan from (none) to fotonik
- 12:35, 14 January 2009 Jml talk contribs changed group membership for Emh from (none) to danchip
- 12:34, 14 January 2009 Jml talk contribs changed group membership for Mid from (none) to nanotech