Specific Process Knowledge/Lithography/Descum: Difference between revisions
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==Comparison of ashing rate between substrate sizes== | ==Comparison of ashing rate between substrate sizes== | ||
It is assumed that the low power descum rates for different substrate sizes follows the same pattern | It is assumed that the low power descum rates, for different substrate sizes, follows the same pattern as the high power ashing rates, which can be seen [[Specific_Process_Knowledge/Lithography/Strip#Comparison_of_ashing_rate_between_substrate_sizes_for_plasma_asher_4_&_5|here]]. | ||
=Plasma Asher 5= | =Plasma Asher 5= | ||