Specific Process Knowledge/Wafer and sample drying/Critical Point Dryer - Revision history

Mmat at 14:53, 27 May 2025

2025-05-27T14:53:36Z

← Older revision		Revision as of 16:53, 27 May 2025
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	~~'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''~~		{{cc-nanolab}}

	'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''		'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''

Rkch at 10:57, 7 February 2023

2023-02-07T10:57:14Z

← Older revision		Revision as of 12:57, 7 February 2023
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	An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures.		An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures.

			-->

Rkch: /* Comparison of samples dried in air and with Critical Point Dryer */

2023-02-07T10:56:18Z

Comparison of samples dried in air and with Critical Point Dryer

← Older revision		Revision as of 12:56, 7 February 2023
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			<!-- copyright issue rkc

	==Comparison of samples dried in air and with Critical Point Dryer==		==Comparison of samples dried in air and with Critical Point Dryer==
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Rkch at 15:14, 6 February 2023

2023-02-06T15:14:59Z

← Older revision		Revision as of 17:14, 6 February 2023
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			'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''

			'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''

	'''Feedback to this page''': '''[mailto:pvd@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_and_sample_drying/Critical_Point_Dryer&action=edit click here]'''		'''Feedback to this page''': '''[mailto:pvd@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_and_sample_drying/Critical_Point_Dryer&action=edit click here]'''

Choi: /* Critical Point Dryer */

2019-02-07T13:13:09Z

Critical Point Dryer

← Older revision		Revision as of 15:13, 7 February 2019
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	In the critical point dryer, samples are dried in ~~LCO~~<math>_2</math>. In the drying process, the sample is first put into Isopropanol for at least 1 hour, and loaded into the machine. When the machine is started ~~(press "Fill")~~, the isopropanol is exchanged for liquid CO<math>_2</math>. When there is only CO<math>_2</math> in the machine, the pressure and temperature in the chamber is raised, above the so called “critical point”. In this ~~way~~, there is ~~never~~ a liquid/gas ~~interface~~, but instead the ~~liquid~~ is ~~turned into~~ a ~~mixture of equal parts of gas and liquid~~. Because of this, the problem with surface tension, which destroys the fragile structures through capillary forces, is avoided.		In the critical point dryer, samples are dried in supercritical CO<math>_2</math>. In the drying process, the sample is first put into Isopropanol for at least 1 hour, and then loaded into the machine. When the machine is started, the isopropanol is exchanged for liquid CO<math>_2</math>. When there is only CO<math>_2</math> in the machine, the pressure and temperature in the chamber is raised, above the so called “critical point”. At this point, there is no longer a liquid/gas interfacen, but instead the CO<math>_2</math> is in a supercritical state. Because of this, the problem with surface tension, which destroys the fragile structures through capillary forces, is avoided.

	==Equipment performance and process related parameters==		==Equipment performance and process related parameters==

Choi: /* Equipment performance and process related parameters */

2019-02-07T13:04:16Z

Equipment performance and process related parameters

← Older revision		Revision as of 15:04, 7 February 2019
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	*Pieces (up to 10x10mm)		*Pieces (up to 10x10mm)
	\|-		\|-
	\| style="background:LightGrey; color:black"\|~~Substrate material~~ allowed		\| style="background:LightGrey; color:black"\|Materials allowed
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*~~Silicon wafers~~		*Please consult the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=254 Critical Point Dryer cross contamination sheet]
	*Quartz wafers
	*Pyrex wafers
	*InAlP
	*GaAs
	\|-
	~~\| style~~=~~"background:LightGrey; color:black"\|Material allowed on the substrate~~
	~~\|style~~=~~"background:WhiteSmoke; color:black"\|~~
	*Silicon oxide
	*Silicon nitride
	*Poly Silicon
	*SU-8
	\|-		\|-
	\|}		\|}

Choi: /* Critical Point Dryer */

2019-02-07T11:53:38Z

Critical Point Dryer

← Older revision		Revision as of 13:53, 7 February 2019
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	<!-- give the link to the equipment info page in LabManager: -->		<!-- give the link to the equipment info page in LabManager: -->
	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&~~page_id~~=~~169~~ Critical Point Dryer in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=254 Critical Point Dryer in LabManager]

Mdyma: /* Equipment performance and process related parameters */

2016-08-17T11:57:20Z

Equipment performance and process related parameters

← Older revision		Revision as of 13:57, 17 August 2016
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	!style="background:silver; color:black" align="left" valign="top" rowspan="2"\|Process parameter range		!style="background:silver; color:black" align="left" valign="top" rowspan="2"\|Process parameter range
	\|style="background:LightGrey; color:black"\|Process Temperature		\|style="background:LightGrey; color:black"\|Process Temperature
	\|style="background:WhiteSmoke; color:black"\|0<sup>o</sup>C to 45<sup>o</sup>C		\|style="background:WhiteSmoke; color:black"\|0 <sup>o</sup>C to 45 <sup>o</sup>C
	\|-		\|-
	\|style="background:LightGrey; color:black"\|Process pressure		\|style="background:LightGrey; color:black"\|Process pressure
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	\|-		\|-
	\|}		\|}


	==Comparison of samples dried in air and with Critical Point Dryer==		==Comparison of samples dried in air and with Critical Point Dryer==

Paphol: /* Comparison of samples dried in air and with Critical Point Dryer */

2016-06-29T09:25:28Z

Comparison of samples dried in air and with Critical Point Dryer

← Older revision		Revision as of 11:25, 29 June 2016
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			[[Image:SiN cantilever dried CPD nr7.jpg\|350x350px\|left\|thumb\|Dried with Critical Point Dryer.]]

			'''Dried with the Critical Point Dryer'''. The cantilevers structures are free hanging after the drying.




	~~[[Image:SiN cantilever dried CPD nr7.jpg\|350x350px\|left\|thumb\|Dried with Critical Point Dryer.]]~~




	~~'''Dried with the Critical Point Dryer'''. The cantilevers structures are free hanging after the drying.~~

Paphol: /* Comparison of samples dried in air and with Critical Point Dryer */

2016-06-29T09:25:03Z

Comparison of samples dried in air and with Critical Point Dryer

← Older revision		Revision as of 11:25, 29 June 2016
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			[[Image:SiN cantilever dried CPD nr7.jpg\|350x350px\|left\|thumb\|Dried with Critical Point Dryer.]]







	~~[[Image:SiN cantilever dried CPD nr7.jpg\|350x350px\|left\|thumb\|Dried with Critical Point Dryer.]]~~

	'''Dried with the Critical Point Dryer'''. The cantilevers structures are free hanging after the drying.		'''Dried with the Critical Point Dryer'''. The cantilevers structures are free hanging after the drying.