Specific Process Knowledge/Thin film deposition/Physimeca - Revision history

Mmat: /* Changing auto and emission current (experienced users only) */

2025-06-10T14:33:19Z

Changing auto and emission current (experienced users only)

← Older revision		Revision as of 16:33, 10 June 2025
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	You can use the steps above as starting point when making new programs (other thicknesses, rates, tilt etc.)		You can use the steps above as starting point when making new programs (other thicknesses, rates, tilt etc.)

	== Changing ~~auto~~ and ~~emission current~~ (''experienced users only'') ==		== Changing Auto and Emission Current (''experienced users only'') ==
	If the actual power during deposition is significantly different than the target value (e.g. off by a few % you may change the genius values).		If the actual power during deposition is significantly different than the target value (e.g. off by a few % you may change the genius values).

Mmat: /* Equipment performance and process related parameters Physimeca */

2025-06-10T14:33:03Z

Equipment performance and process related parameters Physimeca

← Older revision		Revision as of 16:33, 10 June 2025
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	'''*''' ''For thicknesses above 2000 Å special permission is required (contact thinfilm@nanolab.dtu.dk).''		'''*''' ''For thicknesses above 2000 Å special permission is required (contact thinfilm@nanolab.dtu.dk).''

			==Calibration of Physimeca (''experienced users only'')==

			As of 16/6/2008, we will use a new system to compensate for "drift" without having to change e.g. 20 gold programs for each refilling.
			The power setting during deposition is a fraction of the "auto-emission current" on the genius system.
			In order to compensate for drift in the system the auto and max emission current on the genius is adjusted to achieve the rates at the set powers below
			This way it should not be necessary to adjust the programs every time, but experienced users will have to occasionally adjust the genius setting.

			{\| border="2" cellspacing="0" cellpadding="4"
			\| rowspan=2 \|Reference deposition (step)
			\| rowspan=2 \|Material
			\| rowspan=2 \|Pocket
			\| rowspan=2 \|Rate (Å/s)
			\| rowspan=2 \|At power (%)
			\| colspan="2" align="center"\| Example of max emission current (6-2008)
			\|-
			\| mA
			\| ~mA for rate
			\|-
			\| Ti100nm-5A-cal
			\| Ti
			\| 1
			\| 5
			\| 70
			\| 160
			\| 112
			\|-
			\| Pt100nm-5A-cal
			\| Pt
			\| 2
			\| 5
			\| 80
			\| 460
			\| 368
			\|-
			\| Au100nm-10A-cal
			\| Au
			\| 3
			\| 10
			\| 80
			\| 450
			\| 360
			\|-
			\| Ni100nm-5A-cal
			\| Ni
			\| 4
			\| 5
			\| 70
			\| 250
			\| 175
			\|-
			\| Ge100nm-5A-cal
			\| Ge
			\| 5
			\| 5
			\| 70
			\| 190
			\| 133
			\|-
			\| Cr100nm-5A-cal
			\| Cr
			\| 6
			\| 5
			\| 70
			\| 110
			\| 77
			\|-
			\| Pd100nm-5A-cal
			\| Pd
			\| 6
			\| 5
			\| 70
			\| 160
			\| 112
			\|-
			\|}

			The tooling factor has been determined to ~110 for 100nm layers (lot, 6-2008). It will of course have a small dependence on material and rate.

			You can use the steps above as starting point when making new programs (other thicknesses, rates, tilt etc.)

			== Changing auto and emission current (''experienced users only'') ==
			If the actual power during deposition is significantly different than the target value (e.g. off by a few % you may change the genius values).

			Calculate new auto emission current: Inew="good" current during deposition / target power, e.g. 167mA/0.7 = 240mA (new max emission)

			# Use genius remote:
			# Switch to manual mode.
			# Switch to chosen material
			# Go to set data and down to auto emission and max emission .
			# Change both to the new value and note this in the user log.
			# Go to save/load and save values
			# Switch back to remote mode on genius.

Mmat: /* Calibration of Physimeca - for experienced users only */

2025-06-10T14:29:32Z

Calibration of Physimeca - for experienced users only

← Older revision		Revision as of 16:29, 10 June 2025
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	'''*''' ''For thicknesses above 2000 Å special permission is required (contact thinfilm@nanolab.dtu.dk).''		'''*''' ''For thicknesses above 2000 Å special permission is required (contact thinfilm@nanolab.dtu.dk).''

	~~== [[/Physimeca_calibration\|Calibration of Physimeca]] '' - for experienced users only'' ==~~

Mmat at 14:29, 10 June 2025

2025-06-10T14:29:19Z

← Older revision		Revision as of 16:29, 10 June 2025
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	[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=151 Physimeca in LabManager]		[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=151 Physimeca in LabManager]
			<br>
	<br ~~clear="all" /~~>		<br>

	==Equipment performance and process related parameters Physimeca==		==Equipment performance and process related parameters Physimeca==

Mmat: /* Physimeca */

2025-06-10T14:28:43Z

Physimeca

← Older revision		Revision as of 16:28, 10 June 2025
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	[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=151 Physimeca in LabManager]		[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=151 Physimeca in LabManager]


	<br clear="all" />		<br clear="all" />

Mmat: /* Physimeca */

2025-06-10T14:28:31Z

Physimeca

← Older revision		Revision as of 16:28, 10 June 2025
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	Physimeca is a system for deposition of metals through electron-beam evaporation.		Physimeca is a system for deposition of metals through electron-beam evaporation.

Mmat at 14:28, 10 June 2025

2025-06-10T14:28:23Z

← Older revision		Revision as of 16:28, 10 June 2025
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Physimeca click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Physimeca click here]'''

	~~<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>~~

	[[Category: Equipment\|Thin film Physimeca]]		[[Category: Equipment\|Thin film Physimeca]]
	[[Category: Thin Film Deposition\|Physimeca]]		[[Category: Thin Film Deposition\|Physimeca]]

	~~== Physimeca -~~ <span style="color:Red"> ~~This tool~~ has been ~~decommissioned~~</span>==		'''<span style="color:Red">The Physimeca has been decomissioned and is no longer available.</span>'''

			== Physimeca ==
	[[image:Physimeca.jpg\|430x430px\|right\|thumb\|The Physicmeca, Located in cleanroom B-1.]]		[[image:Physimeca.jpg\|430x430px\|right\|thumb\|The Physicmeca, Located in cleanroom B-1.]]

Paphol at 08:45, 6 June 2023

2023-06-06T08:45:36Z

← Older revision		Revision as of 10:45, 6 June 2023
Line 1:		Line 1:
	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Physimeca click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Physimeca click here]'''

			<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>

	[[Category: Equipment\|Thin film Physimeca]]		[[Category: Equipment\|Thin film Physimeca]]

Reet: /* Physimeca */ added that physimeca has been decomimssioned

2022-05-31T13:47:18Z

Physimeca: added that physimeca has been decomimssioned

← Older revision		Revision as of 15:47, 31 May 2022
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	[[Category: Thin Film Deposition\|Physimeca]]		[[Category: Thin Film Deposition\|Physimeca]]

	== Physimeca ==		== Physimeca - <span style="color:Red"> This tool has been decommissioned</span>==
	[[image:Physimeca.jpg\|430x430px\|right\|thumb\|The Physicmeca, Located in cleanroom B-1.]]		[[image:Physimeca.jpg\|430x430px\|right\|thumb\|The Physicmeca, Located in cleanroom B-1.]]

Paphol: /* Equipment performance and process related parameters Physimeca */

2020-02-10T11:53:36Z

Equipment performance and process related parameters Physimeca

← Older revision		Revision as of 13:53, 10 February 2020
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	\|-		\|-
	!style="background:silver; color:black" align="left" valign="top" rowspan="3"\|Substrates		!style="background:silver; color:black" align="left" valign="top" rowspan="3"\|Substrates
	\|style="background:LightGrey; color:black"\|~~Batch~~ size		\|style="background:LightGrey; color:black"\|Sample size
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*2 or 4" wafers		*one 2" or 4" wafers
	*Or several smaller pieces		*Or several smaller pieces