Specific Process Knowledge/Thin film deposition/MVD - Revision history

Rkch at 07:29, 8 October 2025

2025-10-08T07:29:28Z

← Older revision		Revision as of 09:29, 8 October 2025
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	'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''		'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''

	[[Category: Equipment\|Thin film MVD]]		[[index.php?title=Category:Equipment\|Thin film MVD]]
	[[Category: Thin Film Deposition\|MVD]]		[[index.php?title=Category:Thin Film Deposition\|MVD]]

	== The Molecular Vapor Deposition tool ==		== The Molecular Vapor Deposition tool ==
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	The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At DTU Nanolab the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.		The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At DTU Nanolab the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.

			'''As per Jan 2025 the O2 plasma is no longer possible to use, we recommend to use a plasma asher before use and then run Flat2NP and Stamp2NP respectively, where NP is for No Plasma. - rkc'''

Jehem at 12:52, 10 May 2023

2023-05-10T12:52:32Z

← Older revision		Revision as of 14:52, 10 May 2023
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''		'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''

Jmli at 15:11, 25 November 2019

2019-11-25T15:11:08Z

← Older revision		Revision as of 17:11, 25 November 2019
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	'''Feedback to this page''': '''[mailto:photolith@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''		'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''

	[[Category: Equipment\|Thin film MVD]]		[[Category: Equipment\|Thin film MVD]]
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	[[image:Mvd.jpg\|200x200px\|right\|thumb\|The MVD is located in cleanroom A-1]]		[[image:Mvd.jpg\|200x200px\|right\|thumb\|The MVD is located in cleanroom A-1]]

	The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At ~~Danchip~~ the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.		The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At DTU Nanolab the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.


	'''The user manual, user APV, and contact information can be found in LabManager:'''		'''The user manual, user APV, and contact information can be found in LabManager:'''

	[http://labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=199 MVD in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=199 MVD in LabManager]

	==Process information==		==Process information==

Taran at 10:16, 24 January 2018

2018-01-24T10:16:13Z

← Older revision		Revision as of 12:16, 24 January 2018
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	== The Molecular Vapor Deposition tool ==		== The Molecular Vapor Deposition tool ==

	[[image:Mvd.jpg\|200x200px\|right\|thumb\|The MVD is located in cleanroom D-3]]		[[image:Mvd.jpg\|200x200px\|right\|thumb\|The MVD is located in cleanroom A-1]]

	The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At Danchip the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.		The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At Danchip the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.

Taran: /* Equipment performance and process related parameters */

2016-01-29T10:24:39Z

Equipment performance and process related parameters

← Older revision		Revision as of 12:24, 29 January 2016
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	\| style="background:LightGrey; color:black"\|Allowed materials		\| style="background:LightGrey; color:black"\|Allowed materials
	\|style="background:WhiteSmoke; color:black" align="center" colspan="2"\|		\|style="background:WhiteSmoke; color:black" align="center" colspan="2"\|
	All cleanroom materials except ~~iron~~ and ~~steel~~		All cleanroom materials except steel and other ferrous materials
	\|-		\|-
	\|style="background:LightGrey; color:black"\|Batch		\|style="background:LightGrey; color:black"\|Batch

Taran: /* Equipment performance and process related parameters */

2016-01-22T14:10:40Z

Equipment performance and process related parameters

← Older revision		Revision as of 16:10, 22 January 2016
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	\| style="background:LightGrey; color:black"\|Allowed materials		\| style="background:LightGrey; color:black"\|Allowed materials
	\|style="background:WhiteSmoke; color:black" align="center" colspan="2"\|		\|style="background:WhiteSmoke; color:black" align="center" colspan="2"\|
	All cleanroom materials		All cleanroom materials except iron and steel
	\|-		\|-
	\|style="background:LightGrey; color:black"\|Batch		\|style="background:LightGrey; color:black"\|Batch

Bghe at 13:10, 25 August 2014

2014-08-25T13:10:50Z

← Older revision		Revision as of 15:10, 25 August 2014
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	'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''		'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''

	[[Category: Equipment\|MVD]]		[[Category: Equipment\|Thin film MVD]]
	[[Category: Thin Film Deposition\|MVD]]		[[Category: Thin Film Deposition\|MVD]]

Bghe at 12:24, 25 August 2014

2014-08-25T12:24:43Z

← Older revision		Revision as of 14:24, 25 August 2014
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	'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''		'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''

	[[Category: Equipment]]		[[Category: Equipment\|MVD]]
	[[Category: Thin Film Deposition]]		[[Category: Thin Film Deposition\|MVD]]

	== The Molecular Vapor Deposition tool ==		== The Molecular Vapor Deposition tool ==

Bghe at 12:07, 25 August 2014

2014-08-25T12:07:32Z

← Older revision		Revision as of 14:07, 25 August 2014
Line 1:		Line 1:
	'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''		'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/MVD click here]'''

			[[Category: Equipment]]
			[[Category: Thin Film Deposition]]

	== The Molecular Vapor Deposition tool ==		== The Molecular Vapor Deposition tool ==

Bghe: /* The Molecular Vapor Deposition tool */

2014-02-17T13:32:58Z

The Molecular Vapor Deposition tool

← Older revision		Revision as of 15:32, 17 February 2014
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	== The Molecular Vapor Deposition tool ==		== The Molecular Vapor Deposition tool ==

	[[image:Mvd.jpg\|200x200px\|right\|thumb\|The MVD is located in cleanroom 4]]		[[image:Mvd.jpg\|200x200px\|right\|thumb\|The MVD is located in cleanroom D-3]]

	The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At Danchip the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.		The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At Danchip the MVD is an essential tool for nanoimprint lithography, where it is used to create antistiction coatings on the imprint stamps.