Specific Process Knowledge/Wafer cleaning/IMEC - Revision history

Mmat: /* The IMEC process: Cleaning of wafers prior to fusion bonding */

2025-05-05T14:34:26Z

The IMEC process: Cleaning of wafers prior to fusion bonding

← Older revision		Revision as of 16:34, 5 May 2025
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	Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br>
	Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br>
	~~Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=380 <i>Optional Bath</i> <b>(Currently not in operation!)</b>]'<br>~~

Mmat: /* The IMEC process: Cleaning of wafers prior to fusion bonding */

2025-05-05T14:31:57Z

The IMEC process: Cleaning of wafers prior to fusion bonding

← Older revision		Revision as of 16:31, 5 May 2025
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	The IMEC cleaning process is used in circumstances where extraordinary clean wafers are required. It is primarily intended for cleaning wafers prior to fusion bonding. This procedure is based on the IMEC cleaning process with slight modifications by Karen Birkelund.: ''M. Meuris et al. "The IMEC clean: A new concept for particle and metal removal on Si surfaces.", Solid state Technology, Vol. 38, Issue 7, pp 109-113, 1995.''		The IMEC cleaning process is used in circumstances where extraordinary clean wafers are required. It is primarily intended for cleaning wafers prior to fusion bonding. This procedure is based on the IMEC cleaning process with slight modifications by Karen Birkelund.: ''M. Meuris et al. "The IMEC clean: A new concept for particle and metal removal on Si surfaces.", Solid state Technology, Vol. 38, Issue 7, pp 109-113, 1995.''




	'''Information about equipment relevant to this procedure can be found in LabManager:'''<br>		'''Information about equipment relevant to this procedure can be found in LabManager:'''<br>

Mmat: /* The IMEC process: Cleaning of wafers prior to fusion bonding */

2025-05-05T14:31:14Z

The IMEC process: Cleaning of wafers prior to fusion bonding

← Older revision		Revision as of 16:31, 5 May 2025
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	<br>		<br>
	===The IMEC process: Cleaning of wafers prior to fusion bonding===		===The IMEC process: Cleaning of wafers prior to fusion bonding===
	The IMEC cleaning process is used in circumstances where extraordinary clean wafers are required. It is primarily intended for cleaning wafers prior to fusion bonding. This procedure is based on the IMEC cleaning process: ''M. Meuris et al. "The IMEC clean: A new concept for particle and metal removal on Si surfaces.", Solid state Technology, Vol. 38, Issue 7, pp 109-113, 1995.'' ~~Has been slightly modified by Karen Birkelund.~~		The IMEC cleaning process is used in circumstances where extraordinary clean wafers are required. It is primarily intended for cleaning wafers prior to fusion bonding. This procedure is based on the IMEC cleaning process with slight modifications by Karen Birkelund.: ''M. Meuris et al. "The IMEC clean: A new concept for particle and metal removal on Si surfaces.", Solid state Technology, Vol. 38, Issue 7, pp 109-113, 1995.''

Mmat at 14:29, 5 May 2025

2025-05-05T14:29:38Z

← Older revision		Revision as of 16:29, 5 May 2025
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/IMEC click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/IMEC click here]'''

	==Please note: This elaborate cleaning method is only used very rarely. It has turned out that at DTU Nanolab an '[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA RCA clean]' prior to bonding (and do the cleaning and bonding very early in the morning with few people and thus lower particle level in the cleanroom) gives the best results. If you for some reason still prefer to do the IMEC clean described below, please contact DTU Nanolab to make arrangements. We do not have dedicated IMEC equipment which is immediately ready for use.==		'''Please note: This elaborate cleaning method is only used very rarely. It has turned out that at DTU Nanolab an '[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA RCA clean]' prior to bonding (and do the cleaning and bonding very early in the morning with few people and thus lower particle level in the cleanroom) gives the best results. If you for some reason still prefer to do the IMEC clean described below, please contact DTU Nanolab to make arrangements. We do not have dedicated IMEC equipment which is immediately ready for use.
			<br>
	<br>		<br>
	===The IMEC process: Cleaning of wafers prior to fusion bonding===		===The IMEC process: Cleaning of wafers prior to fusion bonding===

Mmat at 14:28, 5 May 2025

2025-05-05T14:28:44Z

← Older revision		Revision as of 16:28, 5 May 2025
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/IMEC click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/IMEC click here]'''

	~~'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''~~

	~~'''All links to Labmanager requires login.'''~~


	~~<br \>~~

	==Please note: This elaborate cleaning method is only used very rarely. It has turned out that at DTU Nanolab an '[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA RCA clean]' prior to bonding (and do the cleaning and bonding very early in the morning with few people and thus lower particle level in the cleanroom) gives the best results. If you for some reason still prefer to do the IMEC clean described below, please contact DTU Nanolab to make arrangements. We do not have dedicated IMEC equipment which is immediately ready for use.==		==Please note: This elaborate cleaning method is only used very rarely. It has turned out that at DTU Nanolab an '[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA RCA clean]' prior to bonding (and do the cleaning and bonding very early in the morning with few people and thus lower particle level in the cleanroom) gives the best results. If you for some reason still prefer to do the IMEC clean described below, please contact DTU Nanolab to make arrangements. We do not have dedicated IMEC equipment which is immediately ready for use.==

Mbec at 10:07, 1 February 2023

2023-02-01T10:07:10Z

← Older revision		Revision as of 12:07, 1 February 2023
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/IMEC click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/IMEC click here]'''

			'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''

			'''All links to Labmanager requires login.'''


	<br \>		<br \>

Jmli: /* The IMEC process: Cleaning of wafers prior to fusion bonding */

2019-11-25T12:56:48Z

The IMEC process: Cleaning of wafers prior to fusion bonding

← Older revision		Revision as of 14:56, 25 November 2019
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	Temp: 25<sup>o</sup>C<br>		Temp: 25<sup>o</sup>C<br>
	Time: 100 sec		Time: 100 sec
	\|<b>Make an appointment some days in advance with a ~~Danchip~~ employee to help you with this step!</b>		\|<b>Make an appointment some days in advance with a Nanolab employee to help you with this step!</b>
	*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch)		*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch)
	*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood		*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood

Jmli: /* The IMEC process: Cleaning of wafers prior to fusion bonding */

2019-11-25T12:56:25Z

The IMEC process: Cleaning of wafers prior to fusion bonding

← Older revision		Revision as of 14:56, 25 November 2019
Line 63:		Line 63:
	*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch)		*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch)
	*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood		*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood
	*Ask a ~~Danchip~~ employee to help you filling the solution into the 'Optional Bath' tank!		*Ask a Nanolab employee to help you filling the solution into the 'Optional Bath' tank!
	\|		\|
	.		.

Jmli: /* The IMEC process: Cleaning of wafers prior to fusion bonding */

2019-11-25T12:18:08Z

The IMEC process: Cleaning of wafers prior to fusion bonding

← Older revision		Revision as of 14:18, 25 November 2019
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	'''Information about equipment relevant to this procedure can be found in LabManager:'''<br>		'''Information about equipment relevant to this procedure can be found in LabManager:'''<br>
	<!-- remember to remove the type of documents that are not present -->		<!-- remember to remove the type of documents that are not present -->

	~~Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br>~~
	~~Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02: Acids/bases]'<br>~~
	~~Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=411 Wet bench 03: Wafer and mask cleaning]'<br>~~
	~~Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br>~~
	~~Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br>~~
	~~Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=380 <i>Optional Bath</i> <b>(Currently not in operation!)</b>]'<br>~~

	Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br>

Jmli: /* The IMEC process: Cleaning of wafers prior to fusion bonding */

2019-11-25T12:17:20Z

The IMEC process: Cleaning of wafers prior to fusion bonding

← Older revision		Revision as of 14:17, 25 November 2019
Line 20:		Line 20:
	Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=380 <i>Optional Bath</i> <b>(Currently not in operation!)</b>]'<br>		Info page for '[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=380 <i>Optional Bath</i> <b>(Currently not in operation!)</b>]'<br>

	Info page for '[http://labmanager~~.nanolab~~.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br>
	Info page for '[http://labmanager~~.nanolab~~.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02: Acids/bases]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02: Acids/bases]'<br>
	Info page for '[http://labmanager~~.nanolab~~.dtu.dk/function.php?module=Machine&view=view&mach=411 Wet bench 03: Wafer and mask cleaning]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=411 Wet bench 03: Wafer and mask cleaning]'<br>
	Info page for '[http://labmanager~~.nanolab~~.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br>
	Info page for '[http://labmanager~~.nanolab~~.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br>
	Info page for '[http://labmanager~~.nanolab~~.dtu.dk/function.php?module=Machine&view=view&mach=380 <i>Optional Bath</i> <b>(Currently not in operation!)</b>]'<br>		Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=380 <i>Optional Bath</i> <b>(Currently not in operation!)</b>]'<br>