Specific Process Knowledge/Thermal Process/Oxidation/Standard oxidation recipes - Revision history

Mmat at 15:04, 3 July 2025

2025-07-03T15:04:43Z

← Older revision		Revision as of 17:04, 3 July 2025
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''

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	~~The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.~~		=Standard Oxidation Recipes=

	On this page the steps in the standard oxidation recipes on the furnaces will be listed.		The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers. On this page the steps in the standard oxidation recipes on the furnaces will be listed.


	~~===~~Dry oxidation can be done in ~~the these~~ furnaces:~~===~~		'''Dry oxidation can be done in following furnaces:'''

	*A1 Boron Drive-in and Pre-dep furnace		*A1 Boron Drive-in and Pre-dep furnace
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	*C3 Anneal-Bond furnace		*C3 Anneal-Bond furnace
	*Multipurpose Anneal furnace		*Multipurpose Anneal furnace
			<br>
	The dry oxidation recipes in the A- and C-stack furnaces are very similar and will be described on this page.		The dry oxidation recipes in the A- and C-stack furnaces are very similar and will be described on this page.

	There are no standard recipes on the Multipurpose Anneal furnace, so no oxidation recipes will be described here.		There are no standard recipes on the Multipurpose Anneal furnace, so no oxidation recipes will be described here.
			<br>
			<br>
	~~===~~Wet oxidation can be done in these furnaces:~~===~~		'''Wet oxidation can be done in these furnaces:'''

	*A1 Boron Drive-in and Pre-dep furnace		*A1 Boron Drive-in and Pre-dep furnace
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	However, there are a few differences in recipes, because water vapour can be generated by either a torch, a steamer or a bubbler. More information can be found on each furnace page.		However, there are a few differences in recipes, because water vapour can be generated by either a torch, a steamer or a bubbler. More information can be found on each furnace page.
			<br>
	~~Wet oxidation of III-V sample in the C2 furnace is described here:~~		<br>
			'''General Remarks for Oxidation Recipes:'''
	~~http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/~~Oxidation~~/Oxidation_on_III-V_oxidation_furnace_(C2)~~

	~~===General recipe remarks~~:~~===~~

	The oxidation temperature is fixed in each recipe. The temperature can be seen in the recipe name, e.g. "DRY1000" for dry oxidation at 1000 C and "WET1100" for wet oxidation at 1100 C.		The oxidation temperature is fixed in each recipe. The temperature can be seen in the recipe name, e.g. "DRY1000" for dry oxidation at 1000 C and "WET1100" for wet oxidation at 1100 C.
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	The annealing improves... The standard annealing time is 20 minutes, but it is possible to change the time.		The annealing improves... The standard annealing time is 20 minutes, but it is possible to change the time.
			<br><br>
			==Dry Oxidation Process Steps==






	==Dry ~~oxidation recipe steps~~==

	'''00 STANDBY'''		'''00 STANDBY'''

Paphol at 09:49, 7 February 2023

2023-02-07T09:49:39Z

← Older revision		Revision as of 11:49, 7 February 2023
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''

	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

Paphol at 09:48, 7 February 2023

2023-02-07T09:48:54Z

← Older revision		Revision as of 11:48, 7 February 2023
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''

	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

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Paphol at 09:48, 7 February 2023

2023-02-07T09:48:03Z

← Older revision		Revision as of 11:48, 7 February 2023
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	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

	Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''		'''Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''

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Paphol at 09:47, 7 February 2023

2023-02-07T09:47:40Z

← Older revision		Revision as of 11:47, 7 February 2023
Line 1:		Line 1:
	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?

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			Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Standard_oxidation_recipes click here]'''

	=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>=		=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>=
	~~''This page is written by DTU Nanolab internal''~~

	The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.		The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.

Paphol at 09:47, 7 February 2023

2023-02-07T09:47:11Z

← Older revision		Revision as of 11:47, 7 February 2023
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	=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>=		=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>=
			''This page is written by DTU Nanolab internal''

	The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.		The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.

Pevo: /* THIS PAGE IS UNDER CONSTRUCTION */

2020-01-09T12:34:02Z

THIS PAGE IS UNDER CONSTRUCTION

← Older revision		Revision as of 14:34, 9 January 2020
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	The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.		The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.

	On this page the steps in the standard oxidation recipes on the furnaces will be ~~listet~~.		On this page the steps in the standard oxidation recipes on the furnaces will be listed.

Pevo: /* Dry oxidation recipe steps */

2019-10-03T14:30:55Z

Dry oxidation recipe steps

← Older revision		Revision as of 16:30, 3 October 2019
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	''Message: "Standby"''		''Message: "Standby"''

	This will be the active step.		This will be the active step, when the furnace is not in use, and when a recipe is selected.
	~~When~~ the furnace is not in use, and when a recipe is selected,

	If a recipe is aborted, it will also jump to the STANDBY step.		If a recipe is aborted, it will also jump to the STANDBY step.

Pevo: /* Dry oxidation recipe steps */

2019-10-03T14:28:37Z

Dry oxidation recipe steps

← Older revision		Revision as of 16:28, 3 October 2019
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	''Message: "Standby"''		''Message: "Standby"''

	When the furnace is not in use, and when a recipe is selected, ~~this will be the active step.~~		This will be the active step.
			When the furnace is not in use, and when a recipe is selected,

	If a recipe is aborted, it will jump to the STANDBY step.		If a recipe is aborted, it will also jump to the STANDBY step.

	~~The~~ furnace is closed and kept clean by an N<sub>2</sub> flow:		In the standby step, the furnace is closed and kept clean by an N<sub>2</sub> flow.

	* Standby temperature: 700 <sup>o</sup>C		*Standby temperature: 700 <sup>o</sup>C
	* N<sub>2</sub> flow: 3 SLM		*N<sub>2</sub> flow: 3 SLM
	* O<sub>2</sub> flow: 0 SLM		*O<sub>2</sub> flow: 0 SLM

	The user has to press "Start" (on the touch screen or furnace computer) to start the recipe.		The user has to press "Start" (on the touch screen or furnace computer) to start the recipe.
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	''Message: "Oxidation"''		''Message: "Oxidation"''

	The dry oxidation is started by flowing O<sub>2</sub through the furnace instead of N<sub>2</sub.		The dry oxidation is started by flowing O<sub>2</sub> through the furnace instead of N<sub>2</sub.

	O<sub>2</sub> flow: 5 SLM		*O<sub>2</sub> flow: 5 SLM
	N<sub>2</sub> flow: 0 SLM		*N<sub>2</sub> flow: 0 SLM

	The oxidation time is a variable command, so it can be set by the user.		The oxidation time is a variable command, so it can be set by the user.
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	The wafers are annealed in N<sub>2</sub> at the same temperature as the oxidation temperature. The annealing will improve the oxide quality by making it more dense.		The wafers are annealed in N<sub>2</sub> at the same temperature as the oxidation temperature. The annealing will improve the oxide quality by making it more dense.

	N<sub>2</sub> flow: 6 SLM		*N<sub>2</sub> flow: 6 SLM
	O<sub>2</sub> flow: 0 SLM		*O<sub>2</sub> flow: 0 SLM

	Normally the annealing time is 20 minutes, but it is a variable command, so it can be set by the user.		Normally the annealing time is 20 minutes, but it is a variable command, so it can be set by the user.

Pevo: /* Dry oxidation recipe steps */

2019-10-03T14:17:34Z

Dry oxidation recipe steps

← Older revision		Revision as of 16:17, 3 October 2019
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	'''07 ANNEAL'''		'''07 ANNEAL'''

	''Message: "~~Anneals~~/Dens"''		''Message: "Anneal/Dens"''

	The O<sub>2</sub> gas is purged out of the furnace by an N<sub>2</sub> flow, so that the oxidation stop.		The O<sub>2</sub> gas is purged out of the furnace by an N<sub>2</sub> flow, so that the oxidation stop.
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	Normally the annealing time is 20 minutes, but it is a variable command, so it can be set by the user.		Normally the annealing time is 20 minutes, but it is a variable command, so it can be set by the user.

			The annealing time can be changed, until the annealing step is started.


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	When the wafers are unloaded, the user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace.		When the wafers are unloaded, the user has to press "Start" (on the touch screen) or "Continue" (on the furnace computer) to close the furnace.
	The recipe then jumps to the STANDBY step, and the user can leave the furnace, after it has closed.		The recipe then jumps to the STANDBY step, and the user can leave the furnace, after it has closed.






	~~The standard annealing time is 20 minutes, but users can change the time. The annealing time can be changed, until the annealing step is started~~.