Specific Process Knowledge/Thin film deposition/Deposition of AZO - Revision history

Eves: /* AZO deposition */

2025-07-28T15:29:40Z

AZO deposition

← Older revision		Revision as of 17:29, 28 July 2025
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	Beyond semiconductors and optics, AZO films are utilized in UV and gas sensors, SAW/acoustoelectronic devices, transparent heaters, low-emissivity and EMI-shielding coatings, and energy-saving window stacks.		Beyond semiconductors and optics, AZO films are utilized in UV and gas sensors, SAW/acoustoelectronic devices, transparent heaters, low-emissivity and EMI-shielding coatings, and energy-saving window stacks.
	The material offers good thermal and mechanical robustness; when even lower resistance is needed, AZO is often paired with ultrathin metals in hybrid multilayers while retaining high transparency.		The material offers good thermal and mechanical robustness; when even lower resistance is needed, AZO is often paired with ultrathin metals in hybrid multilayers while retaining high transparency.

Eves: /* Atomic Layer deposition of AZO */

2025-07-28T15:29:29Z

Atomic Layer deposition of AZO

← Older revision		Revision as of 17:29, 28 July 2025
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	Atomic Layer deposition of AZO is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.		Atomic Layer deposition of AZO is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.

	*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD\|AZO]]		*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD\|ALD deposition of AZO]]

	==Sputtering of AZO==		==Sputtering of AZO==

Eves: /* AZO deposition */

2025-07-28T15:29:15Z

AZO deposition

← Older revision		Revision as of 17:29, 28 July 2025
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	AZO can be deposited by RF, reactive RF, reactive DC, or reactive p-DC sputtering or atomic layer deposition (ALD). In the sputter deposition of AZO, an AZO target is used that may be RF-sputtered with or without adding additional oxygen, or reactively DC- or p-DC-sputtered. Elevated temperatures of 200 °C are typically employed. You can also co-deposit Al and ZnO, although it is usually not the most recommended approach. Note that in multipurpose sputter systems, such as ours, it may be challenging to achieve sufficiently low contamination for high-quality AZO. Contact Nanolab staff or your colleagues if you would like to locate a sputter system dedicated to AZO deposition.

	Atomic Layer deposition is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.
			==Atomic Layer deposition of AZO==

			Atomic Layer deposition of AZO is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.

	*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD\|AZO]]		*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD\|AZO]]

			==Sputtering of AZO==

			AZO can be deposited by RF, reactive RF, reactive DC, or reactive p-DC sputtering or atomic layer deposition (ALD). In the sputter deposition of AZO, an AZO target is used that may be RF-sputtered with or without adding additional oxygen, or reactively DC- or p-DC-sputtered. Elevated temperatures of 200 °C are typically employed. You can also co-deposit Al and ZnO, although it is usually not the most recommended approach. Note that in multipurpose sputter systems, such as ours, it may be challenging to achieve sufficiently low contamination for high-quality AZO. Contact Nanolab staff or your colleagues if you would like to locate a sputter system dedicated to AZO deposition.

	In the chart below, you can compare the different deposition equipment available here at Nanolab:		In the chart below, you can compare the different deposition equipment available here at Nanolab:

Eves: /* AZO deposition */

2025-07-28T15:27:30Z

AZO deposition

← Older revision		Revision as of 17:27, 28 July 2025
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	=AZO deposition=		=AZO deposition=

			Aluminum‑doped zinc oxide (AZO) is a degenerate n‑type transparent conducting oxide that pairs high visible transparency with tunable electrical conductivity, offering an abundant, low‑cost, and non‑toxic alternative to ITO.
			It can be deposited by sputtering for scalable, large-area films and by atomic layer deposition (ALD) for conformal, ultra-uniform coatings at relatively low temperatures, which suits complex or temperature-sensitive substrates.
			AZO serves widely as a transparent electrode in photovoltaics, LEDs, displays, and touch panels, where it enables efficient light coupling while providing adequate sheet resistance.
			In optics and photonics, its carrier-driven refractive-index control and epsilon-near-zero behavior in the near-IR support plasmonics, compact modulators, waveguides, and tunable anti-reflective coatings.
			Beyond semiconductors and optics, AZO films are utilized in UV and gas sensors, SAW/acoustoelectronic devices, transparent heaters, low-emissivity and EMI-shielding coatings, and energy-saving window stacks.
			The material offers good thermal and mechanical robustness; when even lower resistance is needed, AZO is often paired with ultrathin metals in hybrid multilayers while retaining high transparency.


	AZO can be deposited by RF, reactive RF, reactive DC, or reactive p-DC sputtering or atomic layer deposition (ALD). In the sputter deposition of AZO, an AZO target is used that may be RF-sputtered with or without adding additional oxygen, or reactively DC- or p-DC-sputtered. Elevated temperatures of 200 °C are typically employed. You can also co-deposit Al and ZnO, although it is usually not the most recommended approach. Note that in multipurpose sputter systems, such as ours, it may be challenging to achieve sufficiently low contamination for high-quality AZO. Contact Nanolab staff or your colleagues if you would like to locate a sputter system dedicated to AZO deposition.		AZO can be deposited by RF, reactive RF, reactive DC, or reactive p-DC sputtering or atomic layer deposition (ALD). In the sputter deposition of AZO, an AZO target is used that may be RF-sputtered with or without adding additional oxygen, or reactively DC- or p-DC-sputtered. Elevated temperatures of 200 °C are typically employed. You can also co-deposit Al and ZnO, although it is usually not the most recommended approach. Note that in multipurpose sputter systems, such as ours, it may be challenging to achieve sufficiently low contamination for high-quality AZO. Contact Nanolab staff or your colleagues if you would like to locate a sputter system dedicated to AZO deposition.

	Atomic Layer deposition is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.		Atomic Layer deposition is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.
			*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD\|AZO]]



	In the chart below, you can compare the different deposition equipment available here at Nanolab:		In the chart below, you can compare the different deposition equipment available here at Nanolab:

	*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD\|AZO]]

	{\| border="1" cellspacing="0" cellpadding="4"		{\| border="1" cellspacing="0" cellpadding="4"

Eves: /* AZO deposition */

2025-07-28T15:05:35Z

AZO deposition

← Older revision		Revision as of 17:05, 28 July 2025
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	In the chart below, you can compare the different deposition equipment available here at Nanolab:		In the chart below, you can compare the different deposition equipment available here at Nanolab:

			*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AZO deposition using ALD\|AZO]]

	{\| border="1" cellspacing="0" cellpadding="4"		{\| border="1" cellspacing="0" cellpadding="4"

Eves: /* AZO deposition */

2025-07-28T15:03:57Z

AZO deposition

← Older revision		Revision as of 17:03, 28 July 2025
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	=AZO deposition=		=AZO deposition=

	AZO can be deposited by sputtering or atomic layer deposition (ALD). In sputter-deposition of AZO, ~~we use~~ an AZO target that may be RF-sputtered or reactively DC-sputtered. You can also co-deposit Al and ZnO. Note that in multipurpose sputter systems such as ours it may be ~~difficult~~ to ~~obtain~~ low ~~enough~~ contamination for high-quality AZO. ~~Talk to~~ Nanolab staff or your colleagues if you would like to locate a sputter system ~~that can be~~ dedicated to AZO-deposition.		AZO can be deposited by RF, reactive RF, reactive DC, or reactive p-DC sputtering or atomic layer deposition (ALD). In the sputter deposition of AZO, an AZO target is used that may be RF-sputtered with or without adding additional oxygen, or reactively DC- or p-DC-sputtered. Elevated temperatures of 200 °C are typically employed. You can also co-deposit Al and ZnO, although it is usually not the most recommended approach. Note that in multipurpose sputter systems, such as ours, it may be challenging to achieve sufficiently low contamination for high-quality AZO. Contact Nanolab staff or your colleagues if you would like to locate a sputter system dedicated to AZO deposition.

	In the chart below you can compare the different deposition equipment available here at Nanolab:		Atomic Layer deposition is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.

			In the chart below, you can compare the different deposition equipment available here at Nanolab:

Reet at 12:42, 2 June 2023

2023-06-02T12:42:43Z

← Older revision		Revision as of 14:42, 2 June 2023
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	''All content by DTU Nanolab staff''.		''All content by DTU Nanolab staff''.

			=AZO deposition=

	AZO can be deposited by sputtering or atomic layer deposition (ALD). In sputter-deposition of AZO, we use an AZO target that may be RF-sputtered or reactively DC-sputtered. You can also co-deposit Al and ZnO. Note that in multipurpose sputter systems such as ours it may be difficult to obtain low enough contamination for high-quality AZO. Talk to Nanolab staff or your colleagues if you would like to locate a sputter system that can be dedicated to AZO-deposition.		AZO can be deposited by sputtering or atomic layer deposition (ALD). In sputter-deposition of AZO, we use an AZO target that may be RF-sputtered or reactively DC-sputtered. You can also co-deposit Al and ZnO. Note that in multipurpose sputter systems such as ours it may be difficult to obtain low enough contamination for high-quality AZO. Talk to Nanolab staff or your colleagues if you would like to locate a sputter system that can be dedicated to AZO-deposition.

Reet at 12:42, 2 June 2023

2023-06-02T12:42:17Z

← Older revision		Revision as of 14:42, 2 June 2023
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_AZO click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_AZO click here]'''

	''All content by DTU Nanolab staff''.		''All content by DTU Nanolab staff''.

Reet at 12:42, 2 June 2023

2023-06-02T12:42:09Z

← Older revision		Revision as of 14:42, 2 June 2023
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_AZO click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_AZO click here]'''
			''All content by DTU Nanolab staff''.

	AZO can be deposited by sputtering or atomic layer deposition (ALD). In sputter-deposition of AZO, we use an AZO target that may be RF-sputtered or reactively DC-sputtered. You can also co-deposit Al and ZnO. Note that in multipurpose sputter systems such as ours it may be difficult to obtain low enough contamination for high-quality AZO. Talk to Nanolab staff or your colleagues if you would like to locate a sputter system that can be dedicated to AZO-deposition.		AZO can be deposited by sputtering or atomic layer deposition (ALD). In sputter-deposition of AZO, we use an AZO target that may be RF-sputtered or reactively DC-sputtered. You can also co-deposit Al and ZnO. Note that in multipurpose sputter systems such as ours it may be difficult to obtain low enough contamination for high-quality AZO. Talk to Nanolab staff or your colleagues if you would like to locate a sputter system that can be dedicated to AZO-deposition.

Paphol at 08:07, 30 August 2022

2022-08-30T08:07:00Z

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	\|		\|
	*Many smaller samples		*Many smaller samples
	*Up to 10x4" or 6" wafers		*Up to 10x4" or 6" wafers (Cassette load in the LL)
	\|		\|
	*Pieces or		*Pieces or