Specific Process Knowledge/Thermal Process/Furnace APOX - Revision history

Mmat at 12:36, 4 June 2025

2025-06-04T12:36:48Z

← Older revision		Revision as of 14:36, 4 June 2025
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''		'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''

	~~''This page is written by DTU Nanolab internal''~~

Mmat: /* EXPIRED - The APOX furnace has been removed from the cleanroom August 2019. */

2025-06-04T12:36:27Z

EXPIRED - The APOX furnace has been removed from the cleanroom August 2019.

← Older revision		Revision as of 14:36, 4 June 2025
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	~~===~~<~~span~~ style="color:~~Red~~">~~EXPIRED -~~ The APOX furnace has been ~~removed from the cleanroom~~ August 2019.</span>~~===~~		'''<p style="color:red;">The APOX furnace has been decomissioned in August 2019.</span>'''


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	[[Category: Thermal process\|APOX]]		[[Category: Thermal process\|APOX]]
	[[Category: Furnaces\|APOX]]		[[Category: Furnaces\|APOX]]


	==Apox furnace (D1)==		==Apox furnace (D1)==

Pevo at 07:39, 10 May 2023

2023-05-10T07:39:13Z

← Older revision		Revision as of 09:39, 10 May 2023
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	'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''		'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''

			''This page is written by DTU Nanolab internal''

	~~''This page is written by DTU Nanolab internal''~~

	===<span style="color:Red">EXPIRED~~!!!~~ The APOX furnace has been removed from the cleanroom August 2019.</span>===		===<span style="color:Red">EXPIRED - The APOX furnace has been removed from the cleanroom August 2019.</span>===

Paphol at 10:17, 2 February 2023

2023-02-02T10:17:52Z

← Older revision		Revision as of 12:17, 2 February 2023
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	'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''		'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''


			''This page is written by DTU Nanolab internal''

	===<span style="color:Red">EXPIRED!!! The APOX furnace has been removed from the cleanroom August 2019.</span>===		===<span style="color:Red">EXPIRED!!! The APOX furnace has been removed from the cleanroom August 2019.</span>===
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	==Apox furnace (D1)==		==Apox furnace (D1)==
	[[Image:APOX.JPG\|thumb\|300x300px\|Apox furnace (D1): positioned in the A-5 room]]		[[Image:APOX.JPG\|thumb\|300x300px\|Apox furnace (D1): positioned in the A-5 room/ Photo: DTU Nanolab internal]]

	The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required.		The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required.

Pevo at 07:11, 15 August 2022

2022-08-15T07:11:45Z

← Older revision		Revision as of 09:11, 15 August 2022
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	'''[http://www.labmanager.dtu.dk/function.php?module=Machine&view=view&mach=159 APOX Furnace (D1)]'''		'''[http://www.labmanager.dtu.dk/function.php?module=Machine&view=view&mach=159 APOX Furnace (D1)]'''


	==Process knowledge==		==Process knowledge==
	*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page		*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page


	==Overview of the performance of the Apox furnace and some process related parameters==		==Overview of the performance of the Apox furnace and some process related parameters==

Pevo at 07:53, 8 August 2022

2022-08-08T07:53:50Z

← Older revision		Revision as of 09:53, 8 August 2022
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	===<span style="color:Red">EXPIRED!!! The APOX furnace has been removed from the cleanroom August 2019.</span>===		===<span style="color:Red">EXPIRED!!! The APOX furnace has been removed from the cleanroom August 2019.</span>===


	[[Category: Equipment \|Thermal APOX]]		[[Category: Equipment \|Thermal APOX]]

Jmli: /* Apox furnace (D1) */

2019-11-25T15:07:55Z

Apox furnace (D1)

← Older revision		Revision as of 17:07, 25 November 2019
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	The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required.		The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required.

	This furnace is positioned in the III-V cleanroom area. Only ~~Danchip~~ employees are allowed to operate the furnace.		This furnace is positioned in the III-V cleanroom area. Only Nanolab employees are allowed to operate the furnace.

	'''The user manual, technical information and contact information can be found in LabManager:'''		'''The user manual, technical information and contact information can be found in LabManager:'''

Jmli at 15:07, 25 November 2019

2019-11-25T15:07:13Z

← Older revision		Revision as of 17:07, 25 November 2019
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	'''Feedback to this page''': '''[mailto:thinfilm@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''		'''Feedback to this page''': '''[mailto:thinfilm@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''

	===<span style="color:Red">EXPIRED!!! The APOX furnace has been removed from the cleanroom August 2019.</span>===		===<span style="color:Red">EXPIRED!!! The APOX furnace has been removed from the cleanroom August 2019.</span>===
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	'''The user manual, technical information and contact information can be found in LabManager:'''		'''The user manual, technical information and contact information can be found in LabManager:'''

	'''[http://www.labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=159 APOX Furnace (D1)]'''		'''[http://www.labmanager.dtu.dk/function.php?module=Machine&view=view&mach=159 APOX Furnace (D1)]'''

	==Process knowledge==		==Process knowledge==

Pevo at 07:19, 8 August 2019

2019-08-08T07:19:50Z

← Older revision		Revision as of 09:19, 8 August 2019
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	'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''		'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Furnace_APOX click here]'''

			===<span style="color:Red">EXPIRED!!! The APOX furnace has been removed from the cleanroom August 2019.</span>===

	[[Category: Equipment \|Thermal APOX]]		[[Category: Equipment \|Thermal APOX]]

Mdyma: /* Apox furnace (D1) */

2017-03-13T12:10:31Z

Apox furnace (D1)

← Older revision		Revision as of 14:10, 13 March 2017
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	The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required.		The APOX furnace (D1) is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated for oxidation of new and clean Si wafers to form apox layers which is a very thick wet thermal oxide grown at 1075<sup>o</sup>C. Running a batch of apox wafers (oxide thickness > 5µm) can take several weeks, depending on how thick an apox layer that is required.

	This furnace is positioned in the III-V cleanroom area. Only Danchip employees are allowed to operate the furnace.		This furnace is positioned in the III-V cleanroom area. Only Danchip employees are allowed to operate the furnace.

	'''The user manual, technical information and contact information can be found in LabManager:'''		'''The user manual, technical information and contact information can be found in LabManager:'''