Template:SEM comparison table 314 - Revision history

Mmat at 09:46, 17 June 2025

2025-06-17T09:46:49Z

← Older revision		Revision as of 11:46, 17 June 2025
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	! Equipment		! Equipment
	<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->		<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->
	![[LabAdviser/314/SEM/Nova\|Nova]]		![[LabAdviser/314/Microscopy 314-307/SEM/Nova\|Nova]]
	![[LabAdviser/314/SEM/QFEG\|QFEG]]		![[LabAdviser/314/Microscopy 314-307/SEM/QFEG\|QFEG]]
	![[LabAdviser/314/SEM/AFEG\|AFEG]]		![[LabAdviser/314/Microscopy 314-307/SEM/AFEG\|AFEG]]
	![[LabAdviser/314/Microscopy 314-307/FIB/Helios\|Helios]]		![[LabAdviser/314/Microscopy 314-307/FIB/Helios\|Helios]]
	\|-		\|-

Mmat at 09:39, 17 June 2025

2025-06-17T09:39:31Z

← Older revision		Revision as of 11:39, 17 June 2025
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	![[LabAdviser/314/SEM/QFEG\|QFEG]]		![[LabAdviser/314/SEM/QFEG\|QFEG]]
	![[LabAdviser/314/SEM/AFEG\|AFEG]]		![[LabAdviser/314/SEM/AFEG\|AFEG]]
	![[LabAdviser/314/FIB/Helios\|Helios]]		![[LabAdviser/314/Microscopy 314-307/FIB/Helios\|Helios]]
	\|-		\|-

Afull at 07:21, 26 March 2020

2020-03-26T07:21:35Z

← Older revision		Revision as of 09:21, 26 March 2020
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	* Z 50mm		* Z 50mm
	* R 360⁰		* R 360⁰
	* T 70⁰ ~~Manua~~		* T 70⁰ Manual
	\|		\|
	* X 150mm Piezo		* X 150mm Piezo

Afull at 06:12, 25 March 2020

2020-03-25T06:12:08Z

← Older revision		Revision as of 08:12, 25 March 2020
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	*X Ray Analysis with EDS		*X Ray Analysis with EDS
	*Crystallographic analysis using EBSD and both On and Off axis TKD		*Crystallographic analysis using EBSD and both On and Off axis TKD
			* In-situ experiments with Heating and Gas injection
	\|		\|
	*Conductive samples in High Vac		*Conductive samples in High Vac
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	*Conductive samples in High Vac		*Conductive samples in High Vac
	*Charge reduction in Low Vac		*Charge reduction in Low Vac
			*X Ray Analysis with EDS and WDS
	\|		\|
	*Conductive samples in High Vac		*Conductive samples in High Vac
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	** > 12nm at 3kV (SE) -->		** > 12nm at 3kV (SE) -->
	\|		\|
	*High Vacuum operation:		*High Vacuum operation in Mode II:
	**1.0 nm at 15 kV (TLD detector and optimum working distance)		**1.0 nm at 15 kV (TLD detector and optimum working distance)
	**1.8 nm at 1 kV (TLD detector and optimum working distance)		**1.8 nm at 1 kV (TLD detector and optimum working distance)
	*Low Vacuum operation:		*Low Vacuum operation in Mode II:
	**1.5 nm at 10 kV (Helix detector and optimum working distance)		**1.5 nm at 10 kV (Helix detector and optimum working distance)
	**1.8 nm at 3 kV (Helix detector and optimum working distance)		**1.8 nm at 3 kV (Helix detector and optimum working distance)
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	**3.0 nm at 3 kV (SE)		**3.0 nm at 3 kV (SE)
	\|		\|
	* Electron Column		* Electron Column Operation in Mode II
	**0.8nm @15kV		**0.8nm @15kV
	**0.9nm @1kV		**0.9nm @1kV

Afull at 05:50, 25 March 2020

2020-03-25T05:50:32Z

← Older revision		Revision as of 07:50, 25 March 2020
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	** 4.0nm at 30kV (BSE)		** 4.0nm at 30kV (BSE)
	** > 12nm at 3kV (SE) -->		** > 12nm at 3kV (SE) -->
	\|B		\|
			*High Vacuum operation:
			**1.0 nm at 15 kV (TLD detector and optimum working distance)
			**1.8 nm at 1 kV (TLD detector and optimum working distance)
			*Low Vacuum operation:
			**1.5 nm at 10 kV (Helix detector and optimum working distance)
			**1.8 nm at 3 kV (Helix detector and optimum working distance)

	\|		\|
	* High vacuum		* High vacuum

Jenk at 10:43, 24 March 2020

2020-03-24T10:43:39Z

← Older revision		Revision as of 12:43, 24 March 2020
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	{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"
	\|-		\|-

	\|-		\|-
	\|-style="background:silver; color:black"		\|-style="background:silver; color:black" valign="top"
	! Equipment		! Equipment
	<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->		<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->
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	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black" valign="top"
	!Purpose		!Purpose
	<!-- \|		<!-- \|
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	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black" valign="top"
	!Equipment position		!Equipment position
	<!-- \|CEN Building 314 -->		<!-- \|CEN Building 314 -->
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	\|-		\|-
	\|style="background:Whitesmoke; color:black" rowspan="2" align="left" \|'''Resolution'''		\|style="background:Whitesmoke; color:black" rowspan="2" align="left" valign="top" \|'''Resolution'''
	\|style="background:Whitesmoke; color:black" colspan="5" align="center"\| The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon		\|style="background:Whitesmoke; color:black" colspan="5" align="center" valign="top"\| The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon
	\|-		\|-
			\|- valign="top"
	<!-- \|		<!-- \|
	* High-vacuum		* High-vacuum
	•3.0nm at 30kV (SE)		**3.0nm at 30kV (SE)
	~~•10nm~~ at 3kV (SE)		**10nm at 3kV (SE)
	•4.0nm at 30kV (BSE)		**4.0nm at 30kV (BSE)
	* Low-vacuum		* Low-vacuum
	•3.0nm at 30kV (SE)		**3.0nm at 30kV (SE)
	• 4.0nm at 30kV (BSE)		** 4.0nm at 30kV (BSE)
	• > 12nm at 3kV (SE) -->		** > 12nm at 3kV (SE) -->
	\|B		\|B
	\|		\|
	* High vacuum		* High vacuum
	• 0.8 nm at 30 kV (STEM)		**0.8 nm at 30 kV (STEM)
	• 1.0 nm at 30 kV (SE)		**1.0 nm at 30 kV (SE)
	• 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)		**2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
	*High vacuum with beam deceleration option		*High vacuum with beam deceleration option
	• 3.0 nm at 1 kV (BD mode + BSE)		**3.0 nm at 1 kV (BD mode + BSE)

	* Low vacuum - 1.4 nm at 30 kV (SE)		* Low vacuum - 1.4 nm at 30 kV (SE)
	•2.5 nm at 30 kV (BSE)		**2.5 nm at 30 kV (BSE)
	•3.0 nm at 3 kV (SE)		**3.0 nm at 3 kV (SE)
	* Extended vacuum mode (ESEM)		* Extended vacuum mode (ESEM)
	•1.4 nm at 30 kV (SE)		**1.4 nm at 30 kV (SE)
	\|		\|
	* High vacuum		* High vacuum
	• 0.8 nm at 30 kV (STEM)		**0.8 nm at 30 kV (STEM)
	• 1.0 nm at 30 kV (SE)		**1.0 nm at 30 kV (SE)
	• 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)		**2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
	*High vacuum with beam deceleration option		*High vacuum with beam deceleration option
	• 3.0 nm at 1 kV (BD mode + BSE)		**3.0 nm at 1 kV (BD mode + BSE)

	* Low vacuum - 1.4 nm at 30 kV (SE)		* Low vacuum - 1.4 nm at 30 kV (SE)
	•2.5 nm at 30 kV (BSE)		**2.5 nm at 30 kV (BSE)
	•3.0 nm at 3 kV (SE)		**3.0 nm at 3 kV (SE)
	\|		\|
	* Electron Column		* Electron Column
	•0.8nm @15kV		**0.8nm @15kV
	•0.9nm @1kV		**0.9nm @1kV
	* Ion Column		* Ion Column
	•4.5nm @ 30kV		**4.5nm @ 30kV
	\|-		\|-
	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black" valign="top"
	!Detectors		!Detectors
	<!-- \|		<!-- \|
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	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black" valign="top"
	!Stage specifications		!Stage specifications
	<!-- \|		<!-- \|
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	\|-		\|-

	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black" valign="top"
	!Max sample size		!Max sample size
	\|style="background:Whitesmoke; color:black" colspan="5" align="center"\| Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size		\|style="background:Whitesmoke; color:black" colspan="5" align="center"\| Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size

Jenk at 10:31, 24 March 2020

2020-03-24T10:31:23Z

← Older revision		Revision as of 12:31, 24 March 2020
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	\|-		\|-
	\|style="background:~~LightGrey~~; color:black" rowspan="2" align="~~center~~" \|Resolution		\|style="background:Whitesmoke; color:black" rowspan="2" align="left" \|'''Resolution'''
	\|style="background:Whitesmoke; color:black" colspan="5" align="center"\| The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon		\|style="background:Whitesmoke; color:black" colspan="5" align="center"\| The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon
	\|-		\|-

Jenk at 10:27, 24 March 2020

2020-03-24T10:27:23Z

← Older revision		Revision as of 12:27, 24 March 2020
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	! Equipment		! Equipment
	<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->		<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->
	![[~~Specific Process Knowledge~~/~~Characterization~~/SEM ~~FEI~~ Nova ~~600 NanoSEM~~\|~~SEM FEI~~ Nova ~~600 NanoSEM~~]]		![[LabAdviser/314/SEM/Nova\|Nova]]
	![[~~Specific Process Knowledge~~/~~Characterization~~/SEM ~~FEI Quanta 200 ESEM FEG~~\|~~SEM FEI~~ QFEG ~~200 Cryo ESEM~~]]		![[LabAdviser/314/SEM/QFEG\|QFEG]]
	~~<!--~~ ![[~~Specific Process Knowledge~~/~~Characterization~~/SEM ~~FEI QUANTA 200 3D~~\|~~FIB-SEM FEI QUANTA 200 3D~~]] ~~-->~~		![[LabAdviser/314/SEM/AFEG\|AFEG]]
	![[~~Specific Process Knowledge~~/~~Characterization~~/~~Dual Beam FEI~~ Helios ~~Nanolab 600~~\|~~Dual Beam FEI~~ Helios ~~Nanolab 600~~]]		![[LabAdviser/314/FIB/Helios\|Helios]]
	\|-		\|-

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	*Cryogenic sample fixing/stabilization using cryo stage		*Cryogenic sample fixing/stabilization using cryo stage
	*X Ray Analysis with EDS		*X Ray Analysis with EDS
	~~<!--~~ \|		\|
	*Conductive samples in High Vac		*Conductive samples in High Vac
	*Charge reduction in Low Vac		*Charge reduction in Low Vac
	*Micro and Nano milling/fabrication using various gases and FIB -->
	\|		\|
	*Conductive samples in High Vac		*Conductive samples in High Vac
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	!Equipment position		!Equipment position
	<!-- \|CEN Building 314 -->		<!-- \|CEN Building 314 -->
	\|~~CEN~~ Building 314		\|Building 314 Room 060
	\|~~CEN~~ Building 314		\|Building 314 Room 011
	~~<!--~~ \|~~CEN~~ Building ~~307~~ Room ~~111 -->~~		\|Building 314 Room 034
	\|~~CEN~~ Building 314		\|Building 314 Room 061
	\|-		\|-

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	* Extended vacuum mode (ESEM)		* Extended vacuum mode (ESEM)
	•1.4 nm at 30 kV (SE)		•1.4 nm at 30 kV (SE)
	~~<!--~~ \|		\|
	* ~~Electron Column~~		* High vacuum
	~~•5nm @30kV~~		• 0.8 nm at 30 kV (STEM)
	* ~~Ion Column~~		• 1.0 nm at 30 kV (SE)
	~~•7nm @ 30kV~~ -->		• 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
			*High vacuum with beam deceleration option
			• 3.0 nm at 1 kV (BD mode + BSE)

			* Low vacuum - 1.4 nm at 30 kV (SE)
			•2.5 nm at 30 kV (BSE)
			•3.0 nm at 3 kV (SE)
	\|		\|
	* Electron Column		* Electron Column
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	*EDS X Ray by energy		*EDS X Ray by energy
	*STEM Scanning Transmission Electron Microscopy		*STEM Scanning Transmission Electron Microscopy
	~~<!--~~ \|		\|
	*ETD Secondary Electrons		*ETD Secondary Electrons
	*BSED Back Scatter Electrons		*BSED Back Scatter Electrons
	*LVD/LFD Low Vac SE		*LVD/LFD Low Vac SE
			*GSED ESEM SE
			*EDS X Ray by energy
	*STEM Scanning Transmission Electron Microscopy		*STEM Scanning Transmission Electron Microscopy
	*GAD Low VAC BSED
	*GSED ESEM SE -->
	\|		\|
	*ETD/TLD Secondary Electrons		*ETD/TLD Secondary Electrons
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	* R 360⁰		* R 360⁰
	* T 70⁰ Manual		* T 70⁰ Manual
	~~<!--~~ \|		\|
	* X ~~100mm~~		* X 50mm
	* Y ~~100mm~~		* Y 50mm
	* Z 50mm		* Z 50mm
	* R 360⁰		* R 360⁰
	* T 70⁰ ~~-->~~		* T 70⁰ Manua
	\|		\|
	* X 150mm Piezo		* X 150mm Piezo
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	\| B		\| B
	\| C		\| C
	~~<!--~~ \| D ~~-->~~		\| D
	\| E		\| E
	\|-		\|-

Jenk: Created page with "{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" |- |- |-style="background:silver; color:black" ! Equipment

← Older revision		Revision as of 11:46, 17 June 2025
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	! Equipment		! Equipment
	<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->		<!-- ![[Specific Process Knowledge/Characterization/SEM Inspect S\|SEM Inspect S]] -->
	![[LabAdviser/314/SEM/Nova\|Nova]]		![[LabAdviser/314/Microscopy 314-307/SEM/Nova\|Nova]]
	![[LabAdviser/314/SEM/QFEG\|QFEG]]		![[LabAdviser/314/Microscopy 314-307/SEM/QFEG\|QFEG]]
	![[LabAdviser/314/SEM/AFEG\|AFEG]]		![[LabAdviser/314/Microscopy 314-307/SEM/AFEG\|AFEG]]
	![[LabAdviser/314/Microscopy 314-307/FIB/Helios\|Helios]]		![[LabAdviser/314/Microscopy 314-307/FIB/Helios\|Helios]]
	\|-		\|-