Specific Process Knowledge/Thermal Process/Oxidation/Dry oxidation C1 furnace - Revision history

Pevo: /* Dry Oxidation uniformity for 4" wafers */

2026-03-05T13:41:27Z

Dry Oxidation uniformity for 4" wafers

← Older revision		Revision as of 15:41, 5 March 2026
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	''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''		''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech), 2018.''

Mmat at 13:08, 9 August 2025

2025-08-09T13:08:10Z

← Older revision		Revision as of 15:08, 9 August 2025
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	~~{{cc-nanolab}}~~

	~~<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>~~

	=Dry Oxidation in the C1 furnace=		=Dry Oxidation in the C1 furnace=
	The C1 furnace can be used for dry oxidation of 4" and 6" wafers.		The C1 furnace can be used for dry oxidation of 4" and 6" wafers.

Mmat at 14:57, 3 July 2025

2025-07-03T14:57:35Z

← Older revision		Revision as of 16:57, 3 July 2025
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			{{cc-nanolab}}

	~~<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>~~		<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>

	<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>~~[[image:Under_construction.png\|200px]]~~

			=Dry Oxidation in the C1 furnace=
	The C1 furnace can be used for dry oxidation of 4" and 6" wafers.		The C1 furnace can be used for dry oxidation of 4" and 6" wafers.

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	===Dry Oxidation uniformity for 4" wafers===		==Dry Oxidation uniformity for 4" wafers==

	A dry oxidation has been done with 30 4" wafers in the quartz boat in the furnace to get an idea of how uniform the oxide layer is from wafer to wafer over the boat.		A dry oxidation has been done with 30 4" wafers in the quartz boat in the furnace to get an idea of how uniform the oxide layer is from wafer to wafer over the boat.

Paphol at 08:44, 15 June 2023

2023-06-15T08:44:35Z

← Older revision		Revision as of 10:44, 15 June 2023
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			<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>

	<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]		<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]

	~~<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>~~

	The C1 furnace can be used for dry oxidation of 4" and 6" wafers.		The C1 furnace can be used for dry oxidation of 4" and 6" wafers.

Paphol at 08:43, 15 June 2023

2023-06-15T08:43:29Z

← Older revision		Revision as of 10:43, 15 June 2023
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	<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]		<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]

			<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>

	The C1 furnace can be used for dry oxidation of 4" and 6" wafers.		The C1 furnace can be used for dry oxidation of 4" and 6" wafers.

Pevo: /* Dry Oxidation uniformity for 6" wafers */

2022-08-30T07:32:33Z

Dry Oxidation uniformity for 6" wafers

← Older revision		Revision as of 09:32, 30 August 2022
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	===Dry Oxidation uniformity for 6" wafers===		===Dry Oxidation uniformity for 4" wafers===

	A dry oxidation has been done with 30 6" wafers in the quartz boat in the furnace to get an idea of how uniform the oxide layer is from wafer to wafer over the boat.		A dry oxidation has been done with 30 4" wafers in the quartz boat in the furnace to get an idea of how uniform the oxide layer is from wafer to wafer over the boat.

	The following parameters were used for the oxidation:		The following parameters were used for the oxidation:
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	[[image:C1thickness.jpg\|500x500px\|left\|thumb\|xxx]]		[[image:C1thickness.jpg\|500x500px\|left\|thumb\|xxx]]
	~~C1ThickVsSlot.pdf~~
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Pevo at 07:32, 30 August 2022

2022-08-30T07:32:00Z

← Older revision		Revision as of 09:32, 30 August 2022
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	The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated.		The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated.

	[[image:~~C1ThickVsSlot~~.~~pdf~~\|~~300x300px~~\|left\|thumb\|xxx]]		[[image:C1thickness-vs-slot.jpg\|450x450px\|left\|thumb\|xxx]]
	<br clear="all" />		<br clear="all" />

Pevo at 07:26, 30 August 2022

2022-08-30T07:26:59Z

← Older revision		Revision as of 09:26, 30 August 2022
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	The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated.		The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated.

	[[image:C1ThickVsSlot.pdf\|300x300px\|left\|thumb\|~~4" LPCVD nitride furnace (B2) located in cleanroom B-1~~]]		[[image:C1ThickVsSlot.pdf\|300x300px\|left\|thumb\|xxx]]
	<br clear="all" />		<br clear="all" />

			[[image:C1thickness.jpg\|500x500px\|left\|thumb\|xxx]]
	C1ThickVsSlot.pdf		C1ThickVsSlot.pdf
			<br clear="all" />

	''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''		''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''

Pevo: /* Dry Oxidation uniformity for 6" wafers */

2022-08-29T12:46:43Z

Dry Oxidation uniformity for 6" wafers

← Older revision		Revision as of 14:46, 29 August 2022
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	The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated.		The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated.

			[[image:C1ThickVsSlot.pdf\|300x300px\|left\|thumb\|4" LPCVD nitride furnace (B2) located in cleanroom B-1]]
			<br clear="all" />

			C1ThickVsSlot.pdf

	''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''		''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''

Pevo: /* Dry Oxidation uniformity for 6" wafers */

2022-08-29T12:07:37Z

Dry Oxidation uniformity for 6" wafers

← Older revision		Revision as of 14:07, 29 August 2022
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	===Dry Oxidation uniformity for 6" wafers===		===Dry Oxidation uniformity for 6" wafers===

	A dry oxidation has been done with 30 6" wafers in the quartz boat in the furnace.		A dry oxidation has been done with 30 6" wafers in the quartz boat in the furnace to get an idea of how uniform the oxide layer is from wafer to wafer over the boat.

	The following parameters were used for the oxidation:		The following parameters were used for the oxidation:
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	After the oxidation, the oxide thickness was measured on all the wafers.		After the oxidation, the oxide thickness was measured on all the wafers.

	The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area.		The graph below shows the measured oxide thickness as function of the wafer slot. Slot 1 is furthest inside the furnace, towards the service area. For each wafer the oxide thickness has been measured in 49 points, and the average oxide thickness has been calculated.

	''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''		''The oxidation and measurements were done by Martin Ommen (former DTU Nanotech).''