Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers - Revision history

Eves: /* Investigation of chemical composition in multilayers system */

2025-07-28T17:06:27Z

Investigation of chemical composition in multilayers system

← Older revision		Revision as of 19:06, 28 July 2025
Line 238:		Line 238:
	<br clear="all" />		<br clear="all" />

	<gallery caption="" widths="~~500px~~" heights="~~500px~~" perrow="2">		<gallery caption="" widths="400px" heights="350px" perrow="2">
	image:XPS_depth_Al_10_AL.jpg\| Al 2p signal multilayers.		image:XPS_depth_Al_10_AL.jpg\| Al 2p signal multilayers.
	image:XPS_depth_Al_10_Ti.jpg\| Ti 2p signal multilayers.		image:XPS_depth_Al_10_Ti.jpg\| Ti 2p signal multilayers.

Eves: /* Low temperature deposition of Al2O3 */

2025-07-28T17:06:07Z

Low temperature deposition of Al2O3

← Older revision		Revision as of 19:06, 28 July 2025
Line 95:		Line 95:


	<gallery caption="" widths="~~500px~~" heights="~~500px~~" perrow="2">		<gallery caption="" widths="400px" heights="350px" perrow="2">
	image:Al2O3_LT_Thickness.JPG\| Measured thickness distribution across 100 mm wafer.		image:Al2O3_LT_Thickness.JPG\| Measured thickness distribution across 100 mm wafer.
	image:Al2O3_LT_RI.JPG\| Measured refractive index distribution across 100 mm wafer.		image:Al2O3_LT_RI.JPG\| Measured refractive index distribution across 100 mm wafer.

Eves: /* Low temperature deposition of TiO2 */

2025-07-28T17:05:44Z

Low temperature deposition of TiO2

← Older revision		Revision as of 19:05, 28 July 2025
Line 193:		Line 193:


	<gallery caption="" widths="~~500px~~" heights="~~500px~~" perrow="2">		<gallery caption="" widths="400px" heights="350px" perrow="2">
	image:TiO2_LT_Thickness.JPG\| Measured thickness distribution across 100 mm wafer.		image:TiO2_LT_Thickness.JPG\| Measured thickness distribution across 100 mm wafer.
	image:TiO2_LT_RI.JPG\| Measured refractive index distribution across 100 mm wafer.		image:TiO2_LT_RI.JPG\| Measured refractive index distribution across 100 mm wafer.

Mmat at 14:45, 21 May 2025

2025-05-21T14:45:00Z

← Older revision		Revision as of 16:45, 21 May 2025
Line 1:		Line 1:
			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers click here]'''
			<br>
	~~''This page is written by DTU Nanolab internal''~~		<br>

	This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.		This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.
			<br>
			<br>
	==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==		==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==

Line 223:		Line 223:

	<br clear="all" />		<br clear="all" />
	<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>		<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
	<br clear="all" />		<br clear="all" />
	<br clear="all" />		<br clear="all" />
Line 246:		Line 246:

	<br clear="all" />		<br clear="all" />
	<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>		<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
	<br clear="all" />		<br clear="all" />
	<br clear="all" />		<br clear="all" />
Line 264:		Line 264:

	<br clear="all" />		<br clear="all" />
	<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>		<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
	<br clear="all" />		<br clear="all" />
	<br clear="all" />		<br clear="all" />

Pevo: /* Low temperature deposition of TiO2 */

2023-06-19T08:11:29Z

Low temperature deposition of TiO2

← Older revision		Revision as of 10:11, 19 June 2023
Line 133:		Line 133:
	Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C)		Deposition rate: <b>0.048 nm/cycle </b>(@ 120 <sup>o</sup>C)

	This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK] (Phys. Rev. Lett. 115(17) 2015, 177402)		This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. The deposited TiO<sub>2</sub> layers are amorphous. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires longin] (Phys. Rev. Lett. 115(17) 2015, 177402)

Pevo: /* Low temperature deposition of Al2O3 */

2023-06-19T08:10:42Z

Low temperature deposition of Al2O3

← Older revision		Revision as of 10:10, 19 June 2023
Line 89:		Line 89:
	\|}		\|}
	\|}		\|}

	~~%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%%~~

Pevo: /* Low temperature deposition of Al2O3 */

2023-06-19T08:10:21Z

Low temperature deposition of Al2O3

← Older revision		Revision as of 10:10, 19 June 2023
Line 35:		Line 35:
	Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)		Deposition rate: <b>0.089 nm/cycle </b>(@120 <sup>o</sup>C)

	This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK] (Phys. Rev. Lett. 115(17) 2015, 177402)		This recipe has been developd for fabrication of high quality homogenious optical layers at low temperature. Research related results with this recipe can be found here: [http://journals.aps.org/prl/abstract/10.1103/PhysRevLett.115.177402 LINK - requires login] (Phys. Rev. Lett. 115(17) 2015, 177402)

Pevo at 08:09, 19 June 2023

2023-06-19T08:09:55Z

← Older revision		Revision as of 10:09, 19 June 2023
Line 1:		Line 1:

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%~~20http~~://labadviser.nanolab.dtu.dk/index.php/~~LabAdviser~~/~~Courses~~/~~TPT_Thin_Film~~ click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers click here]'''

	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

	This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.		This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.


	==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==		==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==

Pevo at 08:07, 19 June 2023

2023-06-19T08:07:22Z

← Older revision		Revision as of 10:07, 19 June 2023
Line 1:		Line 1:

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/Courses/TPT_Thin_Film click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/Courses/TPT_Thin_Film click here]'''

	~~https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers&action=edit~~

	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

Pevo at 08:06, 19 June 2023

2023-06-19T08:06:03Z

← Older revision		Revision as of 10:06, 19 June 2023
Line 1:		Line 1:

			'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/Courses/TPT_Thin_Film click here]'''

			https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers&action=edit

			''This page is written by DTU Nanolab internal''

	This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.		This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.