Specific Process Knowledge/Thermal Process/Resist Pyrolysis furnace/Acceptance test - Revision history

Pevo at 08:56, 10 April 2026

2026-04-10T08:56:30Z

← Older revision		Revision as of 10:56, 10 April 2026
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	==Multipurpose Anneal furnace acceptance test==		==Multipurpose Anneal furnace acceptance test==

	The acceptance for the Multipurpose Anneal furnace was performed in ~~November 2014~~ by ATV Technologie and DTU Nanolab.		The acceptance for the Multipurpose Anneal furnace was performed in January 2015 by ATV Technologie and DTU Nanolab.

	At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times.		At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times.

Pevo at 13:14, 8 April 2026

2026-04-08T13:14:09Z

← Older revision		Revision as of 15:14, 8 April 2026
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	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

	==~~Resist Pyrolysis (former~~ Multipurpose Anneal) furnace acceptance test==		==Multipurpose Anneal furnace acceptance test==

	The acceptance for the ~~Resist Pyrolysis (former~~ Multipurpose Anneal) furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.		The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.

	At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times		At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times.

	For each run the oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run.		For each run the oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run. The results can be found below.

			In November 2024 the furnace was repaired by ATV Technologie. At the repair, the whole furnace body was changed, and all heaters were replaced. Also, the process exhaust flow was decreased by changing a valve in the exhaust line.

			After the repair, the oxidation process from the acceptance test was repeated and optimized. The positions of the control thermocouples (TCs) and the process exhaust were adjusted to minimize the non-uniformity of the grown oxide layer. The final optimized result can be found below.

	==Oxidation parameters==		==Oxidation parameters==

	'''Recipe''': "~~vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering~~.ATV"		'''Recipe''': "vr_dryOx_1050C_80min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV" or ""vr_dryOx_1050C_80min_3Wafer_June2020.ATV" (same recipe parameters)

	'''Oxidation time''': 80 min		'''Oxidation time''': 80 min
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	The oxidation has been done with 150 mm wafers. The number of wafers in the boat was 30.		The oxidation has been done with 150 mm wafers. The number of wafers in the boat was 30.

	Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured in 13 points using the M-2000V ellipsometer.		Wafer 4 (towards the door), wafer 16 (center wafer) and wafer 28 (towards the service area) were measured in 13 points using the M-2000V ellipsometer.

	==Results==		==Results - Acceptance test 2014==

	====Oxide thickness====		====Oxide thickness====

	{\| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"		{\| border="2" cellpadding="2" cellspacing="2" style="text-align:center;"
	\|-		\|-
	!		!
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	\| 0.1637		\| 0.1637
	\|}		\|}

			==Results - Furnace repair 2024==

			====Oxide thickness====

			{\| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
			\|-
			!
			! Date
			! colspan="2" \| Wafer 4
			! colspan="2" \| Wafer 16
			! colspan="2" \| Wafer 28
			! colspan="2" \| Over the boat (all points)
			! colspan="2" \| Center point only
			\|-
			! width="80" \|
			! width="80" \|
			! width="70" \| Average oxide thickness [nm]
			! width="70" \| Non-uniformity [%]
			! width="70" \| Average oxide thickness [nm]
			! width="70" \| Non-uniformity [%]
			! width="70" \| Average oxide thickness [nm]
			! width="70" \| Non-uniformity [%]
			! width="70" \| Average oxide thickness [nm]
			! width="70" \| Non-uniformity [%]
			! width="70" \| Average oxide thickness [nm]
			! width="70" \| Non-uniformity [%]
			\|-
			! Test
			\| 07-05-2024
			\| 108.1
			\| 0.96
			\| 108.7
			\| 0.95
			\| 109.8
			\| 0.98
			\| 108.9
			\| 0.76
			\| 108.2
			\| 1.22
			\|-
			\|}

			Thermo couple (TC) position - Distance from the bell jar: 12 cm, 21.5 cm, 36 m

Pevo: /* Multipurpose Anneal furnace acceptance test */

2024-02-26T12:50:54Z

Multipurpose Anneal furnace acceptance test

← Older revision		Revision as of 14:50, 26 February 2024
Line 3:		Line 3:
	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

	==Multipurpose Anneal furnace acceptance test==		==Resist Pyrolysis (former Multipurpose Anneal) furnace acceptance test==

	The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.		The acceptance for the Resist Pyrolysis (former Multipurpose Anneal) furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.

	At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times		At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times

Pevo: Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace:_Multipurpose_annealing/Acceptance_test click here]''' ''This page is written by DTU Nanolab internal'' ==Multipurpose Anneal furnace acceptance test== The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab. At..."

2024-02-26T12:49:28Z

Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace:_Multipurpose_annealing/Acceptance_test click here]''' ''This page is written by DTU Nanolab internal'' ==Multipurpose Anneal furnace acceptance test== The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab. At..."

New page

'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace:_Multipurpose_annealing/Acceptance_test click here]'''

''This page is written by DTU Nanolab internal''

==Multipurpose Anneal furnace acceptance test==

The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.

At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times

For each run the oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run.

==Oxidation parameters==

'''Recipe''': "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"

'''Oxidation time''': 80 min

'''Temperature''': 1050 <sup>o</sup>C (all temperature zones)

'''O<sub>2</sub> flow''': 1 slm

The oxidation has been done with 150 mm wafers. The number of wafers in the boat was 30.

Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured in 13 points using the M-2000V ellipsometer.

==Results==

====Oxide thickness====

{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
!
! Date
! colspan="3" | Wafer 4
! colspan="3" | Wafer 16
! colspan="3" | Wafer 28
! colspan="3" | Center point only
|-
! width="80" |
! width="80" |
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
|-
! Run 1
| 28-01-2015
| 109.7
| 1.0
| 1.7
| 107.7
| 0.9
| 1.1
| 106.5
| 0.8
| 1.2
| 107.0
| 2.1
| 1.9
|-
! Run 2
| 28-01-2015
| 107.3
| 1.7
| 2.4
| 105.0
| 1.4
| 1.7
| 107.3
| 0.7
| 0.9
| 105.7
| 1.0
| 0.9
|-
! Run 3
| 30-01-2015
| 103.6
| 0.8
| 1.1
| 102.6
| 0.6
| 1.2
| 102.2
| 0.6
| 1.1
| 102.9
| 1.0
| 1.0
|-
! Average
|
| 106.9
| 1.2
| 1.7
| 105.1
| 1.0
| 1.3
| 105.3
| 0.7
| 1.1
| 105.2
| 1.4
| 1.3
|}

{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
! colspan="3" | Run-to-run
|-
! width="90" | Average oxide thickness [nm]
! width="90" | St. deviation
! width="90" | Non-uniformity [%]
|-
| 105.2
| 2.1
| 2.0
|}

====Refractive index====

{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
!
! Date
! colspan="3" | Wafer 4
! colspan="3" | Wafer 16
! colspan="3" | Wafer 28
! colspan="3" | Center point only
|-
! width="80" |
! width="80" |
! width="70" | Average refractive index
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average refractive index
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average refractive index
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average refractive index
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
|-
! Run 1
| 28-01-2015
| 1.46
| 0.00
| 0.04
| 1.46
| 0.00
| 0.07
| 1.46
| 0.00
| 0.06
| 1.4609
| 0.0004
| 0.0230
|-
! Run 2
| 28-01-2015
| 1.46
| 0.00
| 0.09
| 1.46
| 0.00
| 0.17
| 1.44
| 0.01
| 0.69
| 1.4561
| 0.0094
| 05873
|-
! Run 3
| 30-01-2015
| 1.46
| 0.00
| 0.06
| 1.46
| 0.00
| 0.05
| 1.46
| 0.00
| 0.07
| 1.4602
| 0.0004
| 0.0291
|-
! Average
|
| 1.46
| 0.00
| 0.06
| 1.46
| 0.00
| 0.10
| 1.46
| 0.00
| 0.27
| 1.46
| 0.00
| 0.21
|}

{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
! colspan="3" | Run-to-run
|-
! width="90" | Average refractive index
! width="90" | St. deviation
! width="90" | Non-uniformity [%]
|-
| 1.4591
| 0.0026
| 0.1637
|}