Specific Process Knowledge/Thin film deposition/Deposition of Niobium - Revision history

Mmat: /* Deposition of Nb */

2025-08-09T12:56:43Z

Deposition of Nb

← Older revision		Revision as of 14:56, 9 August 2025
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	= Deposition of Nb =		= Deposition of Niobium =
	Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment.		Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment.

Mmat at 12:56, 9 August 2025

2025-08-09T12:56:30Z

← Older revision		Revision as of 14:56, 9 August 2025
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			= Deposition of Nb =
	'''Feedback to this page''': '''[mailto:LabAdviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium click here]'''

	~~<i> This page is written by <b>DTU Nanolab staff</b></i>~~

	== Deposition of Nb ==
	Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment.		Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment.

Reet: /* Deposition of Nb */

2025-07-07T21:13:51Z

Deposition of Nb

← Older revision		Revision as of 23:13, 7 July 2025
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	!Pre-clean		!Pre-clean
	\|Ar ion bombardment		\|Ar ion bombardment
	\|~~RF Ar clean~~		\|none
	\|RF Ar clean		\|RF Ar clean

Reet: /* Deposition of Nb */

2023-06-09T08:33:20Z

Deposition of Nb

← Older revision		Revision as of 10:33, 9 June 2023
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	\| Substrates get heated during the deposition.		\| Substrates get heated during the deposition.
	For 100 nm Nb at 2 Å/s, the substrate reached about 105 °C.		For 100 nm Nb at 2 Å/s, the substrate reached about 105 °C.
			\|
	\|		\|
	\|}		\|}

Reet at 08:33, 9 June 2023

2023-06-09T08:33:02Z

← Older revision		Revision as of 10:33, 9 June 2023
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	'''Feedback to this page''': '''[mailto:LabAdviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium click here]'''		'''Feedback to this page''': '''[mailto:LabAdviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium click here]'''

	<i> ~~Unless otherwise stated, this~~ page is written by <b>DTU Nanolab ~~internal~~</b></i>		<i> This page is written by <b>DTU Nanolab staff</b></i>

	== Deposition of Nb ==		== Deposition of Nb ==
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	! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal\|Temescal]])		! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal\|Temescal]])
	! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker\|Lesker]])		! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker\|Lesker]])
			! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system\|Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3)]])
	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
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	\|E-beam deposition of Nb		\|E-beam deposition of Nb
	(line-of-sight deposition)		(line-of-sight deposition)
			\|Sputter deposition of Nb
			(not line-of-sight deposition)
	\|Sputter deposition of Nb		\|Sputter deposition of Nb
	(not line-of-sight deposition)		(not line-of-sight deposition)
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	!Pre-clean		!Pre-clean
	\|Ar ion bombardment		\|Ar ion bombardment
			\|RF Ar clean
	\|RF Ar clean		\|RF Ar clean

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	\|10Å to 200 nm*		\|10Å to 200 nm*
	\|10Å to 600 nm**		\|10Å to 600 nm**
			\|''ask staff, probably similar to old Lesker sputter system''

	\|-		\|-
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	\|0.5Å/s to 5Å/s		\|0.5Å/s to 5Å/s
	\| ~1Å/s		\| ~1Å/s
			\| ? Probably similar to old Lesker sputter system
	\|-		\|-

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	*smaller pieces		*smaller pieces
	*Up to 1x6" wafers		*Up to 1x6" wafers

			\|
			*Up to 10x4" or 6" wafers
			*Many smaller pieces
	\|-		\|-

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	* SU-8		* SU-8
	* Metals		* Metals

			\|
			* Almost any that do not outgas.


	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"

Reet at 08:15, 9 June 2023

2023-06-09T08:15:55Z

← Older revision		Revision as of 10:15, 9 June 2023
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	'''Feedback to this page''': '''[mailto:LabAdviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium click here]'''		'''Feedback to this page''': '''[mailto:LabAdviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium click here]'''

	<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>		<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>
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	\|}		\|}

	'''*''' ''To deposit layers thicker than 200 nm permission is required to ensure that there is enough metal (contact metal@~~danchip~~.dtu.dk)''		'''*''' ''To deposit layers thicker than 200 nm permission is required to ensure that there is enough metal (contact metal@nanolab.dtu.dk)''

	'''**''' ''To deposit layers thicker than 600 nm permission is required to ensure that there is enough metal (contact metal@~~danchip~~.dtu.dk)''		'''**''' ''To deposit layers thicker than 600 nm permission is required to ensure that there is enough metal (contact metal@nanolab.dtu.dk)''

Eves at 16:04, 1 February 2023

2023-02-01T16:04:40Z

← Older revision		Revision as of 18:04, 1 February 2023
Line 1:		Line 1:

	'''Feedback to this page''': '''[mailto:LabAdviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium click here]'''		'''Feedback to this page''': '''[mailto:LabAdviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium click here]'''

			<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>

	== Deposition of Nb ==		== Deposition of Nb ==

Eves: /* Deposition of Nb */

2021-10-03T12:47:51Z

Deposition of Nb

← Older revision		Revision as of 14:47, 3 October 2021
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	!Layer thickness		!Layer thickness
	\|10Å to ~~1µm~~*		\|10Å to 200 nm*
	\|10Å to ~~1µm~~**		\|10Å to 600 nm**

	\|-		\|-
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	! Deposition rate		! Deposition rate
	\|0.5Å/s to 3Å/s		\|0.5Å/s to 5Å/s
	\| ~1Å/s		\| ~1Å/s
	\|-		\|-
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	\|}		\|}

	'''*''' ''To deposit layers thicker than ~~600~~ nm permission is required to ensure that there is enough metal (contact metal@danchip.dtu.dk)''		'''*''' ''To deposit layers thicker than 200 nm permission is required to ensure that there is enough metal (contact metal@danchip.dtu.dk)''

	'''**''' ''To deposit layers thicker than ~~200~~ nm permission is required to ensure that there is enough metal (contact metal@danchip.dtu.dk)''		'''**''' ''To deposit layers thicker than 600 nm permission is required to ensure that there is enough metal (contact metal@danchip.dtu.dk)''

Eves: /* Deposition of Nb */

2021-10-03T12:46:12Z

Deposition of Nb

← Older revision		Revision as of 14:46, 3 October 2021
Line 3:		Line 3:

	== Deposition of Nb ==		== Deposition of Nb ==
	Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment		Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment.

	{\| border="1" cellspacing="0" cellpadding="3"		{\| border="1" cellspacing="0" cellpadding="3"

Eves: /* Deposition of Nb */

2021-10-03T12:46:05Z

Deposition of Nb

← Older revision		Revision as of 14:46, 3 October 2021
Line 3:		Line 3:

	== Deposition of Nb ==		== Deposition of Nb ==
	Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment.		Niobium can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the deposition equipment

	{\| border="1" cellspacing="0" cellpadding="3"		{\| border="1" cellspacing="0" cellpadding="3"