Specific Process Knowledge/Thermal Process/A1 Bor Drive-in furnace - Revision history

Pevo: /* Overview of the performance of the Boron Drive-in and Pre-dep furnace and some process related parameters */

2025-09-16T12:47:42Z

Overview of the performance of the Boron Drive-in and Pre-dep furnace and some process related parameters

← Older revision		Revision as of 14:47, 16 September 2025
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	\|-		\|-
	!style="background:silver; color:black" align="center"\|Performance		!style="background:silver; color:black" align="center"\|Performance
	\|style="background:LightGrey; color:black"\|Film thickness\|\|style="background:WhiteSmoke; color:black"\|		\|style="background:LightGrey; color:black"\|Film thickness and quality\|\|style="background:WhiteSmoke; color:black"\|
	*Dry oxide: ~ 0 nm - 300 nm (it takes too long to grow a thicker oxide)		*Dry oxide: ~ 0 nm - 300 nm (it takes too long to grow a thicker oxide)
	*Wet oxide: ~ 0 nm - 3 µm (23 hours wet oxidation at 1100 <sup>o</sup>C for Si[100] wafers)		*Wet oxide: ~ 0 nm - 3 µm (23 hours wet oxidation at 1100 <sup>o</sup>C for Si[100] wafers)

Pevo: /* Overview of the performance of the Boron Drive-in and Pre-dep furnace and some process related parameters */

2025-09-16T12:45:15Z

Overview of the performance of the Boron Drive-in and Pre-dep furnace and some process related parameters

← Older revision		Revision as of 14:45, 16 September 2025
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	*Dry oxide: ~ 0 nm - 300 nm (it takes too long to grow a thicker oxide)		*Dry oxide: ~ 0 nm - 300 nm (it takes too long to grow a thicker oxide)
	*Wet oxide: ~ 0 nm - 3 µm (23 hours wet oxidation at 1100 <sup>o</sup>C for Si[100] wafers)		*Wet oxide: ~ 0 nm - 3 µm (23 hours wet oxidation at 1100 <sup>o</sup>C for Si[100] wafers)
			* [[Specific Process Knowledge/Thermal Process/Oxidation/Breakdown voltage measurements/A1 furnace break-down voltage measurement results\|Break-down voltage measurement results]]
	\|-		\|-
	!style="background:silver; color:black" align="center" valign="center" rowspan="3"\|Process parameter range		!style="background:silver; color:black" align="center" valign="center" rowspan="3"\|Process parameter range
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	*1 atm (no vacuum)		*1 atm (no vacuum)
	\|-		\|-
	\|style="background:LightGrey; color:black"\|~~Gasses~~ on the system		\|style="background:LightGrey; color:black"\|Gases on the system
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*N<sub>2</sub>		*N<sub>2</sub>

Pevo: /* Process knowledge */

2025-09-16T12:43:25Z

Process knowledge

← Older revision		Revision as of 14:43, 16 September 2025
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	==Process knowledge==		==Process knowledge==
	*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page		*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page
	* [[Specific Process Knowledge/Thermal Process/Oxidation/Breakdown voltage measurements/A1 furnace break-down voltage measurement results\|Break-down voltage measurement results]]
	*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page		*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page
	*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.		*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.

Pevo: /* Process knowledge */

2025-09-16T12:42:30Z

Process knowledge

← Older revision		Revision as of 14:42, 16 September 2025
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	==Process knowledge==		==Process knowledge==
	*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page		*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page
			* [[Specific Process Knowledge/Thermal Process/Oxidation/Breakdown voltage measurements/A1 furnace break-down voltage measurement results\|Break-down voltage measurement results]]
	*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page		*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page
	*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.		*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.

Paphol at 12:40, 31 January 2023

2023-01-31T12:40:07Z

← Older revision		Revision as of 14:40, 31 January 2023
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	'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/A1_Bor_Drive-in_furnace click here]'''		'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/A1_Bor_Drive-in_furnace click here]'''

	''This page is written by DTU Nanolab internal''		''This page is written by DTU Nanolab internal''

Paphol: /* Boron Drive-in and Pre-dep furnace (A1) */

2023-01-31T09:12:54Z

Boron Drive-in and Pre-dep furnace (A1)

← Older revision		Revision as of 11:12, 31 January 2023
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	==Boron Drive-in and Pre-dep furnace (A1)==		==Boron Drive-in and Pre-dep furnace (A1)==
	[[Image:A1.JPG\|thumb\|400x400px\|Boron Drive-in and Pre-dep furnace (A1). Positioned in cleanroom B-1 Photo: DTU Nanolab internal]]		[[Image:A1.JPG\|thumb\|400x400px\|Boron Drive-in and Pre-dep furnace (A1). Positioned in cleanroom B-1/ Photo: DTU Nanolab internal]]

	The Boron Drive-in and Pre-dep furnace (A1) is a Tempress horizontal furnace for thermal oxidation of silicon wafers. Also boron pre-deposition/doping is done in this furnace. Furthermore, the furnace is used for boron drive-in after the pre-deposition or after boron ion implantation.		The Boron Drive-in and Pre-dep furnace (A1) is a Tempress horizontal furnace for thermal oxidation of silicon wafers. Also boron pre-deposition/doping is done in this furnace. Furthermore, the furnace is used for boron drive-in after the pre-deposition or after boron ion implantation.

Paphol: /* Boron Drive-in and Pre-dep furnace (A1) */

2023-01-31T09:12:31Z

Boron Drive-in and Pre-dep furnace (A1)

← Older revision		Revision as of 11:12, 31 January 2023
Line 9:		Line 9:

	==Boron Drive-in and Pre-dep furnace (A1)==		==Boron Drive-in and Pre-dep furnace (A1)==
	[[Image:A1.JPG\|thumb\|400x400px\|Boron Drive-in and Pre-dep furnace (A1). Positioned in cleanroom B-1]]		[[Image:A1.JPG\|thumb\|400x400px\|Boron Drive-in and Pre-dep furnace (A1). Positioned in cleanroom B-1 Photo: DTU Nanolab internal]]

	The Boron Drive-in and Pre-dep furnace (A1) is a Tempress horizontal furnace for thermal oxidation of silicon wafers. Also boron pre-deposition/doping is done in this furnace. Furthermore, the furnace is used for boron drive-in after the pre-deposition or after boron ion implantation.		The Boron Drive-in and Pre-dep furnace (A1) is a Tempress horizontal furnace for thermal oxidation of silicon wafers. Also boron pre-deposition/doping is done in this furnace. Furthermore, the furnace is used for boron drive-in after the pre-deposition or after boron ion implantation.

Paphol at 09:12, 31 January 2023

2023-01-31T09:12:02Z

← Older revision		Revision as of 11:12, 31 January 2023
Line 1:		Line 1:

	'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/A1_Bor_Drive-in_furnace click here]'''		'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/A1_Bor_Drive-in_furnace click here]'''
			''This page is written by DTU Nanolab internal''

	[[Category: Equipment \|Thermal A1]]		[[Category: Equipment \|Thermal A1]]

Jhub: /* Boron Drive-in and Pre-dep furnace (A1) */

2021-01-05T08:42:38Z

Boron Drive-in and Pre-dep furnace (A1)

← Older revision		Revision as of 10:42, 5 January 2021
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	[[Image:A1.JPG\|thumb\|400x400px\|Boron Drive-in and Pre-dep furnace (A1). Positioned in cleanroom B-1]]		[[Image:A1.JPG\|thumb\|400x400px\|Boron Drive-in and Pre-dep furnace (A1). Positioned in cleanroom B-1]]

	The Boron Drive-in and Pre-dep furnace (A1) is a Tempress horizontal furnace for thermal oxidation of silicon wafers. Also boron pre-deposition/doping is done furnace. Furthermore, the furnace is used for boron drive-in after the pre-deposition or after boron ion implantation.		The Boron Drive-in and Pre-dep furnace (A1) is a Tempress horizontal furnace for thermal oxidation of silicon wafers. Also boron pre-deposition/doping is done in this furnace. Furthermore, the furnace is used for boron drive-in after the pre-deposition or after boron ion implantation.

	The furnace is mostly used for wet and dry thermal oxidation of silicon wafers. The oxidation recipes are named e.g. "WET1000" and "DRY1000", where "WET" or "DRY" indicates whether it is a wet or dry oxidation process, and the number indicates the oxidation temperature.		The furnace is mostly used for wet and dry thermal oxidation of silicon wafers. The oxidation recipes are named e.g. "WET1000" and "DRY1000", where "WET" or "DRY" indicates whether it is a wet or dry oxidation process, and the number indicates the oxidation temperature.

Pevo: /* Overview of the performance of the Boron Drive-in and Pre-dep furnace and some process related parameters */

2020-03-18T13:21:45Z

Overview of the performance of the Boron Drive-in and Pre-dep furnace and some process related parameters

← Older revision		Revision as of 15:21, 18 March 2020
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	*N<sub>2</sub>		*N<sub>2</sub>
	*O<sub>2</sub>		*O<sub>2</sub>
	*H<sub>2</sub> (in a torch, H<sub>2</sub> and O<sub>2</sub> burns into ~~water~~ vapour for wet oxidation)		*H<sub>2</sub> (in a torch, H<sub>2</sub> and O<sub>2</sub> burns into H<sub>2</sub>O vapour for wet oxidation)
	\|-		\|-
	!style="background:silver; color:black" align="center" valign="center" rowspan="2"\|Substrates		!style="background:silver; color:black" align="center" valign="center" rowspan="2"\|Substrates

← Older revision		Revision as of 14:43, 16 September 2025
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	==Process knowledge==		==Process knowledge==
	*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page		*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page
	* [[Specific Process Knowledge/Thermal Process/Oxidation/Breakdown voltage measurements/A1 furnace break-down voltage measurement results\|Break-down voltage measurement results]]
	*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page		*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page
	*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.		*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.

← Older revision		Revision as of 14:42, 16 September 2025
Line 27:		Line 27:
	==Process knowledge==		==Process knowledge==
	*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page		*Oxidation: look at the [[Specific Process Knowledge/Thermal Process/Oxidation\|Oxidation]] page
			* [[Specific Process Knowledge/Thermal Process/Oxidation/Breakdown voltage measurements/A1 furnace break-down voltage measurement results\|Break-down voltage measurement results]]
	*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page		*Boron drive-in: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|Dope with Boron]] page
	*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.		*Boron doping: look at the [[Specific Process Knowledge/Thermal Process/Dope with Boron\|'''Dope with Boron''']] page.