Specific Process Knowledge/Wafer and sample drying - Revision history

Mmat at 13:48, 12 February 2025

2025-02-12T13:48:40Z

← Older revision		Revision as of 15:48, 12 February 2025
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_and_sample_drying click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_and_sample_drying click here]'''

	~~'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''~~

	=Drying Comparison Table=		=Drying Comparison Table=

Rkch: /* Spin dryers */

2024-11-20T07:45:50Z

Spin dryers

← Older revision		Revision as of 09:45, 20 November 2024
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	'''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3] [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=~~323~~][https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=~~408~~ Spin dryer ~~5]Spindryer~~ 6 (8")'''		'''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3] [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=408 Spin dryer 5] [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=323 Spin dryer 6 (8")]'''

Rkch: /* Spin dryers */

2024-11-20T07:44:41Z

Spin dryers

← Older revision		Revision as of 09:44, 20 November 2024
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	'''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3]'''		'''The user manual, technical information, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=157 Spin dryer 2] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=158 Spin dryer 3] [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=323][https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=408 Spin dryer 5]Spindryer 6 (8")'''

Rkch: /* Drying Comparison Table */

2024-11-20T07:42:06Z

Drying Comparison Table

← Older revision		Revision as of 09:42, 20 November 2024
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	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2\|Spin dryer 2]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2\|Spin dryer 2]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3\|Spin dryer 3]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3\|Spin dryer 3]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4\|Spin dryer 5]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 5\|Spin dryer 5]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4\|Spin dryer 6]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 6\|Spin dryer 6]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]

Rkch: /* Drying Comparison Table */

2024-11-20T07:40:43Z

Drying Comparison Table

← Older revision		Revision as of 09:40, 20 November 2024
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	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2\|Spin dryer 2]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2\|Spin dryer 2]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3\|Spin dryer 3]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3\|Spin dryer 3]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4\|Spin dryer 4]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4\|Spin dryer 5]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 5\|Spin dryer 5]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4\|Spin dryer 6]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]
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	<br clear="all" />		<br clear="all" />

	== Spin dryer 4 ==		== Spin dryer 5 ==

	[[File:spinDryer_4.jpg\|640px\|thumb\|right]]		[[File:spinDryer_4.jpg\|640px\|thumb\|right]]

	Spin dryer 4 is located in D-3 between the HF vapor phase etcher and wet bench 07.		Spin dryer 5 is located in D-3 between the HF vapor phase etcher and wet bench 07.
	*Top chamber: 100 mm wafers		*Top chamber: 100 mm wafers
	*Bottom chamber: 150 mm wafers		*Bottom chamber: 150 mm wafers
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	<br clear="all" />		<br clear="all" />

	== Spin dryer 5 ==		== Spin dryer 6 ==

	[[File:spinDryer_5.jpg\|640px\|thumb\|right]]		[[File:spinDryer_5.jpg\|640px\|thumb\|right]]

	Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.		Spin dryer 6 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.

	<br clear="all" /><br clear="all" />		<br clear="all" /><br clear="all" />

Kabi: /* Spin dryer 4 */

2024-11-19T14:17:42Z

Spin dryer 4

← Older revision		Revision as of 16:17, 19 November 2024
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	Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.		Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.

	<br clear="all" />		<br clear="all" /><br clear="all" />

	~~= Ethanol fume dryer =~~

	If your wafers are fragile or having thin membranes, cantilevers or suspended bridges that risk to stick or adhere to the surface it can be a good idea to dry your wafers in the ethanol fume dryer. Ethanol is heated to 70°C and your wafers are placed in the fumes of Ethanol which will make the water evaporate from the surface.
	~~The Ethanol dryer is placed on a shelf or trolly in D-3 and looks like a US bath. Describtion on how to use is written on the bath.~~


	<br clear="all" />

	= Nitrogen guns =		= Nitrogen guns =

Kabi: /* Drying Comparison Table */

2024-11-19T14:16:01Z

Drying Comparison Table

← Older revision		Revision as of 16:16, 19 November 2024
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	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 5\|Spin dryer 5]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 5\|Spin dryer 5]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]
	~~\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Ethanol fume dryer\|Ethanol fume dryer]]~~
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]
	\|-		\|-
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	\|		\|
	*D-3		*D-3
	\|
	*C-1
	\|		\|
	*In fumehoods and at chemical benches		*In fumehoods and at chemical benches
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	*Drying		*Drying
	*Rinsing + drying		*Rinsing + drying
	\|
	*Drying sensitive samples. E.g. with cantilevers
	\|		\|
	*Drying sensitive samples. E.g. with cantilevers		*Drying sensitive samples. E.g. with cantilevers
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	*1 to 5 wafers per run. Sizes: 2”, 4" or 6"		*1 to 5 wafers per run. Sizes: 2”, 4" or 6"
	* Pieces (up to 10x10mm)		* Pieces (up to 10x10mm)
	\|
	*50 mm wafers: 1-25
	*100 mm wafers: 1-25
	*Pieces if a suitable carrier is available
	\|		\|
	*One sample at a time		*One sample at a time
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	*InAlP, GaAs		*InAlP, GaAs
	*SU8		*SU8
	\|
	*No restriction except for polymers
	\|		\|
	*No restriction		*No restriction

Jehem: /* Drying Comparison Table */

2024-09-30T11:49:58Z

Drying Comparison Table

← Older revision		Revision as of 13:49, 30 September 2024
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	!Batch size		!Batch size
	\|		\|
	*~~1-25~~ 100 mm wafers		*100 mm wafers: 1-25
	*1-25 150 mm wafers		*150 mm wafers: 1-25
	\|		\|
	*~~1-25~~ 100 mm wafers		*100 mm wafers: 1-25
	*1-25 150 mm wafers		*150 mm wafers: 1-25
	\|		\|
	*~~1-25~~ 100 mm wafers		*100 mm wafers: 1-25
	*1-25 150 mm wafers		*150 mm wafers: 1-25
	\|		\|
	*~~1-25~~ 100 mm wafers		*100 mm wafers: 1-25
	*1-25 150 mm wafers		*150 mm wafers: 1-25
	*1-25 200 mm wafers		*200 mm wafers: 1-25
	\|		\|
	*1 to 5 wafers per run. Sizes: 2”, 4" or 6"		*1 to 5 wafers per run. Sizes: 2”, 4" or 6"
	* Pieces (up to 10x10mm)		* Pieces (up to 10x10mm)
	\|		\|
	*~~1-25~~ 50 mm wafers		*50 mm wafers: 1-25
	*1-25 100 mm wafers		*100 mm wafers: 1-25
	*Pieces if a suitable carrier is available		*Pieces if a suitable carrier is available
	\|		\|

Jehem: /* Spin dryer 5 */

2024-09-30T11:47:38Z

Spin dryer 5

← Older revision		Revision as of 13:47, 30 September 2024
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	== Spin dryer 5 ==		== Spin dryer 5 ==

	[[File:spinDryer_5.~~JPG~~\|640px\|thumb\|right]]		[[File:spinDryer_5.jpg\|640px\|thumb\|right]]

	Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.		Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.

Jehem: /* Spin dryer 5 */

2024-09-30T11:47:29Z

Spin dryer 5

← Older revision		Revision as of 13:47, 30 September 2024
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	== Spin dryer 5 ==		== Spin dryer 5 ==

	[[File:~~Spin_dryer_5~~.JPG\|640px\|thumb\|right]]		[[File:spinDryer_5.JPG\|640px\|thumb\|right]]

	Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.		Spin dryer 5 is located in F-3 Next to the Developer: TMAH stepper. It has a single process chamber that is capable of processing 100 mm, 150 mm and 200 mm wafers. The wafer size is easily changed, by changing the rotor insert frame.

← Older revision		Revision as of 09:42, 20 November 2024
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	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2\|Spin dryer 2]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 2\|Spin dryer 2]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3\|Spin dryer 3]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 3\|Spin dryer 3]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4\|Spin dryer 5]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 5\|Spin dryer 5]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 4\|Spin dryer 6]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Spin dryer 6\|Spin dryer 6]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying/Critical Point Dryer\|Critical point dryer]]
	\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]		\|[[Specific_Process_Knowledge/Wafer_and_sample_drying #Nitrogen guns\|N<sub>2</sub> guns]]