Specific Process Knowledge/Thermal Process/Oxide mask - Revision history

Mmat at 17:24, 10 June 2025

2025-06-10T17:24:14Z

← Older revision		Revision as of 19:24, 10 June 2025
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	==Oxide mask thickness==		==Oxide mask thickness==

Paphol at 09:05, 15 June 2023

2023-06-15T09:05:01Z

← Older revision		Revision as of 11:05, 15 June 2023
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Paphol at 09:04, 15 June 2023

2023-06-15T09:04:19Z

← Older revision		Revision as of 11:04, 15 June 2023
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			''This page is written by DTU Nanolab internal''

	==Oxide mask thickness==		==Oxide mask thickness==
	A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.		A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.

Paphol at 09:03, 15 June 2023

2023-06-15T09:03:48Z

← Older revision		Revision as of 11:03, 15 June 2023
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	https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Boron-mask.png		https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Boron-mask.png

	https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Phosphorous-mask.png		https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Phosphorous-mask.png

	~~[[File:phosphorous-mask.PNG\|400px]]~~
	~~[[File:boron-mask.PNG\|400px]]~~

Paphol: /* Oxide mask thickness */

2023-06-15T09:03:09Z

Oxide mask thickness

← Older revision		Revision as of 11:03, 15 June 2023
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	==Oxide mask thickness==		==Oxide mask thickness==
	A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.		A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.

			https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Boron-mask.png
			https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=9&name=Phosphorous-mask.png

	[[File:phosphorous-mask.PNG\|400px]]		[[File:phosphorous-mask.PNG\|400px]]
	[[File:boron-mask.PNG\|400px]]		[[File:boron-mask.PNG\|400px]]

Pevo: /* Oxide mask thickness */

2022-01-26T10:29:53Z

Oxide mask thickness

← Older revision		Revision as of 12:29, 26 January 2022
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	==Oxide mask thickness==		==Oxide mask thickness==
	A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs ~~between~~ phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.		A thermal oxide mask can protect areas from diffusion during a pre deposition and drive-in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs for phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.

	[[File:phosphorous-mask.PNG\|400px]]		[[File:phosphorous-mask.PNG\|400px]]
	[[File:boron-mask.PNG\|400px]]		[[File:boron-mask.PNG\|400px]]

Thope: /* Oxide mask thickness */

2019-01-28T11:55:22Z

Oxide mask thickness

← Older revision		Revision as of 13:55, 28 January 2019
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	==Oxide mask thickness==		==Oxide mask thickness==
	A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. I can also be used during a PECVD based diffusion process. The required oxide thickness differs between phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.		A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. It can also be used during a PECVD based diffusion process. The required oxide thickness differs between phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.

	[[File:phosphorous-mask.PNG\|400px]]		[[File:phosphorous-mask.PNG\|400px]]
	[[File:boron-mask.PNG\|400px]]		[[File:boron-mask.PNG\|400px]]

Thope: /* Oxide mask thickness */

2019-01-28T11:55:07Z

Oxide mask thickness

← Older revision		Revision as of 13:55, 28 January 2019
Line 2:		Line 2:
	A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. I can also be used during a PECVD based diffusion process. The required oxide thickness differs between phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.		A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. I can also be used during a PECVD based diffusion process. The required oxide thickness differs between phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.

	[[File:phosphorous-mask.PNG]]		[[File:phosphorous-mask.PNG\|400px]]
			[[File:boron-mask.PNG\|400px]]
	[[File:boron-mask.PNG]]

Thope: Created page with "==Oxide mask thickness== A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. I can also be used during a PECVD based diffusion ..."

2019-01-28T11:52:02Z

Created page with "==Oxide mask thickness== A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. I can also be used during a PECVD based diffusion ..."

New page

==Oxide mask thickness==
A thermal oxide mask can protect areas from diffusion during a pre deposition and drive in process. I can also be used during a PECVD based diffusion process. The required oxide thickness differs between phosphorous and boron diffusion as the respective diffusion coefficients are different. The figures below indicate the minimum thermal oxide thickness to be used based on temperature and diffusion time.

[[File:phosphorous-mask.PNG]]

[[File:boron-mask.PNG]]