Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum - Revision history

Eves: /* Sputtering of Molybdenum */

2025-07-16T20:51:12Z

Sputtering of Molybdenum

← Older revision		Revision as of 22:51, 16 July 2025
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	==Sputtering of Molybdenum==		==Sputtering of Molybdenum==

	Molybdenum may be sputter deposited in either the single-chamber sputter-system ("Sputter System Lesker") or the cluster-based sputter system ("Sputter-System Metal-Oxide(PC1)" and "Sputter-System Metal-Nitride(PC3)"). See more in link here and the chart below.		Molybdenum may be sputter deposited in either the single-chamber sputter-system ("Sputter System Lesker") or the cluster-based sputter system ("[[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system\|Sputter-System Metal-Oxide(PC1)]]" and "[[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system\|Sputter-System Metal-Nitride(PC3)]]"). See more in link here and the chart below.

	*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1\|Mo Sputtering in Sputter-System Metal-Oxide(PC1)]]		*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1\|Mo Sputtering in Sputter-System Metal-Oxide(PC1)]]

Eves: /* Sputtering of Molybdenum */

2025-07-16T17:45:14Z

Sputtering of Molybdenum

← Older revision		Revision as of 19:45, 16 July 2025
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	*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1\|Mo Sputtering in Sputter-System Metal-Oxide(PC1)]]		*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1\|Mo Sputtering in Sputter-System Metal-Oxide(PC1)]]

Eves: /* Sputtering of Molybdenum */

2025-07-16T17:45:05Z

Sputtering of Molybdenum

← Older revision		Revision as of 19:45, 16 July 2025
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	*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1\|Mo Sputtering in Sputter-System Metal-Oxide(PC1)]]		*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1\|Mo Sputtering in Sputter-System Metal-Oxide(PC1)]]






	{\| border="1" cellspacing="0" cellpadding="4"		{\| border="1" cellspacing="0" cellpadding="4"

Eves at 17:44, 16 July 2025

2025-07-16T17:44:56Z

← Older revision		Revision as of 19:44, 16 July 2025
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	== Molybdenum deposition ==		== Molybdenum deposition ==
	Molybdenum can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the different deposition equipment.		Molybdenum can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the different deposition equipment.

			==Sputtering of Molybdenum==

			Molybdenum may be sputter deposited in either the single-chamber sputter-system ("Sputter System Lesker") or the cluster-based sputter system ("Sputter-System Metal-Oxide(PC1)" and "Sputter-System Metal-Nitride(PC3)"). See more in link here and the chart below.

			*[[Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum/Mo Sputtering in Cluster Lesker PC1\|Mo Sputtering in Sputter-System Metal-Oxide(PC1)]]

	{\| border="1" cellspacing="0" cellpadding="4"		{\| border="1" cellspacing="0" cellpadding="4"

Reet: /* Molybdenum deposition */

2025-06-20T13:25:50Z

Molybdenum deposition

← Older revision		Revision as of 15:25, 20 June 2025
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	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	! Deposition rate		! Deposition rate
	\|1Å/s to 10Å/s		\| 1Å/s to 10Å/s
	\| Depends on process parameters, roughly about 1 Å/s		\| Depends on process parameters, roughly about 1 Å/s
	\| ~~Not known yet, probably similar~~ to ~~'old' Lesker sputter system~~		\| At least up to 4 Å/s. See process log.
	\|-		\|-
	\|-		\|-

Reet: /* Molybdenum deposition */

2025-06-20T13:21:46Z

Molybdenum deposition

← Older revision		Revision as of 15:21, 20 June 2025
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	! Pre-clean		! Pre-clean
	\|Ar ion source		\|Ar ion source
	\|~~RF Ar clean~~		\|
	\|RF Ar clean		\|RF Ar clean
	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	! Layer thickness		! Layer thickness
	\|10Å to ~~0.2 µm~~*		\|10Å to 600 nm *
	\|10Å to 500 Å		\|10Å to 500 Å
	\|10Å to ~~? ''~~discuss with staff''		\|10Å to at least 100 nm (discuss with staff)
	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
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	'''*''' ''~~Depending on the amount of heating during Mo deposition, which we will discover during process development~~.''		'''*''' ''Please send a request to us if you wish to deposit more than 600 nm (write to metal@nanolab.dtu.dk)''

Reet: /* Molybdenum deposition */

2025-06-20T13:19:32Z

Molybdenum deposition

← Older revision		Revision as of 15:19, 20 June 2025
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	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	! Comment		! Comment
	\| ~~As of June 2023, Mo has not yet been deposited in the Temescal.~~		\|
	~~Please contact the Thin Film group to develop a process.~~
	\| Sputter target size 2".		\| Sputter target size 2".
	\| Sputter target size 3-4" (usually 3"). ~~As of~~ June ~~2023,~~ Mo has ~~not yet~~ been deposited in ~~the 'new' Lesker sputter chambers~~.		\| Sputter target size 3-4" (usually 3"). So far (June 2025) Mo has been deposited in PC1. See process log for details.
	~~Please contact the Thin Film group to develop a~~ process.
	\|-		\|-

Reet at 09:48, 9 June 2023

2023-06-09T09:48:44Z

← Older revision		Revision as of 11:48, 9 June 2023
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	! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal\|Temescal]])		! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Temescal\|Temescal]])
	! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker\|Lesker]])		! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Lesker\|Lesker]])
			! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system\|Sputter-system Metal-Oxide (PC1) and Sputter-system Metal-Nitride (PC3)]])
	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
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	\| E-beam deposition of Mo		\| E-beam deposition of Mo
	(line-of-sight deposition)		(line-of-sight deposition)
			\| Sputter deposition of Mo
			(not line-of-sight)
	\| Sputter deposition of Mo		\| Sputter deposition of Mo
	(not line-of-sight)		(not line-of-sight)
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	! Pre-clean		! Pre-clean
	\|Ar ion source		\|Ar ion source
			\|RF Ar clean
	\|RF Ar clean		\|RF Ar clean
	\|-		\|-
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	\|10Å to 0.2 µm*		\|10Å to 0.2 µm*
	\|10Å to 500 Å		\|10Å to 500 Å
			\|10Å to ? ''discuss with staff''
	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
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	\|1Å/s to 10Å/s		\|1Å/s to 10Å/s
	\| Depends on process parameters, roughly about 1 Å/s		\| Depends on process parameters, roughly about 1 Å/s
			\| Not known yet, probably similar to 'old' Lesker sputter system
	\|-		\|-
	\|-		\|-
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	* 1x4" wafer or		* 1x4" wafer or
	* 1x6" wafer		* 1x6" wafer
			\|
			*Up to 10x4" or 6" wafers
			*Many smaller pieces
	\|-		\|-

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	* Mylar		* Mylar
	* SU-8		* SU-8
			\|
			Almost any as long as it does not outgas.

	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	! Comment		! Comment
	\| As of ~~August 2022~~, Mo has not yet been deposited in the Temescal.		\| As of June 2023, Mo has not yet been deposited in the Temescal.
			Please contact the Thin Film group to develop a process.
			\| Sputter target size 2".
			\| Sputter target size 3-4" (usually 3"). As of June 2023, Mo has not yet been deposited in the 'new' Lesker sputter chambers.
	Please contact the Thin Film group to develop a process.		Please contact the Thin Film group to develop a process.
	\|
	\|-		\|-

Eves at 16:03, 1 February 2023

2023-02-01T16:03:53Z

← Older revision		Revision as of 18:03, 1 February 2023
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Molybdenum click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Molybdenum click here]'''

			<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>

	== Molybdenum deposition ==		== Molybdenum deposition ==

Reet: /* Molybdenum deposition */

2022-09-09T15:21:04Z

Molybdenum deposition

← Older revision		Revision as of 17:21, 9 September 2022
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	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	! Comment		! Comment
	\| As of August ~~2018~~, Mo has not yet been deposited in the Temescal.		\| As of August 2022, Mo has not yet been deposited in the Temescal.
	Please contact the Thin Film group to develop a process.		Please contact the Thin Film group to develop a process.
	\|		\|