Specific Process Knowledge/Thin film deposition/Antistiction Coating - Revision history

Reet: /* Processing on the MVD */

2025-08-07T08:44:23Z

Processing on the MVD

← Older revision		Revision as of 10:44, 7 August 2025
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	These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.		These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.

	A picture showing some of chemicals MVD and the surface reaction can be found in [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=12&name=MVD+reaction.jpg ~~LabManager~~].		A picture showing some of chemicals MVD and the surface reaction can be found in LabManager [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=12&name=MVD+reaction.jpg here] (requires login).

	<!--		<!--

Reet: /* Processing on the MVD */

2025-08-07T08:43:29Z

Processing on the MVD

← Older revision		Revision as of 10:43, 7 August 2025
Line 7:		Line 7:
	These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.		These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.

	A picture showing some of chemicals MVD and the surface reaction can be found in [https://labmanager.dtu.dk/~~function~~.php?~~module~~=MiscDocument&~~view~~=~~docs~~ LabManager].		A picture showing some of chemicals MVD and the surface reaction can be found in [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=12&name=MVD+reaction.jpg LabManager].

	<!--		<!--

Pevo at 11:56, 19 June 2023

2023-06-19T11:56:53Z

← Older revision		Revision as of 13:56, 19 June 2023
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	These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.		These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.

	*[https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs LabManager]		A picture showing some of chemicals MVD and the surface reaction can be found in [https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs LabManager].

	~~https://labmanager.dtu.dk/function~~.~~php?module=MiscDocument&view=docs~~

			<!--
	<gallery caption="Some chemicals used in MVD and the surface reaction" widths="200px" heights="150px" perrow="2">		<gallery caption="Some chemicals used in MVD and the surface reaction" widths="200px" heights="150px" perrow="2">
	image:chlorosilanes.jpg\|Different chemicals for the MVD.		image:chlorosilanes.jpg\|Different chemicals for the MVD.
	image:MVDsurfacereaction.jpg\|The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl.		image:MVDsurfacereaction.jpg\|The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl.
	</gallery>		</gallery>
			-->

	=== The parameters of the MVD process ===		=== The parameters of the MVD process ===

Pevo at 11:54, 19 June 2023

2023-06-19T11:54:27Z

← Older revision		Revision as of 13:54, 19 June 2023
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	These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.		These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.

			*[https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs LabManager]

	https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs		https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs

Pevo: /* Processing on the MVD */

2023-06-19T11:53:17Z

Processing on the MVD

← Older revision		Revision as of 13:53, 19 June 2023
Line 6:		Line 6:

	These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.		These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces.

			https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs

	<gallery caption="Some chemicals used in MVD and the surface reaction" widths="200px" heights="150px" perrow="2">		<gallery caption="Some chemicals used in MVD and the surface reaction" widths="200px" heights="150px" perrow="2">

Pevo at 12:49, 6 February 2023

2023-02-06T12:49:13Z

← Older revision		Revision as of 14:49, 6 February 2023
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			''This page is written by DTU Nanolab internal''

	== Processing on the MVD ==		== Processing on the MVD ==

Taran at 07:34, 28 September 2016

2016-09-28T07:34:15Z

← Older revision		Revision as of 09:34, 28 September 2016
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	It is critical that the chemicals with the lowest vapor pressure are injected first into the process chamber. If, for instance, water is injected before FDTS, the water will flow into the FTDS expansion volume and cause polymerization, thus forcing a mechanical clean. NOT GOOD!.		It is critical that the chemicals with the lowest vapor pressure are injected first into the process chamber. If, for instance, water is injected before FDTS, the water will flow into the FTDS expansion volume and cause polymerization, thus forcing a mechanical clean. NOT GOOD!.

	== The ~~FLAT~~ recipe ==		== The FLAT2 recipe ==

	=== Purpose ===		=== Purpose ===
	The ~~FLAT~~ recipe is designed for quick coating of non-structured wafers. One should not expect to get good conformal coverage of nanostructures or nanometersized surface roughness.		The FLAT2 recipe is designed for quick coating of non-structured wafers. One should not expect to get good conformal coverage of nanostructures or nanometersized surface roughness.

	=== Process description ===		=== Process description ===
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	\|}		\|}

	== The ~~STAMP~~ recipe ==		== The STAMP2 recipe ==

	=== Purpose ===		=== Purpose ===
	The ~~STAMP~~ recipe uses the same total amount of FDTS as FLAT but delivers it much slower in order to obtain a much better and conformal coating of fine nanostructures. ~~STAMP~~ should always be used for stamps for nanoimprint lithography irregardless of the feature size.		The STAMP2 recipe uses the same total amount of FDTS as FLAT but delivers it much slower in order to obtain a much better and conformal coating of fine nanostructures. STAMP2 should always be used for stamps for nanoimprint lithography irregardless of the feature size.

	=== Process description ===		=== Process description ===

Taran at 11:35, 20 January 2014

2014-01-20T11:35:49Z

← Older revision		Revision as of 13:35, 20 January 2014
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	~~=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]=~~

	== Processing on the MVD ==		== Processing on the MVD ==

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	</gallery>		</gallery>

	== The parameters of the MVD process ==		=== The parameters of the MVD process ===

	The most important parameters to control during the MVD process are:		The most important parameters to control during the MVD process are:

Taran: /* Process description */

2014-01-20T11:34:00Z

Process description

← Older revision		Revision as of 13:34, 20 January 2014
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	=== Process description ===		=== Process description ===
	A cycle with 1 injection of FDTS at 0.~~400~~ Torr + 1 injection of water at 6 Torr reacts for 15 minutes. Then the process chamber is evacuated and a new cycle starts until 4 cycles are completed. This gives a total process time of some 80 minutes.		A cycle with 1 injection of FDTS at 0.500 Torr + 1 injection of water at 6 Torr reacts for 15 minutes. Then the process chamber is evacuated and a new cycle starts until 4 cycles are completed. This gives a total process time of some 80 minutes.

	=== Process sequence ===		=== Process sequence ===

Taran: /* Process description */

2014-01-20T11:33:41Z

Process description

← Older revision		Revision as of 13:33, 20 January 2014
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	=== Process description ===		=== Process description ===
	The amount of FDTS is delivered in one cycle (4 injections of FDTS at 0.~~400~~ Torr + 1 injection of water at 18 Torr) and the reaction time is 15 minutes. The total process time is some 22 minutes.		The amount of FDTS is delivered in one cycle (4 injections of FDTS at 0.500 Torr + 1 injection of water at 18 Torr) and the reaction time is 15 minutes. The total process time is some 22 minutes.

	=== Process sequence ===		=== Process sequence ===