Specific Process Knowledge/Wafer cleaning/Bring samples into cleanroom - Revision history

Mmat: /* Procedure */

2025-05-12T14:16:53Z

Procedure

← Older revision		Revision as of 16:16, 12 May 2025
Line 25:		Line 25:

	===Procedure===		===Procedure===
	The bench in gowning contains a sink, an ultrasonics bath and a rinse bath for rinsing samples cleaned in Triton X-100. To clean the samples:		The bench in the gowning contains a sink, an ultrasonics bath and a rinse bath for rinsing samples cleaned in Triton X-100. To clean the samples:

	*Find a suitable holder for your samples in the cupboard below the baths		*Find a suitable holder for your samples in the cupboard below the baths
	*Make sure the ultrasonics bath dump valve is closed		*Make sure the ultrasonics bath dump valve is closed
	*Fill the ultrasonics bath (the one made of metal) with DI water ~~(enough to completely cover~~ your samples)		*Fill the ultrasonics bath (the one made of metal) with DI water until your samples are completely covered
	*Add 20 - 30 drops of diluted Triton X-100 detergent ~~(From~~ the rinse/spray bottle. Do '''''NOT''''' use undiluted Triton X-100)		*Add 20 - 30 drops of diluted Triton X-100 detergent from the rinse/spray bottle. Do '''''NOT''''' use undiluted Triton X-100
	*Close the bath lid to minimize noise from the ultrasonics bath		*Close the bath lid to minimize noise from the ultrasonics bath
	*Start ~~ultrasonics~~ on the front panel		*Start the ultrasound on the front panel
	*Leave ~~sample~~ in ultrasonics for 10 min		*Leave the samples in ultrasonics for 10 min
	*Switch off ~~ultrasonics~~		*Switch off ultrasound
	*Fill rinse bath (the one made in plastic) with DI water and rinse your samples		*Fill the rinse bath (the one made in plastic) with DI water and rinse your samples thoroughly
	*Remove ~~samples~~ and dry ~~them~~		*Remove and dry your samples
	*Dump the Triton X-100 solution and rinse ~~baths to drain~~. Rinse tanks with DI water. Leave dump valves open so the baths drain completely		*Dump the Triton X-100 solution and rinse bath. Rinse both tanks with DI water. Leave dump valves open so the baths drain completely
	*Continue with [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha ~~piranha~~].		*Continue with [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha Piranha] cleaning.

Mmat: /* Bringing samples into the DTU Nanolab cleanroom */

2025-05-12T14:12:20Z

Bringing samples into the DTU Nanolab cleanroom

← Older revision		Revision as of 16:12, 12 May 2025
Line 7:		Line 7:

	=Bringing samples into the DTU Nanolab cleanroom=		=Bringing samples into the DTU Nanolab cleanroom=
	~~To avoid cross contamination of fabrication tools and in order to keep particle levels at a minimum it is in general not allowed~~ to bring substrates ~~processed~~ outside ~~the cleanroom~~ into ~~the~~ cleanroom. ~~Users who~~ need to ~~bring this type of substrates into the cleanroom for processing or characterization must obtain permission to do so. This can be obtained by filling~~ out the [~~[:File~~:Request to bring Samples into CR v1.51~~.docx\|Request to bring samples into cleanroom form]~~] and ~~submitting~~ it to [mailto:~~training~~@nanolab.dtu.dk ~~training~~@nanolab.dtu.dk].		You must obtain permission from our Fabrication Support team to bring any substrates from outside into our cleanroom. You need to fill out the form [https://labmanager.dtu.dk/view_binary.php?fileId=5457 "'''Request to bring Samples into CR v1.51"'''] and submit it to [mailto:nanolabsupport@nanolab.dtu.dk nanolabsupport@nanolab.dtu.dk]. Please note that permission is granted on an individual basis. This means that each user must request permission separately. However, you may use an existing request form from a colleague.

	If permission is ~~granted~~ the ~~standard cleaning process~~ for the approved substrates ~~are~~		Substrates manufactured or processed from other cleanroom environments with similar or higher level of cleaniness might be taken into our cleanroom without cleaning (but still require granted permission). Other samples must be cleaned using our standard cleaning method described below. Exceptions may be possible, depending on your substrate and the equipment you would like to use.

			To avoid cross contamination of fabrication tools and in order to keep particle levels at a minimum, it is generally not allowed to bring substrates processed outside the cleanroom into the cleanroom, e.g. after dicing. Users who need to bring this type of substrates into the cleanroom for processing or characterization must obtain permission to do so.

			'''Standard Cleaning Process for the approved substrates'''
	# Triton-X soap cleaning as described below		# Triton-X soap cleaning as described below
	# 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide)		# 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide)

	If the samples can not handle ~~such a~~ cleaning ~~process~~ it must be specified in the form and an alternative cleaning process must be suggested by the user.		If the samples can not handle this cleaning procedure, it must be specified in the request form and an alternative cleaning process must be suggested by the user.

Mmat at 07:19, 9 April 2025

2025-04-09T07:19:30Z

← Older revision		Revision as of 09:19, 9 April 2025
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	==Triton-X soap cleaning==		==Triton-X soap cleaning==
	[[Image:Sonic-clean.jpg\|300x300px\|thumb\|Soap sonic clean placed in the wash bench in the changing room (gowning). ]]		[[Image:Sonic-clean.jpg\|300x300px\|thumb\|Soap sonic clean placed in the wash bench in the changing room (gowning). ]]
	The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a ~~nonionic~~ detergent which is metal ion free. This detergent is added to reduce surface tension and thus ~~help~~ removing particles from the samples to be cleaned.		The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a non-ionic detergent which is metal ion-free. This detergent is added to reduce surface tension and thus helps removing particles from the samples to be cleaned.

	===Procedure===		===Procedure===

Mmat at 10:00, 4 April 2025

2025-04-04T10:00:59Z

← Older revision		Revision as of 12:00, 4 April 2025
Line 1:		Line 1:
	'''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/Cleaning_with_Soap_Sonic click here]'''		'''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/Cleaning_with_Soap_Sonic click here]'''

	~~'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''~~		{{cc-nanolab}}

	'''All links to Labmanager requires login.'''		'''All links to Labmanager requires login.'''

Thope: Created page with "'''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/Cleaning_with_Soap_Sonic click here]''' '''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.''' '''All links to Labmanager requires login.''' =Bringing samples into the DTU Nanolab cleanroom= To avoid cross contamination of fabricat..."

2025-04-02T12:28:38Z

Created page with "'''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/Cleaning_with_Soap_Sonic click here]''' '''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.''' '''All links to Labmanager requires login.''' =Bringing samples into the DTU Nanolab cleanroom= To avoid cross contamination of fabricat..."

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'''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/Cleaning_with_Soap_Sonic click here]'''

'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''

'''All links to Labmanager requires login.'''

=Bringing samples into the DTU Nanolab cleanroom=
To avoid cross contamination of fabrication tools and in order to keep particle levels at a minimum it is in general not allowed to bring substrates processed outside the cleanroom into the cleanroom. Users who need to bring this type of substrates into the cleanroom for processing or characterization must obtain permission to do so. This can be obtained by filling out the [[:File:Request to bring Samples into CR v1.51.docx|Request to bring samples into cleanroom form]] and submitting it to [mailto:training@nanolab.dtu.dk training@nanolab.dtu.dk].

If permission is granted the standard cleaning process for the approved substrates are
# Triton-X soap cleaning as described below
# 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide)

If the samples can not handle such a cleaning process it must be specified in the form and an alternative cleaning process must be suggested by the user.

==Triton-X soap cleaning==
[[Image:Sonic-clean.jpg|300x300px|thumb|Soap sonic clean placed in the wash bench in the changing room (gowning). ]]
The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a nonionic detergent which is metal ion free. This detergent is added to reduce surface tension and thus help removing particles from the samples to be cleaned.

===Procedure===
The bench in gowning contains a sink, an ultrasonics bath and a rinse bath for rinsing samples cleaned in Triton X-100. To clean the samples:

*Find a suitable holder for your samples in the cupboard below the baths
*Make sure the ultrasonics bath dump valve is closed
*Fill the ultrasonics bath (the one made of metal) with DI water (enough to completely cover your samples)
*Add 20 - 30 drops of diluted Triton X-100 detergent (From the rinse/spray bottle. Do '''''NOT''''' use undiluted Triton X-100)
*Close the bath lid to minimize noise from the ultrasonics bath
*Start ultrasonics on the front panel
*Leave sample in ultrasonics for 10 min
*Switch off ultrasonics
*Fill rinse bath (the one made in plastic) with DI water and rinse your samples
*Remove samples and dry them
*Dump the Triton X-100 solution and rinse baths to drain. Rinse tanks with DI water. Leave dump valves open so the baths drain completely
*Continue with [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha piranha].